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| Number | Title | Issue Date |
| 6011448 | Method and apparatus for frequency modulation synthesis A method for frequency modulation synthesis and apparatus for performing the method. The method uses additions rather than multiplies and therefore saves the space and cost of multipliers in circuit implementations. The method saves further resources by u... | 01/04/2000 |
| 5768262 | Methods for performing intelligent network services with an ISDN network terminator located at a subscriber's premise Disclosed are call processing methods which are performed by a network terminator located at a subscriber's premise. The network terminator is coupled to a digital network and a communication device at the subscriber's premise and can perform call waiting... | 06/16/1998 |
| 4845665 | Simulation of computer program external interfaces A method for developing computer program external interfaces by simulating the interfaces to allow intended users to evaluate the design of the program, even before program code for the simulated program is created. The interfaces are executed as a simulated p... | 07/04/1989 |
| 4646250 | Data entry screen A data entry screen for an interactive data entry system provides a means for identifying to a user those fields where data may be entered and those fields in which data must be entered. Initially, the formatted data entry screen is displayed to the user ... | 02/24/1987 |
| 4642763 | Batch file processing A method for improving the performance of application programs which run under a disk operating system (DOS) is disclosed. The problem addressed is that of poor application performance caused by repetitive disk accesses when using large batch files. This ... | 02/10/1987 |
| 4615002 | Concurrent multi-lingual use in data processing system A distributed, interactive data processing system is provided with the ability to allow concurrent multi-lingual use by a plurality of users having different national language preferences. A message model data collection (18) is established by storing mes... | 09/30/1986 |
| 4604690 | Dynamic configuration for added devices A method of on-line reconfiguring a data processing system for an added input/output (I/O) device. A configuration program is called and menus are presented. Based on menu selections, the program causes a device definition to be built. The built definitio... | 08/05/1986 |
| 4595980 | Interactive data processing system having concurrent multi-lingual inputs A distributed, interactive data processing system provided with the ability to allow concurrent multi-lingual use by a plurality of users having different national language preferences is further provided with the ability to be independent of the national... | 06/17/1986 |
| 4586158 | Screen management system A method of providing efficient on-line and interactive application program utilization of an assortment of devices calling for different screen characteristics. An application programmer writes screen definitions for a particular device to be used. These... | 04/29/1986 |
| 4566078 | Concurrent multi-lingual use in data processing systems An improvement to a method of providing a distributed, interactive data processing system with concurrent multi-lingual use by a plurality of users is disclosed. According to the basic method, a message model data collection (18) is established by storing... | 01/21/1986 |
| 4238559 | Two layer resist system A resist mark comprising two layers of resist, one of which is saturated with a diluant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. T... | 12/09/1980 |
| 4229233 | Method for fabricating non-reflective semiconductor surfaces by anisotropic reactive ion etching A differential reactive ion etching process significantly reduces the reflectivity of silicon. The process takes place in a reactive ion etching tool, typically a diode-configured system employing ambient gases which react with the silicon.... | 10/21/1980 |
| 4215156 | Method for fabricating tantalum semiconductor contacts A silicon semiconductor device having contacts which include tantalum. The tantalum is useful in particular for fabricating Schottky barrier diodes having a low barrier height. The method includes: precleaning the silicon substrate prior to depositing the... | 07/29/1980 |
| 4214256 | Tantalum semiconductor contacts and method for fabricating same A silicon semiconductor device having contacts which include tantalum. The tantalum is useful in particular for fabricating Schottky barrier diodes having a low barrier height. The method includes: precleaning the silicon substrate prior to depositing the... | 07/22/1980 |
| 4204009 | Two layer resist system A resist mask comprising two layers of resist, one of which is saturated with a dilutant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. ... | 05/20/1980 |
| 4184909 | Method of forming thin film interconnection systems A method for forming thin film interconnection patterns atop substrates, particularly semiconductor substrates. It features the use of the passivation layer itself, typically glass, as a stable masking material to etch the conductive lines. Conversely, th... | 01/22/1980 |
| 4180604 | Two layer resist system A resist mask comprising two layers of resist, one of which is saturated with a dilutant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. ... | 12/25/1979 |
| 4155778 | Forming semiconductor devices having ion implanted and diffused regions A method for making ion implanted resistors in conjunction with transistors and other devices within an integrated circuit semiconductor substrate. The implantation of the resistors is done after a predeposition diffusion of the base region of the transis... | 05/22/1979 |
| 4151010 | Forming adjacent impurity regions in a semiconductor by oxide masking A method for forming adjacent impurity regions of differing conductivities in a semiconductor substrate without using lithography. N type impurities of a first conductivity are introduced into the substrate to form first impurity regions. The substrate is... | 04/24/1979 |
| 4144493 | Integrated circuit test structure A complex test structure for integrated, semiconductor circuits in which the impurity regions of the test device are elongated, preferably in serpentine fashion. The elongated impurity regions emulate corresponding regions in regular integrated circuit de... | 03/13/1979 |
| 4135954 | Method for fabricating self-aligned semiconductor devices utilizing selectively etchable masking layers A method for fabricating self-aligned regions of semiconductor devices such as bipolar or field effect transistors using three masking layers which are selectively etchable with respect to each other on the surface of the semiconductor body. A dimensional... | 01/23/1979 |
| 4131497 | Method of manufacturing self-aligned semiconductor devices A method of forming extremely small impurity regions within other impurity regions without the need for providing critical masks. In the preferred embodiment this is achieved by forming an undercut band within masking layers atop a substrate to define a f... | 12/26/1978 |
| 4131533 | RF sputtering apparatus having floating anode shield Isolating the anode shield of RF sputtering apparatus from the ground potential reduces the grounded surfaces to which the plasma is exposed and thereby increases the impedance between the plasma and the grounded surfaces. This improvement increases the r... | 12/26/1978 |
| 4110125 | Method for fabricating semiconductor devices A method for fabricating microminiature, planar semiconductor devices in which the number of defects, in particular, pipes, is minimized. The thicknesses of the thermally grown silicon dioxide and of the silicon nitride masking layers which are used for t... | 08/29/1978 |
| 4092442 | Method of depositing thin films utilizing a polyimide mask A polyimide mask is used as an undercoat for a standard resist material during the patterning of an underlying thin film layer by plasma etching. The polyimide mask can withstand the conditions of reactive ion (plasma) etching so that it can be used as a ... | 05/30/1978 |
| 4090006 | Structure for making coplanar layers of thin films A method for forming coplanar thin films, particularly conductor-insulator patterns, on a substrate. A pattern which includes a first thin film and an expendable material deposited thereon is formed on the substrate. The expendable material is selected so... | 05/16/1978 |
| 4080720 | High density semiconductor circuit layout An integrated logic circuit having a novel layout in a semiconductor substrate. The area required for the circuits within the substrate is substantially less than that of prior layouts. Each circuit includes a first device including an elongated impurity ... | 03/28/1978 |
| 4081825 | Conduction-cooled circuit package A circuit package exhibiting an excellent heat transfer path from a semiconductor chip or other heat-generating device to the heat-sink can or cover of the package. A heat-conducting pad is metallurgically bonded to either said cover or a surface of said ... | 03/28/1978 |
| 4070501 | Forming self-aligned via holes in thin film interconnection systems A method for forming self-aligned via holes which are used to interconnect levels of thin films atop substrates. A first level thin film pattern, typically comprising raised metallic stripes, is formed atop the substrate. A first level dielectric material... | 01/24/1978 |
| 4062040 | Field effect transistor structure and method for making same An improved field effect transistor structure which reduces a leakage phenomenon, termed the "sidewalk" effect, between the semiconductor substrate and a conductive silicon dioxide layer disposed over the substrate. The improvement comprises forming a lay... | 12/06/1977 |
| 4051273 | Field effect transistor structure and method of making same An improved field effect transistor structure which reduces a leakage phenomenon, termed the "sidewalk" effect, between the semiconductor substrate and a conductive silicon dioxide layer disposed over the substrate. The improvement comprises forming a lay... | 09/27/1977 |
| 4045594 | Planar insulation of conductive patterns by chemical vapor deposition and sputtering A method using a chemically vapor deposited (CVD) insulator to form a substantially planar layer of insulative material atop a conductive pattern on the surface of a substrate. The invention also features the use of a photoresist both as a mask for formin... | 08/30/1977 |
| 4039867 | Current switch circuit having an active load An improved current switch circuit having an active load. The active load comprises a current source at the collectors of the switch transistors which generates a current which is less than the current generated by the current source at the emitters of th... | 08/02/1977 |
| 4035276 | Making coplanar layers of thin films A method for forming coplanar thin films, particularly conductor-insulator patterns, on a substrate. A pattern which includes a first thin film and an expendable material deposited thereon is formed on the substrate. The expendable material is selected so... | 07/12/1977 |
| 4034469 | Method of making conduction-cooled circuit package A circuit package exhibiting an excellent heat transfer path from a semiconductor chip or other heat-generating device to the heat-sink can or cover of the package. A heat-conducting pad is metallurgically bonded to either said cover or a surface of said ... | 07/12/1977 |
| 4035607 | Integrated heater element array A thermal display comprising an array of semiconductor heater mesas having a larger cross-sectional area at the display surface than at the support surface. The preferred structure is in the shape of a truncated, inverted pyramid. The novel method include... | 07/12/1977 |
| 4034468 | Method for making conduction-cooled circuit package A method for making a circuit package which exhibits an excellent heat transfer path from a semiconductor chip or other heat generating device to the heat sink can or cover of the package. A heat conducting pad is placed in proximate relationship to eithe... | 07/12/1977 |
| 4032962 | High density semiconductor integrated circuit layout An integrated logic circuit having a novel layout in a semiconductor substrate. The area required for the circuits within the substrate is substantially less than that of prior layouts. Each circuit includes a first device including an elongated impurity ... | 06/28/1977 |
| 4028150 | Method for making reliable MOSFET device A substantial increase in the reliability of metal-oxide-semiconductor field effect transistor (MOSFET) devices having a thin gate dielectric is achieved by providing a thin film of phosphosilicate glass (PSG) on the thin dielectric and completely coverin... | 06/07/1977 |
| 4027321 | Reliable MOSFET device and method for making same A substantial increase in the reliability of metal-oxide-semiconductor field effect transistor (MOSFET) devices having a thin gate dielectric is achieved by providing a thin film of phosphosilicate glass (PSG) on the thin dielectric and completely coverin... | 05/31/1977 |
