Celebrity Inventors
Glam girl Heddy Lamar may have used her good looks to good effect on the silver screen, but she put her smarts to better use as an inventor. During World War II, she co-patented a frequency-switching system for torpedo guidance that was considered years ahead of its time.
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| Number | Title | Issue Date |
| 7846264 | Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution ... | 12/07/2010 |
| 7850786 | Method of improving corrosion resistance of stainless steel surfaces by a process of passivation Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate conta... | 12/14/2010 |
| 7798388 | Method of diffusion bonding a fluid flow apparatus The present invention relates to a method of diffusion bonding of steel and steel alloys, to fabricate a fluid delivery system of the kind which would be useful in semiconductor processing and in other applications which require high purity fluid handling. ... | 09/21/2010 |
| 7785672 | Method of controlling the film properties of PECVD-deposited thin films We have discovered methods of controlling a combination of PECVD deposition process parameters during deposition of thin films which provides improved control over surface standing wave effects which affect deposited film thickness uniformity and physical property u... | 08/31/2010 |
| 7625679 | Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register the particle beam to the pre-existing pattern. Use of a position fid... | 12/01/2009 |
| 7618548 | Silicon-containing structure with deep etched features, and method of manufacture We have developed an uncomplicated method of plasma etching deeply recessed features such as deep trenches, of at least 5 μm in depth, in a silicon-containing substrate, in a manner which generates smooth sidewalls, having a roughness of less than about 1 μm, typi... | 11/17/2009 |
| 7589031 | Method of avoiding haze formation on surfaces of silicon-containing PECVD-deposited thin films A method of PECVD deposition of silicon-containing films has been discovered and further developed. The method is particularly useful when the films are deposited on substrates having surface areas which are larger than 25,000 cm2. The method prevents the... | 09/15/2009 |
| 7559527 | Diffusion bonded fluid flow manifold with partially integrated inter-active component A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered... | 07/14/2009 |
| 7220963 | Light weight portable scanning electron microscope We have developed a particular combination of elements and devices which enables the portability of a scanning electron microscope (SEM). In particular the combination enables a small size, typically less than about 50 liters, a manageable weight, typically less tha... | 05/22/2007 |
| 7504338 | Method of pattern etching a silicon-containing hard mask Disclosed herein is a method of pattern etching a layer of a silicon-containing dielectric material. The method employs a plasma source gas including CF4 to CHF3, where the volumetric ratio of CF4 to CHF3 is within the ran... | 03/17/2009 |
| 7468227 | Method of reducing the average process bias during production of a reticle We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing reagent prior to the pattern transfer. The process bias is a measure o... | 12/23/2008 |
| 7456414 | Beam re-registration system and method A beam re-registration system and method for error correction of a particle or other beam are disclosed. The beam re-registration system and method may include a particle or other beam, a stage movable in relation to the particle beam, at least two servos for contro... | 11/25/2008 |
| 7448276 | Capacitance dual electrode pressure sensor in a diffusion bonded layered substrate A diffusion bonded space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The disclosure includes an integrated fluid flow network architecture, which may include, in addition to a l... | 11/11/2008 |
| 7417233 | Beam exposure correction system and method A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by su... | 08/26/2008 |
| 7402213 | Stripping and removal of organic-containing materials from electronic device substrate surfaces Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m2). The substrate may comprise an electronic device. The exposed surface is treated with a stripping solution comprising o... | 07/22/2008 |
| 7396743 | Low temperature epitaxial growth of silicon-containing films using UV radiation A method of preparing a clean substrate surface for blanket or selective epitaxial deposition of silicon-containing and/or germanium-containing films. In addition, a method of growing the silicon-containing and/or germanium-containing films, where both the substrate... | 07/08/2008 |
| 7388213 | Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation We have developed a method of registration of a particle beam to internal alignment targets present within photoresist areas which are to be imaged. The method does not affect the photoresist, so the quality of pattern produced in the resist after imaging is not aff... | 06/17/2008 |
| 7372690 | Substrate holder which is self-adjusting for substrate deformation A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During lithography processing the wafer is electrostatically held in contact with a... | 05/13/2008 |
| 7368731 | Method and apparatus which enable high resolution particle beam profile measurement The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five elements provides and improved PSF, a combination of all five of the ... | 05/06/2008 |
| 7365014 | Reticle fabrication using a removable hard mask We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull ba... | 04/29/2008 |
| 7345287 | Cooling module for charged particle beam column elements We have developed a method and apparatus for cooling electromagnetic lens coils of the kind used in charged particle beams. The method and apparatus provide not only a symmetrical cooling effect around the optical axis of the charged particle beam, but also provide ... | 03/18/2008 |
| 7265361 | Beam blanker driver system and method A particle beam lithography system and method of blanking a beam such as a particle or other beam. The system may include a frequency divider adapted to convert a master clock signal at a first frequency into an integral number N of waveforms at a second frequency, ... | 09/04/2007 |
| 7253109 | Method of depositing a tantalum nitride/tantalum diffusion barrier layer system We have discovered a method of providing a thin, approximately from about 2 Å to about 100 Å thick TaN seed layer, which can be used to induce the formation of alpha tantalum when tantalum is deposited over the TaN seed layer. Further, the ... | 08/07/2007 |
| 7244334 | Apparatus used in reshaping a surface of a photoresist The invention relates to a method of improving control over the dimensions of a patterned photoresist, which enables better control of the critical dimensions of a photomask or reticle which is fabricated using the patterned photoresist. In addition, the method may ... | 07/17/2007 |
| 7208249 | Method of producing a patterned photoresist used to prepare high performance photomasks We are able to significantly reduce variations in critical dimension from target for features in a patterned photoresist, where the patterned photoresist is generated during the fabrication of a reticle (photomask) to be used in semiconductor processing. The ability... | 04/24/2007 |
| 7185872 | Appliance stabilizing device An appliance stabilizing device which is useful in securing an appliance in position against a supporting structure surface. The device includes a plurality of brackets which are selectively positionable on an appliance, with a plurality of elongated members, each p... | 03/06/2007 |
| 7185760 | Non-contact protective packaging for surface-sensitive articles Disclosed herein is a non-contact package useful when an article to be stored or shipped in the package includes a sensitive surface, the performance of which will be detrimentally affected if the sensitive surface is contacted with a nominal amount of mechanical fo... | 03/06/2007 |
| 7147198 | Wax pattern for making a golf club head A wax pattern for use in making a golf club head has a shell wall which defines a hollow region and which includes a front portion, a rear displacement portion and a dividing line extending between the front and rear displacement portions. The wax pattern has a prof... | 12/12/2006 |
| 7135256 | Method of increasing the shelf life of a photomask substrate In photomask making, the environmental sensitivity of a chemically amplified photoresist is eliminated, or at least substantially reduced, by overcoating the photoresist with a thin coating (topcoat) of a protective but transmissive material. To provide improved sta... | 11/14/2006 |
| 7125758 | Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors We have developed a method of PECVD depositing a-SiNx:H films which are useful in a TFT device as gate dielectric and passivation layers, when a series of TFT devices are arrayed over a substrate having a surface area larger than about 1 m2, wh... | 10/24/2006 |
| 7086918 | Low temperature process for passivation applications An organic electroluminescent device comprising an anode layer on a substrate, an organic layer on the anode layer, and a cathode layer on the organic layer. In one embodiment, the cathode layer is subjected to H2 plasma prior to deposition of a protectiv... | 08/08/2006 |
| 7074723 | Method of plasma etching a deeply recessed feature in a substrate using a plasma source gas modulated etchant system We have developed an uncomplicated method of plasma etching deeply recessed features such as deep trenches, of at least 5 μm in depth, in a silicon-containing substrate, in a manner which generates smooth sidewalls, having a roughness of less than about 1 μm, typi... | 07/11/2006 |
| 7055732 | Semiconductor processing apparatus including plasma-resistant, welded aluminum structures We have discovered a method of producing a complex-shaped aluminum alloy article, where welding has been employed to form the article, where an anodized aluminum coating is produced over a surface of the article including the weld joint, and where the anodized alumi... | 06/06/2006 |
| 7037854 | Method for chemical-mechanical jet etching of semiconductor structures A chemical-mechanical jet etching method rapidly removes large amounts of material in wafer thinning, or produces large-scale features on a silicon wafer, gallium arsenide substrate, or similar flat semiconductor workpiece, at etch rates in the range of 10–100 mic... | 05/02/2006 |
| 6998206 | Method of increasing the shelf life of a blank photomask substrate One principal embodiment of the disclosure pertains to a method of optically fabricating a photomask using a direct write continuous wave laser, comprising a series of steps including: applying an organic antireflection coating over a surface of a photomask which in... | 02/14/2006 |
| 6983892 | Gas distribution showerhead for semiconductor processing We have developed a gas distribution showerhead assembly, for use in a semiconductor processing chamber, which can be easily cleaned, with minimal chamber downtime. The gas distribution showerhead assembly includes an electrode having openings therethrough, and a ga... | 01/10/2006 |
| 6972154 | Anodically bonded device structure We have developed a method of anodic bonding which directs cations to a location within a bonding structure which is away from critical bonding surfaces. This prevents the formation of compounds comprising the cations at the critical bonding surfaces. The anodic bon... | 12/06/2005 |
| 6969569 | Method of extending the stability of a photoresist during direct writing of an image In photomask making, the environmental sensitivity of a chemically amplified photoresist is eliminated, or at least substantially reduced, by overcoating the photoresist with a thin coating (topcoat) of a protective but transmissive material. To provide improved sta... | 11/29/2005 |
| 6962514 | Method and apparatus used in fabrication of MEMS stacks Disclosed herein are methods of fabricating three dimensional Micro-Electro-Mechanical-Systems (MEMS). This method involved stacking of silicon-containing components which are separated by spacers. The stacked components are precision aligned and then may be bonded,... | 11/08/2005 |
