Did You Know...
...that when IBM conducted a market study of Chester Carlson's invention in 1959, the company concluded that it would take only 5000 units of his new product to saturate the market? IBM therefore declined to be part of the new product introduction. Too bad for IBM. Carlson's invention was the xerography process, and his new product was the beginning of the Xerox Corporation. It is estimated that every day, worldwide, 3,000,000,000 copies are made!!
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| Number | Title | Issue Date |
| 7839881 | Projection headset A headset apparatus including a virtual keypad and a method for inputting data into a headset are provided. In one embodiment, a headset includes a processor, at least one acoustic transducer, a projector operably coupled to the processor for displaying an image on ... | 11/23/2010 |
| 7680267 | Headset with a retractable speaker portion An earbud headset, a handset including the same, and methods of operating the headset and handset are provided. In one embodiment, an earbud headset includes a speaker portion that is retractable into and extendable from a base portion, thereby allowing for a thin p... | 03/16/2010 |
| 7646863 | Movement powered headset An apparatus and method are provided for advantageously powering a headset without a power cable. In one example, a headset includes a processor, an acoustic transducer, and a kinetic energy converter operably coupled to a power cell for powering the headset, the ki... | 01/12/2010 |
| 7602984 | Adaptive method and system for encoding digital images for the internet A system and method comprise defining a current rectangular region of the image bitmap, quantifying spectral characteristics of the current rectangular region, dividing the current rectangular region into four rectangular sub-regions in response to the spectral char... | 10/13/2009 |
| 7546313 | Method and framework for using XML files to modify network resource configurations A method and system are provided for a script driven framework that produces and uses a transactional document. The transactional document provides an interface for modifying configuration information associated with a network resource. In one example, a framework f... | 06/09/2009 |
| 7467405 | Method and apparatus for detecting an unauthorized client in a network of computer systems A method and system for detecting an unauthorized client system attempting to connect to a network of computer systems is disclosed. The network includes a certification authority server that includes a database of unique identification codes of authorized network c... | 12/16/2008 |
| 7450296 | Method and system for patterning alignment marks on a transparent substrate Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. ... | 11/11/2008 |
| 7446294 | True color image by modified microlens array An image sensor array includes a substrate having at least three image sensors located therein. The image sensor array also includes a blue filter positioned proximate to the first image sensor; a green filter proximate to the second image sensor; and a red filter p... | 11/04/2008 |
| 7444199 | Method for preparing mask and wafer data files A method for converting a data file into a writer file for a mask writer is provided. A plurality of sub-files is created from the data file. The plurality of sub-files is transferred to the mask writer. A plurality of writer files is created from the plurality of s... | 10/28/2008 |
| 7437404 | System and method for improving equipment communication in semiconductor manufacturing equipment Provided is a system and method for connecting semiconductor manufacturing equipment to a host and one or more clients. In one example, the system includes an application queue, a host queue, and an equipment queue configured to hold messages received from and sent ... | 10/14/2008 |
| 7421385 | Method and system of processing data that contain asian language characters The present disclosure provides a system and method for processing semiconductor manufacturing data. In one example, a method for processing data includes processing one or more bytes of a data set as a block wherein the data set comprises Asian language characters;... | 09/02/2008 |
| 7420277 | System for heat dissipation in semiconductor devices The present disclosure provides a method and system for heat dissipation in semiconductor devices. In one example, an integrated circuit semiconductor device includes a semiconductor substrate; one or more metallurgy layers connected to the semiconductor substrate, ... | 09/02/2008 |
| 7420250 | Electrostatic discharge protection device having light doped regions Provided are an electrostatic discharge (ESD) protection device and a method for making such a device. In one example, the ESD protection device includes a Zener diode region formed in a substrate and an N-type metal oxide semiconductor (NMOS) device formed adjacent... | 09/02/2008 |
| 7420188 | Exposure method and apparatus for immersion lithography A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a... | 09/02/2008 |
| 7409258 | Method and system for measuring customer delivery service Disclosed is a method and a system for measuring customer delivery service. A projected customer delivery date is generated. At least one projected output volume is determined based on the projected customer delivery date. At least one actual output volume is determ... | 08/05/2008 |
| 7405994 | Dual port cell structure Disclosed are improved layouts for memory cell and memory cell arrays. A memory cell array of multiple memory cells connected by signal lines that twist in connecting the array. Further, an eight transistor memory cell that comprises different resistive paths as see... | 07/29/2008 |
| 7393766 | Process for integration of a high dielectric constant gate insulator layer in a CMOS device A CMOS device structure, and a method of fabricating the CMOS device, featuring a gate insulator layer comprised of a high k metal oxide layer, has been developed. The process features formation of recessed, heavily doped source/drain regions, and of vertical, polys... | 07/01/2008 |
| 7394080 | Mask superposition for multiple exposures An exposure system includes a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask ... | 07/01/2008 |
| 7385252 | ESD protection for high voltage applications An electrostatic discharge (ESD) protection device includes a diode located in a substrate and an N-type metal oxide semiconductor (NMOS) device located in the substrate adjacent the diode, wherein both the diode and the NMOS are coupled to an input device, and at l... | 06/10/2008 |
| 7381649 | Structure for a multiple-gate FET device and a method for its fabrication A method for forming a semiconductor device and a device made using the method are provided. In one example, the method includes forming a hard mask layer on a semiconductor substrate and patterning the hard mask layer to form multiple openings. The substrate is etc... | 06/03/2008 |
| 7378744 | Plasma treatment at film layer to reduce sheet resistance and to improve via contact resistance A method of manufacturing a semiconductor device contact including forming an insulating layer over a substrate and forming an agglutinating layer over the insulating layer. The agglutinating layer is then exposed to a plasma treatment. A barrier layer is formed ove... | 05/27/2008 |
| 7378720 | Integrated stress relief pattern and registration structure A semiconductor die having an integrated circuit region formed in a substrate comprises at least one die-corner-circuit-forbidden (DCCF) region disposed in the substrate, proximate to the integrated circuit region; and at least one registration feature formed within... | 05/27/2008 |
| 7371671 | System and method for photolithography in semiconductor manufacturing A method for forming a semiconductor device includes forming a photoresist layer over a substrate and patterning the photoresist layer to form photoresist portions. A second layer is formed over the substrate in areas not covered by the photoresist portions and the ... | 05/13/2008 |
| 7371629 | N/PMOS saturation current, HCE, and Vt stability by contact etch stop film modifications A method is provided for improving Idsat in NMOS and PMOS transistors. A silicon nitride etch stop layer is deposited by a PECVD technique on STI and silicide regions and on sidewall spacers during a MOSFET manufacturing scheme. A dielectric layer is formed on the n... | 05/13/2008 |
| 7372153 | Integrated circuit package bond pad having plurality of conductive members An integrated circuit package bond pad includes an insulating layer and an electrode located over the insulating layer. The electrode has a first surface configured to be bonded to external circuitry and a second surface opposite the first surface. A plurality of co... | 05/13/2008 |
| 7372102 | Structure having a shallow trench-deep trench isolation region for a BiCMOS/CMOS technology A structure having a shallow trench-deep trench isolation region for a semiconductor device is provided. ... | 05/13/2008 |
| 7364836 | Dual damascene process A method of photoresist processing includes forming a first photoresist layer over composite layers of dielectric insulation and a top insulating layer and patterning a via hole pattern in the first photoresist layer by exposing to radiation of a first sensitivity. ... | 04/29/2008 |
| 7359759 | Method and system for virtual metrology in semiconductor manufacturing Provided are a method and a system for virtual metrology in semiconductor manufacturing. Process data and metrology data are received. Prediction data is generated based on the process data and metrology data using a learning control model. The system for virtual me... | 04/15/2008 |
| 7358612 | Plasma treatment at film layer to reduce sheet resistance and to improve via contact resistance A method of manufacturing a semiconductor device contact including forming an insulating layer over a substrate and forming an agglutinating layer over the insulating layer. The agglutinating layer is then exposed to a plasma treatment. A barrier layer is formed ove... | 04/15/2008 |
| 7358571 | Isolation spacer for thin SOI devices A semiconductor device comprises a semiconductor mesa overlying a dielectric layer, a gate stack formed overlying the semiconductor mesa, and an isolation spacer formed surrounding the semiconductor mesa and filling any undercut region at edges of the semiconductor ... | 04/15/2008 |
| 7357838 | Relaxed silicon germanium substrate with low defect density A method of forming a strained silicon layer on a relaxed, low defect density semiconductor alloy layer such as SiGe is provided. ... | 04/15/2008 |
| 7354847 | Method of trimming technology A process for trimming a photoresist layer during the fabrication of a gate electrode in a MOSFET is described. A bilayer stack with a top photoresist layer on a thicker organic underlayer is patternwise exposed with 193 nm or 157 nm radiation to form a feature havi... | 04/08/2008 |
| 7356378 | Method and system for smart vehicle route selection In one aspect a factory automation system for a wafer fab is provided. The factory automation system comprises: a manufacturing execution system (“MES”) for providing lot information; a material control system (“MCS”) for providing dynamic traffic informatio... | 04/08/2008 |
| 7356550 | Method for real time data replication A computer-based method of data replication of data in a programmable computer system having an ISAM database and a transaction log file, with the ISAM database having fields of tables and the transaction log file maintaining all files transactions of the ISAM datab... | 04/08/2008 |
| 7351994 | Noble high-k device At least one high-k device, and a method for forming the at least one high-k device, comprising the following. A structure having a strained substrate formed thereover. The strained substrate comprising at least an uppermost strained-Si epi layer. At least one diele... | 04/01/2008 |
| 7351936 | Method and apparatus for preventing baking chamber exhaust line clog A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking chamber on a periodic basis. The temperature is between a temperature ... | 04/01/2008 |
| 7353077 | Methods for optimizing die placement A method of optimizing die placement on a wafer having an alignment mark with a computing system includes arranging a plurality of fields on the wafer in a first position. Dummies are inserted between at least one arranged field and the alignment mark and inserted a... | 04/01/2008 |
| 7352053 | Insulating layer having decreased dielectric constant and increased hardness A method of manufacturing a mechanically robust insulating layer, including forming a low-k dielectric layer having a first dielectric constant on a substrate and forming a carbon nitride cap layer on the low-k dielectric layer, the insulating layer thereby having a... | 04/01/2008 |
| 7331950 | Apparatus for containing noise generated by a pneumatically powered surgical instrument and related method A sound attenuating system is provided for pneumatically powered surgical instruments. In one aspect, the exhaust hose is formed of at least two dissimilar materials to impede the transmission of vibrations or audible noise. In an alternative form, the exhaust hose ... | 02/19/2008 |
| 7331995 | Method for inserting an articular disc prosthesis via the transforaminal approach A prosthetic device for transforaminal insertion into an intervertebral space is provided. The prosthetic device includes a first component having a first curved flange for engaging a first vertebra from a transforaminal approach, the first component having a first ... | 02/19/2008 |
