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Attorney: Fox, III: Angus C.


Number of patents: 1
Last date: August 03, 1993

NumberTitleIssue Date
5232875Method and apparatus for improving planarity of chemical-mechanical planarization operations
A method and apparatus for improving planarity of chemical mechanical planarization of semiconductor wafers. The wafer is affixed to the planar surface of a wafer carrier. A planar platen, on which is mounted a polishing pad, is moved about in a plane par...
08/03/1993
 
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