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| Number | Title | Issue Date |
| 8182661 | Controllable target cooling A sputter target assembly particularly useful for a large panel plasma sputter reactor having a target assembly sealed both to the main processing chamber and a vacuum pumped chamber housing a moving magnetron. The target assembly to which target tiles are bonded in... | 05/22/2012 |
| 8178819 | Thermal flux processing by scanning a focused line beam The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate... | 05/15/2012 |
| 8133360 | Prediction and compensation of erosion in a magnetron sputtering target When a magnetron is scanned about the back of a target in a selected complex path having radial components, the erosion profile has a form depending upon the selection of paths. A radial erosion rate profile for a given magnetron is measured. Periodically during sca... | 03/13/2012 |
| 8114256 | Control of arbitrary scan path of a rotating magnetron A control system and method for controlling two motors determining the azimuthal and circumferential position of a magnetron rotating about the central axis of the sputter chamber in back of its target sputtering and capable of a nearly arbitrary scan path, e.g., wi... | 02/14/2012 |
| 8021527 | Coaxial shafts for radial positioning of rotating magnetron A magnetron actuator for moving a magnetron in a nearly arbitrary radial and azimuthal path in the back of a target in a plasma sputter reactor. The magnetron includes two coaxial rotary shafts extending along the chamber central axis and coupled to two independentl... | 09/20/2011 |
| 8021514 | Remote plasma source for pre-treatment of substrates prior to deposition A plasma processing chamber particularly useful for pre-treating low-k dielectric films and refractory metal films subject to oxidation prior to deposition of other layers. A remote plasma source (RPS) excites a processing gas into a plasma and delivers it through a... | 09/20/2011 |
| 8003534 | Method of forming semiconductor devices in wafer assembly An apparatus and method for holding a semiconductor device in a wafer. A bar is connected to the wafer. A first sidewall comprises a first end and a second, and is connected to the bar at its first end. A first tab comprises a first end and a second end, and is conn... | 08/23/2011 |
| 7972470 | Asymmetric grounding of rectangular susceptor An asymmetrically grounded susceptor used in a plasma processing chamber for chemical vapor deposition onto large rectangular panels supported on and grounded by the susceptor. A plurality of grounding straps are connected between the periphery of the susceptor to t... | 07/05/2011 |
| 7972441 | Thermal oxidation of silicon using ozone A method and apparatus for oxidizing materials used in semiconductor integrated circuits, for example, for oxidizing silicon to form a dielectric gate. An ozonator is capable of producing a stream of least 70% ozone. The ozone passes into an RTP chamber through a wa... | 07/05/2011 |
| 7928381 | Coaxial charged particle energy analyzer A non-dispersive electrostatic energy analyzer for electrons and other charged particles having a generally coaxial structure of a sequentially arranged sections of an electrostatic lens to focus the beam through an iris and preferably including an ellipsoidally sha... | 04/19/2011 |
| 7913544 | Scanning probe devices and methods for fabricating same The present invention is directed to scanning probes in which a cantilever contacts a stylus via an integrated stylus base pad, and methods for fabricating such probes. The probe offer many advantages over other types of scanning probes with respect to eliminating t... | 03/29/2011 |
| 7884445 | Semiconductor device in wafer assembly An apparatus and method for holding a semiconductor device in a wafer. A bar is connected to the wafer. A first sidewall comprises a first end and a second, and is connected to the bar at its first end. A first tab comprises a first end and a second end, and is conn... | 02/08/2011 |
| 7854974 | Tube formed of bonded silicon staves Tubular silicon members advantageously formed by extrusion from a silicon melt or by fixing together silicon staves in a barrel shape. A silicon-based wafer support tower is particularly useful for batch-mode thermal chemical vapor deposition and other high-temperat... | 12/21/2010 |
| 7736747 | Silicon parts joined by a silicon layer preferably plasma sprayed A method of joining two silicon members and the bonded assembly in which the members are assembled to place them into alignment across a seam. Silicon derived from silicon powder is plasma sprayed across the seam and forms a silicon coating that bonds to the silicon... | 06/15/2010 |
| 7736437 | Baffled liner cover A baffled liner cover supported at the top of a liner surrounding a wafer support tower for semiconductor thermal processing. The cover may present a continuous horizontal surface for preventing particles from falling within the liner but present horizontal extendin... | 06/15/2010 |
| 7736436 | Detachable edge ring for thermal processing support towers An edge ring for use in batch thermal processing of wafers supported on a vertical tower within a furnace. The edge rings are have a width approximately overlapping the periphery of the wafers and are detachably supported on the towers equally spaced between the waf... | 06/15/2010 |
| 7713355 | Silicon shelf towers A silicon shelf tower for hatch thermal processing of silicon wafers in a vertical furnace. The tower includes at least three silicon legs joined to bases and having a vertical arrangement of slots. Silicon shelves are detachably loaded by sliding them through the s... | 05/11/2010 |
| 7666513 | Adhesive of a silicon and silica composite for bonding together silicon parts A method of joining two silicon members, the adhesive used for the method, and the joined product, especially a silicon tower for supporting multiple silicon wafers. A flowable adhesive is prepared comprising silicon particles of size less than 100 μm and preferabl... | 02/23/2010 |
| 7644745 | Bonding of target tiles to backing plate with patterned bonding agent A target assembly including a plurality of target tiles bonded to a backing plate by adhesive, for example of indium or conductive polymer, filled into recesses in the backing plate formed beneath each of the target tiles. A sole peripheral recess formed as a rectan... | 01/12/2010 |
| 7611989 | Polysilicon dummy wafers and process used therewith Non-production wafers of polycrystalline silicon are placed in non-production slots of a support tower for thermal processing monocrystalline silicon wafers. They may have thicknesses of 0.725 to 2 mm and be roughened on both sides. Nitride may be grown on the non-p... | 11/03/2009 |
| 7601558 | Transparent zinc oxide electrode having a graded oxygen content A method of reactively sputtering from a metallic zinc target a transparent conductive oxide electrode of zinc oxide from a metallic zinc in a silicon photo diode device and the resultant product, such as a solar cell. The electrode in deposited on a transparent sub... | 10/13/2009 |
| 7550066 | Staggered target tiles A sputtering target, particularly for sputter depositing a target material onto large rectangular panels, in which a plurality of target tiles are bonded to a backing plate in a two-dimensional non-rectangular array such that the tiles meet at interstices of no more... | 06/23/2009 |
| 7141800 | Non-dispersive charged particle energy analyzer An electron energy analyzer including a curved electrostatic low-pass reflector and a high-pass electrostatic transmissive filter. The reflector comprises a curved grid, preferably ellipsoidal, and an absorber electrode placed in back of the curved grid with respect... | 11/28/2006 |
| 6803570 | Electron transmissive window usable with high pressure electron spectrometry A vacuum window transmitting keV electrons and usable for high-pressure electron analysis such as XPS and AES in which the sample is positioned outside the UHV analyzer chamber, possibly in a controlled gas environment, relatively close to the window. The window inc... | 10/12/2004 |
| 7513982 | Two dimensional magnetron scanning for flat panel sputtering A generally rectangular magnetron placed at the back of a rectangular target to intensify the plasma in a sputter reactor configured for sputtering target material onto a rectangular panel. The magnetron has a size only somewhat less than that of the target and is s... | 04/07/2009 |
| 7316763 | Multiple target tiles with complementary beveled edges forming a slanted gap therebetween A target assembly composed of multiple target tiles bonded in an array to a backing plate of another material. The edges of the tile within the interior of the array are formed with complementary beveled edges to form slanted gaps between the tiles. The gaps may sla... | 01/08/2008 |
| 7294574 | Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement An integrated sputtering method and reactor for copper or aluminum seed layers in which a plasma sputter reactor initially deposits a thin conformal layer onto a substrate including a high-aspect ratio hole subject to the formation of overhangs. After the seed depos... | 11/13/2007 |
| 7294242 | Collimated and long throw magnetron sputtering of nickel/iron films for magnetic recording head applications An apparatus and method for sputter depositing a magnetic film on a substrate to produce a magnetic device such as magnetic recording heads for reading digital information from a storage medium. The apparatus of the invention includes a sputtering chamber containing... | 11/13/2007 |
| 7203393 | MEMS micro mirrors driven by electrodes fabricated on another substrate An array of electrostatically tiltable mirrors are formed in a MEMS structure. A first SOI wafer is etched to form an array of tiltable plates in the silicon device layer joined to the remainder of the wafer through pairs of torsion beams. A second SOI wafer is etch... | 04/10/2007 |
| 7190175 | Orthogonal microwave imaging probe A microwave imaging microscope and associated probe, or a read head. The probe or the read head includes a sensor unit with three fixed electrodes, preferably a stimulating electrode surrounding a sensing electrode and isolated by a grounded electrode. Circuitry cou... | 03/13/2007 |
| 7186319 | Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry A multi-track magnetron having a convolute shape and asymmetric about the target center about which it rotates. A plasma track is formed as a closed loop between opposed inner and outer magnetic poles, preferably as two or three radially arranged and spirally shaped... | 03/06/2007 |
| 7169271 | Magnetron executing planetary motion adjacent a sputtering target A small magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target c... | 01/30/2007 |
| 7137546 | Silicon tube formed of bonded staves Tubular silicon members advantageously formed by extrusion from a silicon melt or by fixing together silicon staves in a barrel shape. A silicon-based wafer support tower is particularly useful for batch-mode thermal chemical vapor deposition and other high-temperat... | 11/21/2006 |
| 7122962 | Plasma display panel with a low K dielectric layer A plasma display panel including a low k dielectric layer. In one embodiment, the dielectric layer is comprises a fluorine-doped silicon oxide layer such as an SiOF layer. In another embodiment, the dielectric layer comprises a Black Diamond™ layer. In certain emb... | 10/17/2006 |
| 7108746 | Silicon fixture with roughened surface supporting wafers in chemical vapor deposition A silicon-based wafer support tower particularly useful for batch-mode thermal chemical vapor deposition. The surfaces of the silicon tower are bead blasted to introduce sub-surface damage, which produces pits and cracks in the surface, which anchor subsequently dep... | 09/19/2006 |
| 7083694 | Adhesive of a silicon and silica composite particularly useful for joining silicon parts A method of joining two silicon members, the adhesive used for the method, and the joined product, especially a silicon tower for supporting multiple silicon wafers. A flowable adhesive is prepared comprising silicon particles of size less than 100 μm and preferabl... | 08/01/2006 |
| 7074693 | Plasma spraying for joining silicon parts A method of joining two silicon members and the bonded assembly in which the members are assembled to place them into alignment across a seam. Silicon derived from silicon powder is plasma sprayed across the seam and forms a silicon coating that bonds to the silicon... | 07/11/2006 |
| 7041201 | Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith One aspect of the invention includes an auxiliary magnet ring positioned outside of the chamber wall of a plasma sputter reactor and being disposed at least partially radially outwardly of an RF coil used to inductively generate a plasma, particularly for sputter et... | 05/09/2006 |
| 7018515 | Selectable dual position magnetron A dual-position magnetron that is rotated about a central axis in back of a sputtering target, particularly for sputtering an edge of a target of a barrier material onto a wafer and cleaning material redeposited at a center of the target. During target cleaning, waf... | 03/28/2006 |
