A vest or belt is integrally formed with tubular, pet receiving passageways which extend around the wearer's body and terminate in pocket-like chambers for feeding and retrieval.
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| Number | Title | Issue Date |
| 8163049 | Fluoride-modified silica sols for chemical mechanical planarization A chemical-mechanical planarization composition containing surface-modified abrasive particles such as silica where at least a portion of the surface of the particles has bound thereto a surface-modifying aluminum-containing stabilizer and fluoride that is used to p... | 04/24/2012 |
| 8114775 | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers A chemical mechanical polishing composition contains 1) water, 2) optionally an abrasive material, 3) an oxidizer, preferably a per-type oxidizer, 4) a small amount of soluble metal-ion oxidizer/polishing accelerator, a metal-ion polishing accelerator bound to parti... | 02/14/2012 |
| 8110535 | Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same The present invention relates to semi-aqueous formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, as well as contaminations. The formulation comprises: an alkanolamine, a water miscible organic co-solvent, a quar... | 02/07/2012 |
| 8092870 | Preparation of metal oxide thin film via cyclic CVD or ALD A cyclic deposition process to make a metal oxide film on a substrate, which comprises the steps: introducing a metal ketoiminate into a deposition chamber and depositing the metal ketoiminate on a heated substrate; purging the deposition chamber to remove unreacted... | 01/10/2012 |
| 8057696 | Compositions and methods for rapidly removing overfilled substrates This invention relates to compositions and methods for removing overfilled substrates, preferably at a relatively high removal rates. Advantageously, a composition according to the invention can contain an oxidizer, preferably a per-type oxidizer such as a peroxide,... | 11/15/2011 |
| 8002247 | Cross purge valve and container assembly The present invention is a quartz bubbler container with cross purge capability. This cross purge allows the user to easily purge air and chemical from the valve inlet and outlet by simply flowing inert gas, and avoids the requirement for a more complicated vacuum p... | 08/23/2011 |
| 7999355 | Aminosilanes for shallow trench isolation films The present invention is a process for spin-on deposition of a silicon dioxide-containing film under oxidative conditions for gap-filling in high aspect ratio features for shallow trench isolation used in memory and logic circuit-containing semiconductor substrates,... | 08/16/2011 |
| 7968465 | Periodic acid compositions for polishing ruthenium/low K substrates A method of polishing a semiconductor substrate surface having at least one ruthenium feature thereon and at least one dielectric material, wherein the substrate is contacted with an aqueous composition containing from about 0.0005 to about 1 moles/kilogram of perio... | 06/28/2011 |
| 7943195 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic %, x is from 5... | 05/17/2011 |
| 7915071 | Method for chemical mechanical planarization of chalcogenide materials A method and associated composition for chemical mechanical planarization of a chalcogenide-containing substrate (e.g., germanium/antimony/tellurium (GST)-containing substrate) are described. The composition and method afford low defect levels (e.g., scratches incur... | 03/29/2011 |
| 7736420 | Contact methods for formation of Lewis gas/liquid systems and recovery of Lewis gas therefrom The invention relates to an improvement in apparatus and process for the formation of a complex of Lewis acidic or Lewis basic gases in a reactive liquid of opposite character and for the breaking (fragmentation) of said complex associated with the recovery of the L... | 06/15/2010 |
| 7691287 | Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization A method of polishing a substrate with a polishing composition comprising an oxidizing agent and abrasive particles having a surface, said surface of the abrasive particles being at least partially modified with 1) at least one stabilizer compound comprising aluminu... | 04/06/2010 |
| 7678605 | Method for chemical mechanical planarization of chalcogenide materials A method and associated composition for chemical mechanical planarization of a chalcogenide-containing substrate (e.g., germanium/antimony/tellurium (GST)-containing substrate) are described. The composition and method afford low defect levels as well as low dishing... | 03/16/2010 |
| 7678422 | Cyclic chemical vapor deposition of metal-silicon containing films A process to deposit metal silicon nitride on a substrate comprising: sorbing a metal amide on a heated substrate, purging away the unsorbed metal amide, contacting a silicon-containing source having one or more Si—H3 fragments with the heated substrate... | 03/16/2010 |
| 7597871 | Steam modified Claus process Disclosed is a method for treating a gas stream rich in hydrogen sulfide by providing one or more feed gas streams rich in hydrogen sulfide into a Claus reaction furnace, providing air into the Claus reaction furnace, providing supplemental oxygen into the Claus rea... | 10/06/2009 |
| 7534753 | pH buffered aqueous cleaning composition and method for removing photoresist residue A residue cleaning composition includes: (a) water; (b) a fluoride; (c) a pH buffer system including an organic acid and a base. The organic acid can be an aminoalkylsulfonic acid and/or an aminoalkylcarboxylic acid. The base can be an amine and/or a quaternary alky... | 05/19/2009 |
| 7481074 | Self-contained distillation purifier/superheater for liquid-fill product container and delivery systems A process and apparatus for the on-site delivery of a gas having improved purity to from a container filled with liquid under pressure and integrated with a purifier. In the process a portion of the liquid is converted to vapor by reducing the pressure in the contai... | 01/27/2009 |
| 7446078 | Adsorbent for water removal from ammonia The present invention provides an adsorbent for removing water and/or other oxygen-containing impurities from a fluid comprising ammonia to the ppb level and methods for making and using same. The adsorbent preferably comprises a substrate having a plurality of pore... | 11/04/2008 |
| 7446055 | Aerosol misted deposition of low dielectric organosilicate films This invention relates to an improvement in a deposition process for producing low dielectric films having a dielectric constant of 3, preferably | 11/04/2008 |
| 7442822 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins A process to stabilize nitrogen-containing or oxygen-containing organosilane from acid catalyzed attack and retard the resulting decomposition is disclosed. Such organosilanes, and the nitrogen-containing organosilane in particular, with a least one Si—H or N—H ... | 10/28/2008 |
| 7434719 | Addition of Dto Hto detect and calibrate atomic hydrogen formed by dissociative electron attachment A method of detecting and calibrating dry fluxing metal surfaces of one or more components to be soldered by electron attachment using a gas mixture of reducing gas comprising hydrogen and deuterium, comprising the steps of: a) providing one or more components to be... | 10/14/2008 |
| 7396381 | Storage and delivery systems for gases held in liquid medium The present invention is directed to improvements in storage and delivery systems that allow for rapid fill and delivery of gases reversibly stored in a nonvolatile liquid medium, improvements in delivery and purity of the delivered gas. The low pressure storage and... | 07/08/2008 |
| 7380323 | Seal installation tool A tool and a method for installing a seal in a fitting through which gas is flowing is disclosed. The tool has a sleeve with a first socket that receives and holds the seal, and a second socket, adjacent to the first, that receives the fitting. A shaft is axially mo... | 06/03/2008 |
| 7351662 | Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization A low solids-content slurry for polishing (e.g., chemical mechanical planarization) of substrates comprising a dielectric and an associated method using the slurry are described. The slurry and associated method afford high removal rates of dielectric during polishi... | 04/01/2008 |
| 7339081 | Route to prepare 4-bromo-1-oxypentafluorosulfanylbenzene A process for preparing bromo-1-oxypentafluorosulfanylbenzene is provided, the process including the step of brominating pentafluorosulfanyloxybenzene with a bromination agent to provide the bromo-1-oxypentafluorosulfanylbenzene. The process is more effective than p... | 03/04/2008 |
| 7334595 | Cabinet for chemical delivery with solvent purging and removal The present invention is an apparatus and process for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for deliverin... | 02/26/2008 |
| 7302812 | Process for production of isotopes A process for producing an isotopically enriched compound of a desired isotope includes (a) providing a cryogenic reaction zone containing a catalyst adapted to catalyze an isotope exchange reaction at a cryogenic reaction temperature, (b) feeding to the cryogenic r... | 12/04/2007 |
| 7303607 | Liquid media containing Lewis acidic reactive compounds for storage and delivery of Lewis basic gases This invention relates to an improvement in a low-pressure storage and delivery system for gases having Lewis basicity, particularly hazardous specialty gases such as phosphine and arsine, which are utilized in the electronics industry. The improvement resides in st... | 12/04/2007 |
| 7285154 | Xenon recovery system A first aspect of a process of recovering xenon from feed gas includes: providing an adsorption vessel containing adsorbent having a Xe/N2 selectivity ratio 50% and... | 10/23/2007 |
| 7282084 | Liquid media containing Lewis basic reactive compounds for storage and delivery of Lewis acidic gases This invention relates to an improvement in a low-pressure storage and delivery system for gases having Lewis acidity, particularly hazardous specialty gases such as BF3 and diborane, which are utilized in the electronics industry. The improvement resides... | 10/16/2007 |
| 7282099 | Dense phase processing fluids for microelectronic component manufacture Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is prepared by introducing a subcritical fluid into a pressurization vesse... | 10/16/2007 |
| 7264013 | Enhanced purge effect in gas conduit The present invention provides a gas transfer apparatus designed for enhanced purging of a pigtail conduit and a process for effecting such purging. The apparatus comprises a surge chamber having a first end, a body and a second end, the first end in communication w... | 09/04/2007 |
| 7250072 | Removal of sulfur-containing impurities from volatile metal hydrides Method for the purification of a volatile metal hydride comprising obtaining a volatile metal hydride feed containing one or more acidic impurities, one of which is a sulfur-containing impurity; contacting the feed with an alkaline material and reacting at least a p... | 07/31/2007 |
| 7247179 | Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal A composition and associated methods for chemical mechanical planarization (or other polishing) are described. The composition may comprise an abrasive and a dispersed hybrid organic/inorganic particle. The composition may further comprise an alkyne compound. Two di... | 07/24/2007 |
| 7172646 | Reactive liquid based gas storage and delivery systems This invention relates generally to an improvement in low pressure storage and dispensing systems for the selective storing of gases having Lewis acidity or basicity, and the subsequent dispensing of said gases at pressures, e.g., generally below 5 psig and typicall... | 02/06/2007 |
| 7166419 | Compositions substrate for removing etching residue and use thereof Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue. ... | 01/23/2007 |
| 7166755 | Synthesis of pentafluorosulfanylnaphthalene This invention relates to 2-pentafluorosulfanylnapthalene, substituted derivatives thereof and to a process for producing naphthalene carrying an SF5 group. A 3-step process is employed wherein 1,4-dihydronaphthalene is reacted with pentafluorosulfanyl ha... | 01/23/2007 |
| 7160359 | Built in purifier for reactive gases The present invention is an apparatus for containing and dispensing a high purity fluid comprising an outer vessel capable of containing a quantity of high purity fluid in its interior; an outlet associated with the outer vessel for dispensing the high purity fluid;... | 01/09/2007 |
| 7160360 | Purification of hydride gases Purification material for removing a contaminant from an impure hydride gas comprising an adsorbent comprising a reduced metal oxide on a porous support and a desiccant. The porous support may be selected from the group consisting of activated carbon, alumina, silic... | 01/09/2007 |
| 7153335 | Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abr... | 12/26/2006 |