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| Number | Title | Issue Date |
| 4859539 | Optically brightened polyolefin coated paper support An improved photographic support, especially useful for color prints, is comprised of a paper base material having thereon a polyolefin coating containing a white pigment and a mixture of optical brighteners, such mixture comprising certain fluorescent bi... | 08/22/1989 |
| 4835021 | Coating process A method of continuously forming on a moving film web a uniform, tack-free coating of a crosslinked, thermoset polymer resulting from the reaction between reactive fluid components by means of a laminar flow extrusion coating hopper wherein the reactive c... | 05/30/1989 |
| 4832991 | Coating process A process for continuous coating of a reactive clearcoat composition on a painted-coated moving plastic film web by means of a laminar flow extrusion coating hopper wherein the reactive components of the composition are fed continuously to a mixing zone a... | 05/23/1989 |
| 4795692 | Negative-working polymers useful as X-ray or E-beam resists Radiation-sensitive interpolymers comprising 10-90 mole % of a polymerized maleimide monomer are useful as resists having high sensitivity to E-beams or X-rays.... | 01/03/1989 |
| 4794071 | Optically brightened photographic silver halide element with a polyolefin paper coated support An improved photographic support, especially useful for color prints, is comprised of a paper base material having thereon a polyolefin coating containing a white pigment and a mixture of optical brighteners, such mixture comprising certain fluorescent bi... | 12/27/1988 |
| 4792517 | Luminate for the formation of beam leads for IC chip bonding A laminate, adapted for manufacturing frames of metal beam leads that are bonded to integrated circuit chips, comprises (a) a flexible metal strip, (b) a layer of a first resist adhered to one surface of the metal strip, and (c) a layer of a second resist adhe... | 12/20/1988 |
| 4788127 | Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasm... | 11/29/1988 |
| 4767883 | Polymerizable cyclohexyleneoxyalkyl acrylates A cyclohexyleneoxyalkyl acrylate monomer having the structural formula: ##STR1## wherein R is H or CH3, a is an integer of from 1 to 10 and b is 1 or 2 is useful in polymerizable compositions.... | 08/30/1988 |
| 4737439 | Photographic compositions and elements including internal latent image silver halide grains and nucleating agents therefor A radiation-sensitive composition including silver halide grains capable of forming an internal latent image and a nucleating agent is useful as a coating on a support to form a photographic element.... | 04/12/1988 |
| 4719166 | Positive-working photoresist elements containing anti-reflective butadienyl dyes which are thermally stable at temperatures of at least 200° C. Positive-working photoresist elements are protected against reflection of activating radiation from the substrate by incorporation of certain butadienyl dyes in a photoresist layer, an anti-reflective layer or a planarizing layer. These dyes have superior... | 01/12/1988 |
| 4710557 | Polymers of thiophenyl thioacrylate and thiomethacrylate monomers A monomer having the formula: ##EQU1## wherein: R1 is H or methyl; R2, R3 and R4 are independently alkyl, aryl, or aralkyl; and R5 and R6 are independently H, halo, alkyl, aryl, aralkyl, th... | 12/01/1987 |
| 4684599 | Photoresist compositions containing quinone sensitizer Positive-working imaging compositions comprise a polymeric binder and a quinone sensitizer which provides alkali solubility to the composition when exposed to activating radiation.... | 08/04/1987 |
| 4684597 | Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor There is disclosed a photoresist composition comprising a light-sensitive, quinone diazide polymer, a binder and a benzene monomer trisubstituted with a diazo-naphthoquinone-sulfonyloxy group. The composition is improved in that the diazo-naphthoquinone-s... | 08/04/1987 |
| 4668608 | Negative-working, non-swelling resist There are disclosed negative-working resist compositions featuring a binder and a radiation-sensitive compound that loses HX upon exposure, to become less soluble in an aqueous base. X is selected from the group consisting of --CN, halide, and --SO2 | 05/26/1987 |
| 4668606 | Positive photoresist with antireflection coating having thermal stability There are disclosed antireflecting compounds and layers used in admixture with or adjacent to a positive-working, non-silver halide photosensitive layer. The resulting antireflecting layers have unexpected thermal resistances, needed for the thermal plana... | 05/26/1987 |
| 4654431 | Photopolymerizable thioacrylate monomers A novel photocurable monomer having the formula: ##STR1## wherein: Ar is arylene; R1 is H, alkyl, alkoxy, amino, halogen, sulfide, sulfoxide, sulfonate, aryl or heterocyclic; R2 is H, alkyl, aryl or aralkyl; and R3 is H or... | 03/31/1987 |
| 4606864 | Thiophenyl thioacrylate and thiomethacrylate monomers A monomer having the formula: ##STR1## wherein: R1 is H or methyl; R2, R3 and R4 are independently alkyl, aryl, or aralkyl; and R5 and R6 are independently H, halo, alkyl, aryl, aralkyl, th... | 08/19/1986 |
| 4605697 | Substituted sulfonamido compounds, photosensitive elements, film units, and processes for retaining a photographic image with same A nondiffusible sulfonamido compound which is alkali-cleavable upon oxidation to release a diffusible photographically useful material, said nondiffusible sulfonamido compound having the formula: ##STR1## wherein: (a) R1 is alkyl, aryl sul... | 08/12/1986 |
