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Actor Marlon Brando has four patents, all named "Drumhead tensioning device and method."
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| Number | Title | Issue Date |
| 8175345 | Unitized ergonomic two-dimensional fingerprint motion tracking device and method A sensor which uses a plurality of partial fingerprint readers (imagers), and various computational algorithms, to detect changes in fingerprint images as a function of finger movement. The sensor can provide both finger motion information and fingerprint images. Th... | 05/08/2012 |
| 8165355 | Method and apparatus for fingerprint motion tracking using an in-line array for use in navigation applications The invention provides an independent relative motion sensor for use in navigation operations using a fingerprint that do not require the power demanded by conventional devices. The independent relative motion sensor includes a linear array of sensing elements that ... | 04/24/2012 |
| 8131026 | Method and apparatus for fingerprint image reconstruction Enhanced accuracy finger position and motion sensors devices, algorithms, and methods are disclosed that can be used in a variety of different applications. The sensors can be used in conjunction with partial fingerprint imagers to produce improved fingerprint scann... | 03/06/2012 |
| 8116540 | Apparatus and method for reducing noise in fingerprint sensing circuits An apparatus for reducing noise in fingerprint sensing circuits is disclosed in one embodiment of the invention as including a fingerprint sensing area onto which a user can apply a fingerprint. An analog front end is coupled to the fingerprint sensing area and is c... | 02/14/2012 |
| 8107212 | Apparatus and method for protecting fingerprint sensing circuitry from electrostatic discharge A fingerprint sensor in accordance with the invention includes a non-conductive substrate providing a first surface onto which a user can apply a fingerprint to be sensed. A sensor circuit is applied to a second surface of the non-conductive substrate opposite the f... | 01/31/2012 |
| 8077935 | Methods and apparatus for acquiring a swiped fingerprint image A method for assisting a user of a fingerprint sensing system includes sensing a position of a user's finger relative to a swiped fingerprint image sensor, and providing to the user, in response to the sensed finger position, an indication of finger placement relati... | 12/13/2011 |
| 8005276 | Apparatus and method for reducing parasitic capacitive coupling and noise in fingerprint sensing circuits A fingerprint sensing circuit for reducing noise and parasitic capacitive coupling is disclosed in one embodiment of the invention as including a plurality of transmitting elements to sequentially emit a probing signal. A digital ground is provided to ground digital... | 08/23/2011 |
| 7476887 | EUV light source optical elements Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in pla... | 01/13/2009 |
| 7453077 | EUV light source An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising... | 11/18/2008 |
| 7449704 | EUV light source An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having refl... | 11/11/2008 |
| 7449703 | Method and apparatus for EUV plasma source target delivery target material handling An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a second container in fluid contact with the target material reservoir; a f... | 11/11/2008 |
| 7439530 | LPP EUV light source drive laser system An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive la... | 10/21/2008 |
| 7415056 | Confocal pulse stretcher A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse... | 08/19/2008 |
| 7411203 | EUV light source An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets a... | 08/12/2008 |
| 7402825 | LPP EUV drive laser input system A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser ent... | 07/22/2008 |
| 7388220 | EUV light source An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light... | 06/17/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7369597 | Laser output light pulse stretcher Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and com... | 05/06/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7366219 | Line narrowing module A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive c... | 04/29/2008 |
| 7346093 | DUV light source optical element improvements A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mount... | 03/18/2008 |
| 7256893 | Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser An apparatus and method for controlling a laser system is disclosed which may comprise a spectrometer adapted to measure an unknown bandwidth of a spectrum of light emitted from the laser, which may comprise an optical bandwidth measuring unit adapted to provide as ... | 08/14/2007 |
| 7230964 | Lithography laser with beam delivery and beam pointing control The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam ... | 06/12/2007 |
| 7218661 | Line selected Ftwo chamber laser system An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a pa... | 05/15/2007 |
| 7209507 | Method and apparatus for controlling the output of a gas discharge MOPA laser system A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a... | 04/24/2007 |
| 7203562 | Process monitoring system for lithography lasers A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each o... | 04/10/2007 |
| 7203217 | Narrow band electric discharge gas laser having improved beam direction stability An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge o... | 04/10/2007 |
| 7203216 | Timing control for two-chamber gas discharge laser system Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to... | 04/10/2007 |
| 7196342 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a... | 03/27/2007 |
| 7193228 | EUV light source optical elements Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in pla... | 03/20/2007 |
| 7190707 | Gas discharge laser light source beam delivery unit A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser... | 03/13/2007 |
| 7190708 | Annealed copper alloy electrodes for fluorine containing gas discharge lasers An excimer laser with a laser chamber containing a circulating laser gas containing fluorine and long-life, annealed, copper alloy electrodes. Electrode lifetime is increased by annealing them after the electrodes are machined. This annealing relieves the surface st... | 03/13/2007 |
| 7180081 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 02/20/2007 |
| 7141806 | EUV light source collector erosion mitigation An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials creat... | 11/28/2006 |
| 7139301 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 11/21/2006 |
| 7136169 | Etalon testing system and process The present invention provides a relatively simple etalon testing system and process for measuring cavity error of etalons to high precision. It works equally well on solid and air-spaced designs. This invention should be a great aid in the manufacture of high perfo... | 11/14/2006 |
| 7132123 | High rep-rate laser with improved electrodes The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is ... | 11/07/2006 |
| 7122816 | Method and apparatus for EUV light source target material handling An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a se... | 10/17/2006 |
| 7116695 | Laser output light pulse beam parameter transient correction system An apparatus and method for producing laser output light pulses in bursts of pulses, at a selected pulse repetition rate, forming a laser output light beam, separated by an off time is disclosed, which may comprise a laser output light pulse beam parameter adjustmen... | 10/03/2006 |
| 7109503 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 09/19/2006 |
