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| Number | Title | Issue Date |
| 8158325 | Compositions and processes for photolithography Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging. ... | 04/17/2012 |
| 8142988 | Coating compositions for use with an overcoated photoresist Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositi... | 03/27/2012 |
| 7919222 | Coating compositions for use with an overcoated photoresist Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactiv... | 04/05/2011 |
| 7838199 | Polymers and photoresist compositions The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub... | 11/23/2010 |
| 7781141 | Compositions and processes for immersion lithography The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing. ... | 08/24/2010 |
| 7776508 | Antihalation compositions Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslin... | 08/17/2010 |
| 7776506 | Coating compositions for photoresists In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the i... | 08/17/2010 |
| 7704668 | Photoresist compositions and methods and articles of manufacture comprising same The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent... | 04/27/2010 |
| 7700256 | Phenolic/alicyclic copolymers and photoresists The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo ... | 04/20/2010 |
| 7632630 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. ... | 12/15/2009 |
| 7605439 | Antireflective hard mask compositions The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity fr... | 10/20/2009 |
| 7592125 | Photoresist compositions comprising resin blends New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-l... | 09/22/2009 |
| 7585612 | Coating compositions for use with an overcoated photoresist Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactiv... | 09/08/2009 |
| 7582585 | Coating compositions Coating compositions are provided that include a component that is a product of materials comprising an amine and an anhydride and/or an anhydride derivative. Compositions of the invention are particularly useful as an underlying antireflective coating composition (... | 09/01/2009 |
| 7582412 | Multilayer photoresist systems Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resin... | 09/01/2009 |
| 7582360 | Coating compositions for use with an overcoated photoresist In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polyme... | 09/01/2009 |
| 7498115 | Photoresist compositions Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias v... | 03/03/2009 |
| 7429627 | Leveling agents for cast ferroelectric polymer films A substituted (meth)acrylic copolymer leveling agent is useful in producing a ferroelectric polymer film that is especially suitable for use in a data processing device. Also disclosed is a a casting composition which includes the leveling agent, a film stack, and a... | 09/30/2008 |
| 7390609 | Polymers and photoresists comprising same New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred ... | 06/24/2008 |
| 7390608 | Photoresists containing Si-polymers In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin compone... | 06/24/2008 |
| 7378222 | Antihalation compositions Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslin... | 05/27/2008 |
| 7326518 | Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise ... | 02/05/2008 |
| 7309750 | Cyanoadamantyl compounds and polymers Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such ... | 12/18/2007 |
| 7306892 | Multilayer photoresist system Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths. ... | 12/11/2007 |
| 7297616 | Methods, photoresists and substrates for ion-implant lithography New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components. ... | 11/20/2007 |
| 7270935 | Cyanoadamantyl compounds and polymers and photoresists comprising same Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such ... | 09/18/2007 |
| 7244542 | Resins and photoresist compositions comprising same Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be ef... | 07/17/2007 |
| 7220486 | Photoresist compositions New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an... | 05/22/2007 |
| 7217490 | Processes for producing silane monomers and polymers and photoresist compositions comprising same The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide th... | 05/15/2007 |
| 7214410 | Process for selecting solvents for forming films of ferroelectric polymers Disclosed herein is a process of forming a ferroelectric polymer film from a solution, wherein the solvent composition is selected so as to adjust the properties of the film. Films formed by this method have improved properties, particularly with respect to roughnes... | 05/08/2007 |
| 7211365 | Negative photoresists for short wavelength imaging New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 nm. Resists of the invention provide contrast between exposed and unexposed coating layer regions... | 05/01/2007 |
| 7208261 | Polymers, processes for polymer synthesis and photoresist compositions The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or... | 04/24/2007 |
| 7205087 | Solvents and photoresist compositions for 193 nm imaging New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm, particularly 193 nm. Resists of the invention comprise a polymer that is preferably substantially free of aromatic moieties and comprises photoacid-labile repeat unit... | 04/17/2007 |
| 7202009 | Polymers and photoresist compositions for short wavelength imaging This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. ... | 04/10/2007 |
| 7189490 | Photoresists containing sulfonamide component Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilaye... | 03/13/2007 |
| 7183037 | Antireflective coatings with increased etch rates The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention hav... | 02/27/2007 |
| 7166414 | Radiation sensitive compositions and methods The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding... | 01/23/2007 |
| 7163751 | Coating compositions for use with an overcoated photoresist In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polyme... | 01/16/2007 |
| 7147983 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. ... | 12/12/2006 |
| 7132214 | Polymers and photoresist compositions for short wavelength imaging This invention relates to resins and photoresist compositions that comprise such resins. This invention includes new resins that comprise photoacid-labile deblocking groups, wherein the acid-labile moiety is substituted with one or more electron-withdrawing groups. ... | 11/07/2006 |
