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| Number | Title | Issue Date |
| 8119529 | Method for chemical mechanical polishing a substrate A method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate comprises silicon dioxide; providing a chemical mechanical polishing composition, wherein the chemical mechanical polishing composition comprises: wat... | 02/21/2012 |
| 8119506 | Group 6a/group 3a ink and methods of making and using same A selenium/Group 3a ink, comprising (a) a selenium/Group 3a complex which comprises a combination of, as initial components: a selenium component comprising selenium; an organic chalcogenide component having a formula selected from RZ—Z′R′ and R | 02/21/2012 |
| 8118897 | Mix head assembly for forming chemical mechanical polishing pads A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized. ... | 02/21/2012 |
| 8118644 | Chemical mechanical polishing pad having integral identification feature Chemical mechanical polishing pads having a polishing layer with a polishing surface adapted for polishing a substrate are provided, wherein the polishing layer has a unique integral identification feature; wherein the unique integral identification feature is non-p... | 02/21/2012 |
| 8118641 | Chemical mechanical polishing pad having window with integral identification feature Chemical mechanical polishing pads having a window with an integral identification feature, wherein the window has a polishing face and a nonpolishing face, wherein the integral identification feature is observable through the window, and wherein the integral identi... | 02/21/2012 |
| 8088467 | Curable compositions Curable compositions are disclosed. Also disclosed are optical media comprising said curable compositions when cured and methods of making such optical media. ... | 01/03/2012 |
| 8084543 | Light-scattering compositions Light-scattering compositions comprising diffuser polymer particles are disclosed. Also disclosed are methods of making and using the light-scattering compositions. ... | 12/27/2011 |
| 8083570 | Chemical mechanical polishing pad having sealed window A multilayer chemical mechanical polishing pad is provided, having a polishing layer with a polishing surface, a polishing layer interfacial region parallel to the polishing surface and an outer perimeter; a porous subpad layer with a bottom surface, a porous subpad... | 12/27/2011 |
| 8071479 | Chemical mechanical polishing composition and methods relating thereto A method for chemical mechanical polishing of a substrate comprising a barrier material in the presence of at least one of an interconnect metal and a low-k dielectric material using a chemical mechanical polishing composition comprising water; 1 to 40 wt % abrasive... | 12/06/2011 |
| 8070047 | Flux composition and method of soldering A flux composition is provided, comprising, as an initial component: a fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen... | 12/06/2011 |
| 8070046 | Amine flux composition and method of soldering An amine flux composition is provided, comprising, as an initial component: an amine fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected f... | 12/06/2011 |
| 8070045 | Curable amine flux composition and method of soldering A curable amine flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; an amine fluxing agent represented by formula I: wherein R1, R | 12/06/2011 |
| 8070044 | Polyamine flux composition and method of soldering A polyamine flux composition is provided, comprising, as an initial component: a polyamine fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently sele... | 12/06/2011 |
| 8070043 | Curable flux composition and method of soldering A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a fluxing agent represented by formula I: wherein R1, R2, R... | 12/06/2011 |
| 8025813 | Chemical mechanical polishing composition and methods relating thereto A chemical mechanical polishing composition useful for chemical mechanical polishing of a substrate, wherein the substrate comprises a silicon oxide material and a silicon nitride material; and methods of making and using the chemical mechanical polishing compositio... | 09/27/2011 |
| 7947098 | Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein i... | 05/24/2011 |
| 7893162 | Light-scattering compositions Light-scattering compositions comprising diffuser polymer particles are disclosed. Also disclosed are methods of making and using the light-scattering compositions. ... | 02/22/2011 |
| 7846856 | Method of making a fiber containing an antimicrobial composition Fibers that durably contain antimicrobial materials such that the antimicrobial materials are resistant to being abraided away or washed off during use. The antimicrobial materials contained in the fibers are not prone to the development of resistant strains of bact... | 12/07/2010 |
| 7833927 | Single site palladium catalyst complexes Catalyst structures comprising a single palladium metal center and a substituted tri-arylphosphine ligand. Also disclosed are methods of making and using the catalyst structures to facilitate polymerization reactions and Heck coupling reactions. ... | 11/16/2010 |
| 7828980 | Water treatment process A process for removing target ion(s) from a for-treatment water containing the target ion(s) is provided. Also provided is a method for improving the efficiency of an electrochemical cell for target ion(s) destruction. ... | 11/09/2010 |
| 7820005 | Multilayer chemical mechanical polishing pad manufacturing process A method for making a multilayer chemical mechanical polishing pad comprising: providing a polishing layer, providing a subpad layer, optionally providing additional layers, providing an unset reactive hot melt adhesive, applying the unset reactive hot melt adhesive... | 10/26/2010 |
| 7807765 | Heterocyclic latex copolymer and methods of making and using same A latex copolymer composition comprising >5 wt % of polymerized units derived from a monomer X containing an unsaturated heterocycle, wherein the latex copolymer composition comprises ≦1,000 ppm of residual monomer X is disclosed. Also disclosed are methods of mak... | 10/05/2010 |
| 7807038 | Method for electrochemical mechanical polishing The present invention provides a method of electrochemical polishing of a workpiece using a polishing pad having a cellular polymeric layer overlying a conductive substrate, the cellular polymeric layer having a thickness less than 1.5 mm; wherein the cellular polym... | 10/05/2010 |
| 7794562 | Method of manufacturing a chemical mechanical polishing pad A method of manufacturing a chemical mechanical polishing pad is provided, comprising: providing a polishing layer; providing a chemical mechanical polishing pad manufacturing assembly, comprising: a subpad layer having a top surface, a bottom surface and at least t... | 09/14/2010 |
| 7749934 | Protected catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers A method for polymerizing ethylenically unsaturated monomers, including non-polar olefinic monomers, polar olefinic monomers, and combinations thereof, using a protected catalytic composition in an aqueous medium, is disclosed. An aqueous dispersion containing the p... | 07/06/2010 |
| 7671150 | Polymerization of acyclic aliphatic olefins A robust, impurity tolerant method of making substantially linear polymers of acyclic aliphatic olefins using catalyst complexes comprising a single palladium metal center and a substituted tri-aryl ligand is disclosed. ... | 03/02/2010 |
| 7645186 | Chemical mechanical polishing pad manufacturing assembly A chemical mechanical polishing pad manufacturing assembly is provided having a subpad layer having a top surface and a bottom surface; a backing plate having a top side and a bottom side; a sacrificial layer having at least two recessed areas designed to facilitate... | 01/12/2010 |
| 7635291 | Interpenetrating network for chemical mechanical polishing Chemical mechanical polishing pads are provided, wherein the chemical mechanical polishing pads have a polishing layer comprising an interpenetrating network including a continuous non-fugitive phase and a substantially co-continuous fugitive phase. Also provided ar... | 12/22/2009 |
| 7618529 | Polishing pad for electrochemical mechanical polishing The present invention provides polishing pad for electrochemical mechanical polishing. The pad comprises a cellular polymeric layer overlying a conductive substrate, the cellular polymeric layer having a thickness less than 1.5 mm. ... | 11/17/2009 |
| 7598317 | Precision fragmentation assemblages and olefin polymerization catalysts made therefrom A precision fragmentation assemblage is disclosed, along with precision fragmentation assemblage catalysts derivable therefrom. A method for the preparation of a precision fragmentation assemblage is also disclosed, along with a method for preparing precision fragme... | 10/06/2009 |
| 7598303 | Process for making an aqueous dispersion A process for making an aqueous dispersion is provided. More specifically, a process for making an aqueous dispersion having at least two polymeric components is provided. ... | 10/06/2009 |
| 7530887 | Chemical mechanical polishing pad with controlled wetting Chemical mechanical polishing pads are provided, wherein the chemical mechanical polishing pads have a polishing layer comprising a polishing texture that exhibits a dimensionless roughness, R, is between 0.01 and 0.75. Also provided are methods of making the chemic... | 05/12/2009 |
| 7524912 | Preparation of linear ethylene-acrylate copolymers with palladium catalysts and free radical scavengers A polymerizable composition including a late transition metal complex, a non-polar olefin, a polar olefin, and a free radical scavenger, wherein the polymerizable composition is capable of forming a linear poly[(non-polar olefin)-(polar olefin)] substantially free o... | 04/28/2009 |
| 7524905 | Substantially linear copolymers and methods of making the same Substantially linear copolymers derived from at least one acyclic aliphatic olefin monomer and at least one nitrogen containing vinyl monomer, wherein the at least one nitrogen containing vinyl monomer is according to Formula (I) | 04/28/2009 |
| 7504466 | High solids preparation of crosslinked polymer particles A process for preparing crosslinked polymer particles at high solids levels (i.e., >40 wt %). Also provided is a method for predicting whether a selection of reaction conditions for preparing crosslinked polymer particles will exhibit a potential for forming a gel a... | 03/17/2009 |
| 7458885 | Chemical mechanical polishing pad and methods of making and using same Shape memory chemical mechanical polishing pads are provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided are methods of making the shape memory chemical mechanical polishing pads and for... | 12/02/2008 |
| 7455571 | Window polishing pad A window polishing pad having a reduced stress pad window formed therein for performing optical end point detection are provided, wherein the window polishing pad comprises a pad window and a pressure relief channel, wherein the pressure relief channel extends to an... | 11/25/2008 |
| 7435701 | Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers A catalytic composition, including a neutral metal-pair complex, is disclosed, along with a method for its preparation. A method for the polymerization of ethylenically unsaturated monomers using the catalytic composition, and the addition polymers produced thereby ... | 10/14/2008 |
| 7435364 | Method for forming a porous polishing pad The present invention provides a method of forming a chemical mechanical polishing pad comprising providing a polymeric matrix with fluid-filled unexpanded microspheres, curing the polymeric matrix and heating the polymeric matrix and the microspheres to expand the ... | 10/14/2008 |
| 7419649 | Macroreticular carbonaceous material useful in energy storing devices The present invention relates to an energy storage device comprising a macroreticular carbonaceous material having a distribution of micropores, mesopores and macropores wherein the macroreticular carbonaceous material has a total surface area of from greater than 5... | 09/02/2008 |
