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| Number | Title | Issue Date |
| 7634754 | Simulation of aerial images A method for generating a simulated aerial image of a mask projected by an optical system includes determining a coherence characteristic of the optical system. A coherent decomposition of the optical system is computed based on the coherence characteristic. The dec... | 12/15/2009 |
| 7630069 | Illumination system for optical inspection Apparatus for generating optical radiation includes a laser, which is configured to operate in multiple transverse modes simultaneously so as to generate an input beam, which is characterized by a first speckle contrast. The transverse modes of the input beam are op... | 12/08/2009 |
| 7620932 | Simulation of aerial images A method for generating a simulated aerial image of a mask projected by an optical system includes determining a coherence characteristic of the optical system. A coherent decomposition of the optical system is computed based on the coherence characteristic. The dec... | 11/17/2009 |
| 7619735 | Optical inspection using variable apodization A method for optical inspection of a surface includes selecting an apodization scheme in response to a characteristic of the surface, and applying an apodizer to apodize a beam of radiation in response to the selected apodization scheme. The apodized beam of radiati... | 11/17/2009 |
| 7619203 | High throughput multi beam detection system and method A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arra... | 11/17/2009 |
| 7602960 | System and method for measuring thin film thickness variations and for compensating for the variations A method for measuring thin film thickness variations of inspected wafer that includes an upper non-opaque thin film. The method including (i) scanning the wafer and obtain wafer image that includes that includes die images each of which composed of pixels, (ii) ide... | 10/13/2009 |
| 7602197 | High current electron beam inspection A method and apparatus for wafer inspection. The apparatus is capable of testing a sample having a first layer that is at least partly conductive and a second, dielectric layer formed over the first layer, following production of contact openings in the second layer... | 10/13/2009 |
| 7601944 | High throughput multi beam detection system and method A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arra... | 10/13/2009 |
| 7590278 | Measurement of corner roundness A method for analyzing an image includes identifying a curved segment of a contour that is associated with noise. The curved segment is smoothed so as to reduce the noise that is associated with the curved segment, thereby providing a smoothed segment. The smoothed ... | 09/15/2009 |
| 7589835 | High speed laser scanning inspection system An optical inspection system rapidly evaluates a substrate by illumination of an area of a substrate larger than a diffraction-limited spot using a coherent laser beam by breaking temporal or spatial coherence. Picosecond or femtosecond pulses from a modelocked lase... | 09/15/2009 |
| 7587700 | Process monitoring system and method for processing a large number of sub-micron measurement targets The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurem... | 09/08/2009 |
| 7586959 | Speckle reduction with transparent blocks Apparatus for reducing speckle, including a first coherence-reducing component, having a first array of transparent first elements arranged to receive different, respective first portions of a collimated light beam that is incident on the first component, the first ... | 09/08/2009 |
| 7586599 | Method and system for detecting defects A method for defect detection includes: (i) scanning at least one wafer by a monitoring system and providing defect size information for each defect that belongs to a group of defects; (ii) scanning the at least one wafer by a wafer inspection system that includes m... | 09/08/2009 |
| 7586596 | Field folding optical method for imaging system Apparatus for inspecting a surface of a sample, including a detector and folding optics. The folding optics are configured to receive radiation arising from a first region of the surface and from a second region of the surface. The first region and the second region... | 09/08/2009 |
| 7576348 | One-dimensional phase contrast microscopy with a traveling lens generated by a step function change A method for imaging a surface includes generating a traveling lens in an acousto-optic material and incorporating a traveling mask into a portion of the traveling lens so as to produce a composite traveling lens. The method further includes irradiating the composit... | 08/18/2009 |
| 7571017 | Intelligent data multiplexer An Intelligent Data Multiplexer (“IDM”) can be used to interface a plurality of host computers with a semiconductor manufacturing tool. In one embodiment, the IDM has a plurality of host-side ports configured to receive messages from each of the host computers i... | 08/04/2009 |
| 7544950 | Microscope with vacuum objective A microscope for inspecting a surface in an evacuated volume, including an optical objective assembly which is located in the evacuated volume in proximity to the surface. The assembly is arranged to collect and convey radiation from the surface while focusing the r... | 06/09/2009 |
| 7535001 | Method and system for focusing a charged particle beam A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample and collecting a first set of detection signals; (b) altering a focal... | 05/19/2009 |
| 7528940 | System and method for inspecting an object using an acousto-optic device A system and method for inspecting an object. The system includes: a traveling lens acousto-optic device adapted to generate a traveling lens that propagates through an active region of the traveling lens acousto-optic device; a first scanner, adapted to direct a be... | 05/05/2009 |
| 7528614 | Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam A method for electrically testing a wafer that includes: receiving a wafer having a first layer that is at least partly conductive and a second layer formed over the first layer, following production of openings in the second layer; directing towards the wafer a fir... | 05/05/2009 |
| 7525091 | Charged particle beam system and a method for inspecting a sample A method and system for inspecting an inspected object. The system includes: a detector adapted to detect charged particles scattered from a sample; a magnetic lens adapted to generate a magnetic field such as to direct a charge particle beam towards a sample and an... | 04/28/2009 |
| 7521700 | Raster frame beam system for electron beam lithography A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scann... | 04/21/2009 |
| 7518718 | High throughput inspection system and a method for generating transmitted and/or reflected images Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are... | 04/14/2009 |
| 7518391 | Probe card and a method for detecting defects using a probe card and an additional inspection A method and system for defect localization including (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, so as to charg... | 04/14/2009 |
| 7518094 | Compensation of nonuniformity among multiple sensing diodes in a multiple sensor device A method and system for the compensation of nonuniformity among a plurality of light sensing diodes adapted to convert light to a current output. A system embodiment includes a plurality of trans-impedance amplifier circuits, each trans-impedance amplifier circuit h... | 04/14/2009 |
| 7511935 | Electrostatic chuck and method of its manufacture An electrostatic chuck structure for holding an article is presented. The chuck structure comprises an electrically insulating chuck body layer having a first flat surface for holding the article thereon, and a second opposite surface having a honeycombed pattern in... | 03/31/2009 |
| 7504647 | Method and apparatus for inspecting a sample having a controller for determining an estimated height of the detector from the sample Apparatus for optical inspection of a sample includes a detector assembly, which is configured to receive radiation from a focal area on the sample, and a translation mechanism, which is operative to impart motion to at least one of the detector assembly and the sam... | 03/17/2009 |
| 7504622 | High throughput multi beam detection system and method A high-throughput inspection system and method. The system includes: (i) a charged particles to light converter adapted to convert a secondary array of charged particle beams to a first array of light beams; wherein the first array of light beams is characterized by... | 03/17/2009 |
| 7476875 | Contact opening metrology A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openin... | 01/13/2009 |
| 7473911 | Specimen current mapper A method for process monitoring includes receiving a sample having a first layer that is at least partly conductive and a second layer formed over the first layer, following production of contact openings in the second layer. A beam of charged particles is directed ... | 01/06/2009 |
| 7468506 | Spot grid array scanning system A method for scanning a surface, consisting of focusing an array of beams using optics having an axis, so as to irradiate a region of the surface intercepted by the axis, such that each beam irradiates a portion of a respective sub-region within the region. The meth... | 12/23/2008 |
| 7468507 | Optical spot grid array scanning system A method for scanning a surface, consisting of focusing an array of optical beams using optics having an axis, so as to illuminate a region of the surface intercepted by the axis, such that each optical beam illuminates a portion of a respective sub-region within th... | 12/23/2008 |
| 7463351 | Process and assembly for non-destructive surface inspection An optical system for detecting defects on a wafer that includes a device for producing a beam and directing the beam onto the wafer surface, producing an illuminated spot on the wafer's surface. The system further includes a detector detecting light, and a mirrored... | 12/09/2008 |
| 7460221 | Method and system for detecting defects System for scanning a surface, comprising a light source producing an illuminating light beam; an objective lens assembly, located between the light source and the surface; a plurality of interchangeable telescopes, a selected one of the interchangeable telescopes b... | 12/02/2008 |
| 7430104 | Electrostatic chuck for wafer metrology and inspection equipment An electrostatic chuck is configured for electrostatically securing a wafer while limiting charge on the wafer and physical contact between the electrostatic chuck and the wafer. The electrostatic chuck has a pair of electrodes and at least one support pin electrica... | 09/30/2008 |
| 7428850 | Integrated in situ scanning electronic microscope review station in semiconductor wafers and photomasks optical inspection system A substrate inspection system includes two or more inspection modules supported on a plate. A chamber is supported beneath the plate by a translation system, which is configured to provide horizontal displacement of the chamber under the plate to permit loading and ... | 09/30/2008 |
| 7410737 | System and method for process variation monitor A method to extend the process monitoring capabilities of a semiconductor wafer optical inspection system so as to be able to detect low-resolution effects of process variations over the surface of a wafer at much higher sensitivity than heretofore possible. The met... | 08/12/2008 |
| 7403336 | Broadband imaging system and method A method and system are presented for use in imaging broadband light. A plurality of substantially narrowband light components of the broadband light are passed through an array of spectral imaging modules. Each of the spectral imaging modules is configured for imag... | 07/22/2008 |
| 7400390 | Inspection system and a method for aerial reticle inspection A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characte... | 07/15/2008 |
| 7397552 | Optical inspection with alternating configurations An imaging system for inspection of a sample includes an illumination module, which irradiates a surface of the sample with pulsed optical radiation. A mechanical scanner translates at least one of the sample and part of the imaging system so as to scan an area irra... | 07/08/2008 |
