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| Number | Title | Issue Date |
| 7964858 | Ultraviolet reflector with coolant gas holes and method A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of throug... | 06/21/2011 |
| 7816205 | Method of forming non-volatile memory having charge trap layer with compositional gradient A flash memory device and method of forming a flash memory device are provided. The flash memory device includes a silicon nitride layer having a compositional gradient in which the ratio of silicon to nitrogen varies through the thickness of the layer. The silicon ... | 10/19/2010 |
| 7628978 | Stabilized preparations for use in metered dose inhalers Stabilized dispersions are provided for the delivery of a bioactive agent to the respiratory tract of a patient. The dispersions preferably comprise a plurality of perforated microstructures dispersed in a suspension medium that typically comprises a hydrofluoroalka... | 12/08/2009 |
| 7510582 | Method of fabricating thin film battery with annealed substrate A thin film battery manufacturing method comprises annealing a battery substrate to a temperature at which organic materials are burned off the battery substrate to clean the battery substrate. The battery substrate comprises a thickness of less than about 100 micro... | 03/31/2009 |
| 7354288 | Substrate support with clamping electrical connector A substrate support comprises a ceramic disc with an electrode that is chargeable through an electrode terminal. An electrical connector connects an external power source to the electrode terminal. The electrical connector has a pair of opposing pincer arms, a groov... | 04/08/2008 |
| 7344629 | Selectable ion concentrations with electrolytic ion exchange An apparatus to treat an influent solution comprising ions to obtain a selectable ion concentration in an effluent solution. The apparatus comprises an electrochemical cell comprising a housing comprising first and second electrodes. A water-splitting ion exchange m... | 03/18/2008 |
| 7323230 | Coating for aluminum component A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface fe... | 01/29/2008 |
| 7311323 | Stroller having a foldable handle frame capable of being automatically locked in a folded state A stroller includes a wheel frame and a handle frame. The handle frame includes a grip member and two swing rods. The swing rods are spaced apart from each other in a left-to-right direction, and are connected pivotally to the wheel frame. The grip member has two ex... | 12/25/2007 |
| 7297247 | Electroformed sputtering target A method of fabricating a sputtering target for sputter depositing material onto a substrate in a sputtering chamber is described. In one embodiment of the method, a preform having a surface is formed and a layer of sputtering material is electroplated onto the surf... | 11/20/2007 |
| 7294224 | Magnet assembly for plasma containment A magnet assembly for a plasma process chamber has a hollow collar comprising a cross-section that is absent seams. The hollow collar has an open end face and a cap is provided to seal the open end face of the collar. A plurality of magnets are in the hollow collar,... | 11/13/2007 |
| 7247582 | Deposition of tensile and compressive stressed materials A method of depositing tensile or compressively stressed silicon nitride on a substrate is described. Silicon nitride having a tensile stress with an absolute value of at least about 1200 MPa can be deposited from process gas comprising silicon-containing gas and ni... | 07/24/2007 |
| 7221553 | Substrate support having heat transfer system A support for a substrate processing chamber has upper and lower walls that are joined by a peripheral sidewall to define a reservoir. A fluid inlet supplies a heat transfer fluid to the reservoir. In one version, a plurality of protrusions extends into the reservoi... | 05/22/2007 |
| 7182677 | Chemical mechanical polishing pad for controlling polishing slurry distribution A polishing pad for a chemical mechanical polishing apparatus has a body with a polishing surface having a radius, a central region, and a peripheral region. The polishing surface has a plurality of main radial-line channels extending radially outwardly from the cen... | 02/27/2007 |
| 7147359 | Lamp assembly having flexibly positioned rigid plug A lamp assembly for a substrate processing chamber is described. The lamp assembly comprises a tubular body having first and second ends, a lamp element at least partially seated in the first end having a filament and first electrical connectors, transmission wires ... | 12/12/2006 |
| 7066795 | Polishing pad conditioner with shaped abrasive patterns and channels A polishing pad conditioner comprises a base and a pad conditioning face on the base. The conditioning face comprises central and peripheral regions. Abrasive spokes having a substantially constant width of abrasive particles, extend from the central to the peripher... | 06/27/2006 |
| 7056620 | Thin film battery and method of manufacture A battery comprises a substrate having a cathode with a lower surface contacting the substrate and an opposing upper surface. A cathode current collector comprises conducting lines that contact the upper surface of the cathode. An electrolyte at least partially exte... | 06/06/2006 |
| 7049606 | Electron beam treatment apparatus One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) a chamber; (b) a cathode having a surface of relatively large area that is exposed to an inside of the chamber; (c) an anode having holes therein that is disposed insi... | 05/23/2006 |
| 7045014 | Substrate support assembly A substrate support assembly supports a substrate in a process chamber. The substrate support assembly has a support block having an electrode and an arm to hold the support block in the process chamber, the arm having a channel therethrough. The arm has a first cla... | 05/16/2006 |
| 7045020 | Cleaning a component of a process chamber Process deposits formed on a component of a process chamber are cleaned. In the cleaning method, gas holes in the component are mechanically pinned to clean the process deposits therein. A ceramic portion of the component is then exposed to an acidic solution, such ... | 05/16/2006 |
| 7045798 | Characterizing an electron beam treatment apparatus One embodiment of the present invention is a method for characterizing an electron beam treatment apparatus that includes: (a) e-beam treating one or more of a predetermined type of wafer or substrate utilizing one or more sets of electron beam treatment para meters... | 05/16/2006 |
| 7026009 | Evaluation of chamber components having textured coatings A component for a substrate processing chamber comprises a structure having a textured coating with surface grains. The component is evaluated by directing a beam of electrons onto the textured coating of the component to cause at least some of the electrons to be b... | 04/11/2006 |
| 7015467 | Generating electrons with an activated photocathode An electron beam apparatus comprises a beam source to generate a radiation beam that is directed onto a photocathode to generate an electron beam. The photocathode comprises an electron-emitting material composed of activated alkali halide, such as for example, cesi... | 03/21/2006 |
| 6989227 | E-beam curable resist and process for e-beam curing the resist One embodiment of the present invention is a photoresist formulation that includes e-beam cross-linkable substituents, which substituents include one or more of the following functional groups: (a) carbon-carbon double bonds; (b) a strained ring system; (c) a haloge... | 01/24/2006 |
| 6946408 | Method and apparatus for depositing dielectric films A method of depositing a dielectric film, such as tantalum oxide, on a substrate is described. In one example, a substrate is placed in a process zone to face a metal target and a pulsed DC voltage is applied to the target. A sputtering gas comprising a non-reactive... | 09/20/2005 |
| 6945857 | Polishing pad conditioner and methods of manufacture and recycling A recycled polishing pad conditioner comprises a base plate and a reversed abrasive disc that is flipped over from its original configuration. The reversed disc comprises an exposed abrasive face having an unused abrasive face comprising abrasive particles. A bond f... | 09/20/2005 |
| 6942929 | Process chamber having component with yttrium-aluminum coating A substrate processing chamber component is a structure having an integral surface coating comprising an yttrium-aluminum compound. The component may be fabricated by forming a metal alloy comprising yttrium and aluminum into the component shape and anodizing its su... | 09/13/2005 |
| 6936981 | Retarding electron beams in multiple electron beam pattern generation A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to a pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding e... | 08/30/2005 |
| 6933025 | Chamber having components with textured surfaces and method of manufacture A component for a substrate processing chamber has a structure composed of aluminum oxide. The structure has a roughened surface having a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating of aluminum oxide is deposited on... | 08/23/2005 |
| 6921464 | Method of manufacturing a thin film battery In a method of manufacturing a thin film battery in a chamber, a target comprising LiCoO2 is provided on a magnetron cathode in the chamber, and a substrate is placed facing the target. A process gas is introduced into the chamber and the process gas is e... | 07/26/2005 |
| 6913670 | Substrate support having barrier capable of detecting fluid leakage A substrate support has a receiving surface capable of receiving a substrate during processing in a substrate processing chamber. The substrate support has a pedestal having a conduit to circulate a heat transfer fluid therein. A barrier about the conduit includes a... | 07/05/2005 |
| 6905624 | Interferometric endpoint detection in a substrate etching process A method of etching a substrate includes placing a substrate in a process zone. The substrate has a material with a thickness, and the material has exposed regions between features of a patterned mask. An etchant gas is introduced into the process zone. The etchant ... | 06/14/2005 |
| 6902628 | Method of cleaning a coated process chamber component In a method of cleaning and refurbishing a process chamber component having a metal coating having a surface thereon, the surface of the metal coating is immersed in an acidic solution to remove at least a portion of the process deposits from the surface. Thereafter... | 06/07/2005 |
| 6888104 | Thermally matched support ring for substrate processing chamber A substrate support ring has a band having an inner perimeter that at least partially surrounds a periphery of the substrate. The band has a radiation absorption surface. A lip extends radially inwardly from the inner perimeter of the band to support the substrate. ... | 05/03/2005 |
| 6863699 | Sputter deposition of lithium phosphorous oxynitride material A method of depositing lithium phosphorus oxynitride on a substrate, the method comprising loading a substrate into a vacuum chamber having a target comprising lithium phosphate, introducing a process gas comprising nitrogen into the chamber and maintaining the gas ... | 03/08/2005 |
| 6852242 | Cleaning of multicompositional etchant residues A substrate processing apparatus has a chamber with a substrate transport to transport a substrate onto a substrate support in the chamber, a gas supply to provide a gas in the chamber, a gas energizer to energize the gas, and a gas exhaust to exhaust the gas. A con... | 02/08/2005 |
| 6849151 | Monitoring substrate processing by detecting reflectively diffracted light A substrate is placed in a process zone and an energized process gas is maintained in the process zone to process the substrate. A light beam is reflectively diffracted from a pattern of features of the substrate being processed, the reflected beam is monitored, and... | 02/01/2005 |
| 6843881 | Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber In a substrate processing apparatus, a substrate processing chamber has a substrate support to support a substrate, a gas delivery system to provide an energized cleaning gas to the chamber to clean process residues formed on surfaces in the chamber during processin... | 01/18/2005 |
| 6835275 | Reducing deposition of process residues on a surface in a chamber A process chamber 35 capable of processing a substrate 30 and monitoring a process conducted on the substrate 30, comprises a support 45, a gas inlet, a gas energizer, an exhaust 85, and a wall 38 having a recess 145 ... | 12/28/2004 |
| 6828996 | Electron beam patterning with a heated electron source An electron source has an anode and a cathode that is capable of being negatively biased relative to the anode, the cathode having an electron emitting portion and a cathode axis. An electromagnetic radiation source is adapted to generate an electromagnetic radiatio... | 12/07/2004 |
| 6829056 | Monitoring dimensions of features at different locations in the processing of substrates A substrate processing apparatus has a chamber having a substrate support, gas distributor, gas energizer, and gas exhaust port. A process monitor is provided to monitor features in a first region of the substrate and generate a corresponding first signal, and to mo... | 12/07/2004 |
