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Attorney: Heal; Noel F., Sgarbossa; Peter J.


Number of patents: 2
Last date: June 13, 1995

NumberTitleIssue Date
5423918Method for reducing particulate contamination during plasma processing of semiconductor devices
A technique for removing particles from above a semiconductor wafer, particularly particles that are trapped in a plasma chamber during processing of the wafer. Trapped particles are usually not all drawn out with gases exhausted from the chamber, in part...
06/13/1995
5422724Multiple-scan method for wafer particle analysis
A method for reducing targeting errors encountered when trying to locate contaminant particles in a high-magnification imaging device, based on estimates of the particle positions obtained from a scanning device. The method of the invention includes scann...
06/06/1995
 
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