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| Number | Title | Issue Date |
| 6156623 | Stress control of thin films by mechanical deformation of wafer substrate A method of improving the physical and/or electrical and/or magnetic properties of a thin film material formed on a substrate, wherein the properties of the thin film material are stress-dependent, by selectively applying force to the substrate during the... | 12/05/2000 |
| 6143191 | Method for etch fabrication of iridium-based electrode structures A method of forming an iridium-based electrode structure on a substrate, from an iridium-containing precursor thereof which is decomposed to deposit iridium on the substrate. The iridium-based material is formed on the substrate in a desired environment, ... | 11/07/2000 |
| 6126996 | Metal complex source reagents for chemical vapor deposition A metalorganic complex of the formula: MAY X wherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAY with X; y is an integer having a value of 2, 3 or 4; each of the A ligands may ... | 10/03/2000 |
| 6083298 | Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment A process for fabricating a gas storage and dispensing system including a dispenser container for holding a physical sorbent material having sorptive affinity for (i) a sorbable dispensing gas to be held in and subsequently selectively discharged from the... | 07/04/2000 |
| 6077356 | Reagent supply vessel for chemical vapor deposition A liquid reagent dispensing assembly, comprising a gas-pressurizable vessel including a floor, and an interior volume bounded by interior wall and floor surfaces. A dip-tube liquid discharge conduit is employed for discharging liquid from the gas-pressuri... | 06/20/2000 |
| 6030454 | Composition and method for forming thin film ferrite layers on a substrate A method of forming a thin film ferrite material on a substrate from corresponding precursor(s), comprising liquid delivery and flash vaporization thereof to yield a precursor vapor, and transporting the precursor vapor to a chemical vapor deposition reac... | 02/29/2000 |
| 6027547 | Fluid storage and dispensing vessel with modified high surface area solid as fluid storage medium A fluid storage and dispensing system, comprising: a fluid storage and dispensing vessel constructed and arranged for selective dispensing of fluid therefrom; a solid-phase support in the vessel; and an affinity medium on the solid-phase support, wherein ... | 02/22/2000 |
| 6019823 | Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members Solid-phase physical sorbent medium holding adsorbed fluid is provided in a cartridge, for use in a sorbent-based fluid storage and dispensing system. One or more of such cartridges may be disposed in a fluid storage and dispensing vessel and opened prior... | 02/01/2000 |
| 6018065 | Method of fabricating iridium-based materials and structures on substrates, iridium source reagents therefor A method of forming an iridium-containing film on a substrate, from an iridium-contaiing precursor thereof which is decomposable to deposit iridium on the substrate, by decomposing the precursor and depositing iridium on the substrate in an oxidizing ambi... | 01/25/2000 |
| 6015917 | Tantalum amide precursors for deposition of tantalum nitride on a substrate Tantalum and titanium source reagents are described, including tantalum amide and tantalum silicon nitride precursors for the deposition of tantalum nitride material on a substrate by processes such as chemical vapor deposition, assisted chemical vapor de... | 01/18/2000 |
| 6006582 | Hydrogen sensor utilizing rare earth metal thin film detection element A hydrogen sensor for the detection of hydrogen, e.g., in an environment susceptible to the incursion or generation of hydrogen. The sensor includes a rare earth metal thin film arranged for exposure to the environment and exhibiting a detectable change o... | 12/28/1999 |
| 5998236 | Process for controlled orientation of ferroelectric layers There is disclosed a structure of and a method for fabricating a ferroelectric film on a non-conductive substrate. An adhesion layer, e.g., a layer of silicon dioxide and a layer of zirconium oxide, is deposited over a substrate. A conductive layer, e.g.,... | 12/07/1999 |
| 5993766 | Gas source and dispensing system A system for the storage and delivery of a sorbable fluid, comprising a storage and dispensing vessel containing a sorbent material having sorptive affinity for the sorbable fluid, and from which the fluid is desorbable by pressure-mediated and/or thermal... | 11/30/1999 |
| 5985008 | Sorbent-based fluid storage and dispensing system with high efficiency sorbent medium A solid-phase physical sorbent-based fluid storage and dispensing system, in which the sorbent is a particulate activated carbon of specific pore character. The sorbent may be washed, e.g., with hydrofluoric acid, to remove adverse trace metals and oxidic... | 11/16/1999 |
| 5980608 | Throughflow gas storage and dispensing system An apparatus for storage and dispensing of a gas, comprising a gas storage and dispensing vessel holding a physical sorbent medium and gas adsorbed on the physical sorbent medium, wherein a carrier gas, e.g., helium, hydrogen, argon, etc., is flowed throu... | 11/09/1999 |
| 5976928 | Chemical mechanical polishing of FeRAM capacitors A method of fabricating a ferroelectric capacitor structure by sequentially depositing a bottom electrode layer, a ferroelectric layer and a top electrode layer on a base structure, optionally with deposition of a layer of a conductive barrier material be... | 11/02/1999 |
| 5972430 | Digital chemical vapor deposition (CVD) method for forming a multi-component oxide layer A chemical vapor deposition (CVD) method for forming a multi-component oxide layer. There is first provided a chemical vapor deposition (CVD) reactor chamber. There is then positioned within the chemical vapor deposition (CVD) reactor chamber a substrate.... | 10/26/1999 |
| 5935283 | Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-Forming gas stream to a gas processing system. The structure is composed of a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumsc... | 08/10/1999 |
| 5916359 | Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition A solvent composition useful for liquid delivery chemical vapor deposition of organometallic precursors such as ଲ-diketonate metal precursors. The solvent composition comprises a mixture of solvent species A, B and C in the proportion A:B:C wherein ... | 06/29/1999 |
| 5916245 | High capacity gas storage and dispensing system A system for the storage and on-demand dispensing of a fluid that is sorbable on a physical sorbent and that subsequent to sorption is desorbable from the sorbent by pressure-mediated desorption and/or thermally-mediated desorption. The system includes a ... | 06/29/1999 |
| 5917140 | Sorbent-based fluid storage and dispensing vessel with enhanced heat transfer means An apparatus, for storage and dispensing of a sorbable fluid, including a storage and dispensing vessel containing a solid-phase physical sorbent medium for holding a sorbable fluid, with heat transfer means being associated with the vessel for thermally ... | 06/29/1999 |
| 5851293 | Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a ... | 12/22/1998 |
| 5848122 | Apparatus for rapid in-situ X-ray stress measurement during thermal cycling of semiconductor wafers An apparatus for making rapid in-situ thermal stress measurements includes a controlled atmosphere test chamber for receiving and holding a test sample, and a heating zone within the test chamber confined to the near vicinity of the test sample. A test sa... | 12/08/1998 |
| 5840897 | Metal complex source reagents for chemical vapor deposition A metalorganic complex of the formula: MAy X wherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAy with X; y is an integer having a value of 2, 3 or 4; each of the A l... | 11/24/1998 |
| 5777058 | Metallo-oxomeric scrubber compositions Scavengers for removing acidic or corrosive gaseous components from semiconductor process effluents comprising a metallic macromer comprising a coordinated complex of (i) metal coordination atoms linked to (ii) oxomeric moieties selected from the group co... | 07/07/1998 |
