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| Number | Title | Issue Date |
| 7382815 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 06/03/2008 |
| 7368741 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 05/06/2008 |
| 7339973 | Electrodes for fluorine gas discharge lasers Fluorine gas discharge laser electrodes and electrode systems that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition electrodes may comprise a first discharge s... | 03/04/2008 |
| 7323703 | EUV light source An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape ha... | 01/29/2008 |
| 7321607 | External optics and chamber support system A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an... | 01/22/2008 |
| 7317536 | Spectral bandwidth metrology for high repetition rate gas discharge lasers A bandwidth meter apparatus and method for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicati... | 01/08/2008 |
| 7317196 | LPP EUV light source An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target wi... | 01/08/2008 |
| 7309871 | Collector for EUV light source An apparatus/method may comprise, a multi-layer reflecting coating forming an EUV reflective surface which may comprise an inter-diffusion barrier layer which may comprise a carbide selected from the group ZrC and NbC or a boride selected from the group ZrB2 | 12/18/2007 |
| 7304748 | Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light A bandwidth meter method and apparatus for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter is disclosed, which may comprise an optical bandwidth monitor providing a first output representative of a first parameter whi... | 12/04/2007 |
| 7301980 | Halogen gas discharge laser electrodes A gas discharge laser includes a laser chamber containing a halogen laser gas, two electrode elements defining a cathode and an anode, each having a discharge receiving region defining two longitudinal edges and having a region width defining a width of an electric ... | 11/27/2007 |
| 7298770 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 11/20/2007 |
| 7295591 | Long-pulse pulse power system for gas discharge laser A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the h... | 11/13/2007 |
| 7292343 | Gas discharge MOPA laser spectral analysis module A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwid... | 11/06/2007 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7288778 | Collector for EUV light source It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first ... | 10/30/2007 |
| 7288777 | Collector for EUV light source An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light sou... | 10/30/2007 |
| 7283575 | Narrow band electric discharge gas laser having improved beam direction stability An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge o... | 10/16/2007 |
| 7277466 | High power gas discharge laser with helium purged line narrowing unit A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the use of helium purge ... | 10/02/2007 |
| 7277464 | Method and apparatus for controlling the output of a gas discharge laser system The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine. ... | 10/02/2007 |
| 7230965 | Anodes for fluorine gas discharge lasers Electrodes for a fluorine gas discharge laser are disclosed which may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the ele... | 06/12/2007 |
| 7217940 | Collector for EUV light source A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second... | 05/15/2007 |
| 7180083 | EUV light source collector erosion mitigation An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interac... | 02/20/2007 |
| 7164144 | EUV light source A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiati... | 01/16/2007 |
| 7158840 | Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems A method and apparatus is disclosed for acquiring and processing parameters used to adjust and tune a controller used, for example, to govern and compensate for motion, including vibrations and disturbances, in a physical system, such as a piece of manufacturing equ... | 01/02/2007 |
| 7154928 | Laser output beam wavefront splitter for bandwidth spectrum control Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection o... | 12/26/2006 |
| 7149234 | High repetition rate gas discharge laser with precise pulse timing control A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred... | 12/12/2006 |
| 7101203 | Method and apparatus for electronically interconnecting high voltage modules positioned in relatively close proximity Apparatus and method for electrically connecting two closely positioned high voltage modules with little or no bend and without any loops in an electrical interconnecting coaxial cable may have a high voltage connector attached to at least a portion of the cable on ... | 09/05/2006 |
| 7087914 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 08/08/2006 |
| 7079556 | Bandwidth control technique for a laser A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In ... | 07/18/2006 |
| 7061959 | Laser thin film poly-silicon annealing system A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier confi... | 06/13/2006 |
| 7061961 | Very narrow band, two chamber, high rep-rate gas discharge laser system An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the... | 06/13/2006 |
| 7058107 | Line selected F2 two chamber laser system An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a pa... | 06/06/2006 |
| 7003012 | Discharge laser with porous insulating layer covering anode discharge surface A gas discharge laser having an elongated cathode and an elongated anode with a porous insulating layer covering the anode discharge surface. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electr... | 02/21/2006 |
| 7002168 | Dense plasma focus radiation source A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cool... | 02/21/2006 |
| 6882674 | Four KHz gas discharge laser system The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source ... | 04/19/2005 |
| 6872961 | Vibration control utilizing signal detrending A motion control system for reducing vibration in moving components. The system includes a position control drive and a vibration control drive. At least one position sensor is used to provide feedback signals which are in turn used to provide control signals for bo... | 03/29/2005 |
| 6865210 | Timing control for two-chamber gas discharge laser system Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to... | 03/08/2005 |
| 6853653 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 02/08/2005 |
| 6839372 | Gas discharge ultraviolet laser with enclosed beam path with added oxidizer The present invention provides a gas discharge ultraviolet laser capable of producing a high quality pulsed ultraviolet laser beam at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater and having an enclosed beam path at least a portion of which c... | 01/04/2005 |
| 6815700 | Plasma focus light source with improved pulse power system The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse p... | 11/09/2004 |
