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| Number | Title | Issue Date |
| 8168322 | Thin film battery with protective packaging A battery comprises a substrate comprising a first surface comprising a first battery cell having a first non-contact surface, a pliable dielectric abutting the first non-contact surface, the pliable dielectric comprising a peripheral edge, and a first cap about the... | 05/01/2012 |
| 8168223 | Engineered particles and methods of use Engineered particles are provided may be used for the delivery of a bioactive agent to the respiratory tract of a patient. The particles may be used in the form of dry powders or in the form of stabilized dispersions comprising a nonaqueous continuous phase. In part... | 05/01/2012 |
| 8134118 | Image capture unit and methods of fabricating a lens array block utilizing electrolysis Methods of forming a lens array block comprising a plurality of lens barrels are provided, including depositing lens barrel material by electrolysis and etching lens barrels from a block of material. Also provided are means of assembling image capturing units or arr... | 03/13/2012 |
| 8130382 | Determining endpoint in a substrate process An endpoint detection method for detecting an endpoint of a process comprises determining a reflectance spectrum of light reflected from a substrate, the light having a wavelength, processing the substrate while light having the wavelength is reflected from the subs... | 03/06/2012 |
| 8114525 | Process chamber component having electroplated yttrium containing coating A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating can include zirconium oxide, or can have an oxide layer thereon. In another embodim... | 02/14/2012 |
| 8114477 | Cleaning of a substrate support A method of fabricating a cleaning wafer capable of cleaning process residues from a substrate support surface is disclosed. The method comprises providing a cleaning disc, and applying a liquid polymer precursor to the cleaning disc by spraying or spin coating the ... | 02/14/2012 |
| 8110086 | Method of manufacturing a process chamber component having yttrium-aluminum coating A method of manufacturing a substrate processing chamber component comprises forming a chamber component comprising a metal alloy comprising yttrium and aluminum, and anodizing an exposed surface of the metal alloy. ... | 02/07/2012 |
| 8090250 | Imaging device with focus offset compensation An imaging device comprises a lens barrel having a lens opening, and a lens positioned in the lens opening of the lens barrel, the lens having an optical center, a focal length F, an aperture diameter D, and an aperture number FN=F/D. An image sensor comp... | 01/03/2012 |
| 8083963 | Removal of process residues on the backside of a substrate A substrate is processed in a process chamber comprising a substrate support having a receiving surface for receiving a substrate so that a front surface of the substrate is exposed within the chamber. An energized process gas is used to process the front surface of... | 12/27/2011 |
| 8079361 | Increased dosage metered dose inhaler An aerosolization apparatus comprises a container containing a pharmaceutical formulation, the pharmaceutical formulation comprising an active agent and a propellant. The aerosolization apparatus further comprises a metering chamber in communication with the contain... | 12/20/2011 |
| RE42942 | Powder filling apparatus and methods for their use The invention provides methods, systems and apparatus for the metered transport of fine powders into receptacles. According to one exemplary embodiment, an apparatus is provided which comprises a hopper having an opening. The hopper is adapted to receive a bed of fi... | 11/22/2011 |
| 8021743 | Process chamber component with layered coating and method A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying structure and first and second coating layers, the first coating layer comprising a first material having a first thermal e... | 09/20/2011 |
| 8017001 | System for mineral hardness management The disclosed systems and methods for maintenance of an enclosed body of water generally include mobile systems and/or methods for removal of mineral hardness and other particulate impurities via lime softening filtration. Chemicals are added to a body of water cont... | 09/13/2011 |
| 7993470 | Fabricating and cleaning chamber components having textured surfaces A method of fabricating a substrate processing chamber component involves forming a component having a textured surface and sweeping a jet of pressurized fluid across the textured surface of the component. The jet of fluid is pressurized sufficiently high to dislodg... | 08/09/2011 |
| 7969581 | Determining endpoint in a substrate process An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the r... | 06/28/2011 |
| 7964085 | Electrochemical removal of tantalum-containing materials A method of cleaning metal-containing deposits from a metal surface of a process chamber component includes immersing the metal surface in an electrochemical cleaning bath solution. A negative electrical bias is applied to the metal surface to electrochemically clea... | 06/21/2011 |
| 7959780 | Textured ion exchange membranes A textured water-splitting membrane comprises an anion exchange layer abutting a cation exchange layer to form a heterogeneous water-splitting interface therebetween, and a textured surface having a pattern of texture features comprising spaced apart peaks and valle... | 06/14/2011 |
| 7942969 | Substrate cleaning chamber and components A substrate cleaning chamber comprises various components, such as for example, a consumable ceramic liner, substrate heating pedestal, and process kit. The consumable ceramic liner is provided for connecting a gas outlet channel of a remote gas energizer to a gas i... | 05/17/2011 |
| 7910218 | Cleaning and refurbishing chamber components having metal coatings A component of a process chamber is refurbished and cleaned to remove an intermetallic compound from the component. The component has a structure having a coating that includes a first metal layer over the intermetallic compound. To refurbish the component, the firs... | 03/22/2011 |
| 7907384 | Detachable electrostatic chuck for supporting a substrate in a process chamber A substrate support has an electrostatic chuck comprising an electrostatic puck with a dielectric covering an electrode capable of being charged to energize a process gas. The chuck has a frontside surface to receive a substrate and a base plate having an annular fl... | 03/15/2011 |
| 7814905 | Systems devices and methods for opening receptacles having a powder to be fluidized A method for forming at least one opening in a receptacle comprises the steps of providing a receptacle having a cover with an exterior surface and an interior surface covering a cavity. A cutting mechanism is also provided having at least one blade. The cover is pi... | 10/19/2010 |
| 7808651 | Determining endpoint in a substrate process An endpoint detection system for detecting an endpoint of a process comprises a polychromatic light source which emits polychromatic light. The light is reflected from a substrate. A light wavelength selector receives the reflected polychromatic light and determines... | 10/05/2010 |
| 7780833 | Electrochemical ion exchange with textured membranes and cartridge An electrochemical cell 102 comprises an ion exchange membrane 10 having anion and cation exchange materials. The membrane 10 can have separate anion and cation exchange layers 12, 14 that define a heterogeneous water-splitting interface ... | 08/24/2010 |
| 7768765 | Substrate support having heat transfer system A support for a substrate processing chamber comprises a fluid circulating reservoir comprising a channel having serpentine convolutions. A fluid inlet supplies a heat transfer fluid to the fluid circulating reservoir and a fluid outlet discharges the heat transfer ... | 08/03/2010 |
| 7762114 | Flow-formed chamber component having a textured surface A method of fabricating a component for a substrate processing chamber involves providing a preform having internal and external surfaces, and providing a mandrel having a textured surface with a pattern of textured features comprising protrusions and depressions. T... | 07/27/2010 |
| 7758763 | Plasma for resist removal and facet control of underlying features A substrate comprising a resist layer overlying a dielectric feature, is processed in a substrate processing chamber comprising an antenna, and first and second process electrodes. A process gas comprising CO2 is introduced into the chamber. The process g... | 07/20/2010 |
| 7697260 | Detachable electrostatic chuck An electrostatic chuck is capable of attachment to a pedestal in a process chamber. The chuck has an electrostatic puck comprises a ceramic body with an embedded electrode. The ceramic body has a substrate support surface with an annular periphery. The chuck also ha... | 04/13/2010 |
| 7695982 | Refurbishing a wafer having a low-k dielectric layer A wafer comprising a low-k dielectric layer is refurbished for reuse. Initially, a removable layer is provided on the wafer. The low-k dielectric layer is formed over the removable layer. The overlying low-k dielectric layer is removed from the wafer by etching away... | 04/13/2010 |
| 7672110 | Electrostatic chuck having textured contact surface An electrostatic chuck has an electrode embedded in a dielectric which is mounted on a pedestal. The dielectric has a contact surface with an average surface roughness of less than about 0.5 μm, a surface peak waviness of less than about 0.12 μm, and a surface pea... | 03/02/2010 |
| 7670436 | Support ring assembly A substrate ring assembly is provided for a substrate support having a peripheral edge. The assembly has an annular band having an inner perimeter that surrounds and at least partially covers the peripheral edge of the substrate support. The assembly also has a clam... | 03/02/2010 |
| 7659206 | Removal of silicon oxycarbide from substrates A method of treating a substrate comprises depositing silicon oxycarbide on the substrate and removing the silicon oxycarbide from the substrate. The silicon oxycarbide on the substrate is decarbonized by exposure to an energized oxygen-containing gas that heats the... | 02/09/2010 |
| 7657390 | Reclaiming substrates having defects and contaminants Test substrates used to test semiconductor fabrication tools are reclaimed by reading from a database the process steps performed on each test substrate and selecting a reclamation process from a plurality of reclamation processes. The reclamation process can includ... | 02/02/2010 |
| 7655316 | Cleaning of a substrate support A cleaning wafer cleans process residues from a support surface used in the processing of a substrate in an energized gas. The cleaning wafer has a disc having a liquid precursor derived polyimide layer formed directly on the disc by applying a liquid polyimide prec... | 02/02/2010 |
| 7652774 | Interferometric endpoint determination in a substrate etching process In determining an endpoint of etching a substrate, light that is directed toward the substrate is reflected from the substrate. A wavelength of the light is selected to locally maximize the intensity of the reflected light at an initial time point of the etching pro... | 01/26/2010 |
| 7618769 | Textured chamber surface A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the co... | 11/17/2009 |
| 7604708 | Cleaning of native oxide with hydrogen-containing radicals A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a su... | 10/20/2009 |
| 7589950 | Detachable electrostatic chuck having sealing assembly A detachable electrostatic chuck is capable of being attached to a pedestal in a process chamber. The chuck comprises an electrostatic puck having a ceramic body with an embedded electrode. The chuck also has a baseplate below the electrostatic puck with a lower sur... | 09/15/2009 |
| 7579067 | Process chamber component with layered coating and method A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying structure and first and second coating layers. The first coating layer is formed over the underlying structure, and has a f... | 08/25/2009 |
| 7522822 | Halogen lamp assembly with integrated heat sink A halogen lamp assembly 20 for a substrate processing chamber 100 has a halogen lamp 22 and a ceramic heat sink monolith 24. The halogen lamp 22 includes a filament 28 and a pair of electrical connectors 30 encapsulat... | 04/21/2009 |
| 7504008 | Refurbishment of sputtering targets In a method of refurbishing a deposition target, a surface of the target is provided in a process zone. An electrical arc is generated in the process zone, and a consumable metal wire is inserted into the process zone to form liquefied metal. A pressurized gas is in... | 03/17/2009 |
