Bizarre Patents
Mouthguard made at least partially from an edible candy
A mouthguard includes a U-shaped upper bite plate which removably fits over upper teeth of a person, with the entire upper bite plate being made from a soft, deformable and edible gummi candy.
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| Number | Title | Issue Date |
| 7900178 | Integrated circuit (IC) design method, system and program product A method of integrated circuit (IC) design, an IC design system and computer program product therefore, e.g., for L3GO designs. Special case cells are cells that represent specialized, process dependent components and are provided as dual representation cells with a... | 03/01/2011 |
| 7884477 | Air gap structure having protective metal silicide pads on a metal feature A hard mask is formed on an interconnect structure comprising a low-k material layer and a metal feature embedded therein. A block polymer is applied to the hard mask layer, self-assembled, and patterned to form a polymeric matrix of a polymeric block component and ... | 02/08/2011 |
| 7883990 | High resistivity SOI base wafer using thermally annealed substrate A method of forming a semiconductor-on-insulator (SOI) substrate using a thermal annealing process to provide a semiconductor base wafer having a thin high resistivity surface layer that is positioned at the interface with the buried insulating layer is provided. Sp... | 02/08/2011 |
| 7807332 | Underlayer compositions containing heterocyclic aromatic structures A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid genera... | 10/05/2010 |
| 7754820 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition ... | 07/13/2010 |
| 7752355 | Asynchronous packet based dual port link list header and data credit management structure An asynchronous data transfer interface is provided across a boundary that allows high bandwidth data transfers which are packet based as defined by PCI_Express architecture, and has general utility in processor-based applications like servers, desktop applications,... | 07/06/2010 |
| 7728371 | SOI CMOS compatible multiplanar capacitor An isolated shallow trench isolation portion is formed in a top semiconductor portion of a semiconductor-on-insulator substrate along with a shallow trench isolation structure. A trench in the shape of a ring is formed around a doped top semiconductor portion and fi... | 06/01/2010 |
| 7674675 | Method of forming an integrated SOI fingered decoupling capacitor The invention provides a fingered decoupling capacitor in the bulk silicon region that are formed by etching a series of minimum or sub-minimum trenches in the bulk silicon region, oxidizing these trenches, removing the oxide from at least one or more disjoint trenc... | 03/09/2010 |
| 7638266 | Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material featur... | 12/29/2009 |
| 7569475 | Interconnect structure having enhanced electromigration reliability and a method of fabricating same An interconnect structure having improved electromigration (EM) reliability is provided. The inventive interconnect structure avoids a circuit dead opening that is caused by EM failure by incorporating a EM preventing liner at least partially within a metal intercon... | 08/04/2009 |
| 7566609 | Method of manufacturing a semiconductor structure There is provided a method of manufacturing a field effect transistor (FET) that includes the steps of forming a gate structure on a semiconductor substrate, and forming a recess in the substrate and embedding a second semiconductor material in the recess. The gate ... | 07/28/2009 |
| 7563563 | Wet developable bottom antireflective coating composition and method for use thereof The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating ... | 07/21/2009 |
| 7560692 | Method of TEM sample preparation for electron holography for semiconductor devices A high quality electron microscopy sample suitable for electron holography is prepared by forming markers filled with TEOS oxide and by repeatedly applying multiple coats of an adhesive followed by a relatively low temperature cure after each application. The TEOS o... | 07/14/2009 |
| 7560222 | Si-containing polymers for nano-pattern device fabrication A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially perpendicular with that of its major surfaces (top and bottom) is provided. Such ... | 07/14/2009 |
| 7470629 | Structure and method to fabricate finfet devices There is provided a method for fabricating a FinFET in which a self-limiting reaction is employed to produce a unique and useful structure that may be detectable with simple failure analysis techniques. The structure is an improved vertical fin with a gently sloping... | 12/30/2008 |
| 7445988 | Trench memory A trench device and method for fabricating same are provided. The trench device has a collar with a first portion that is doped and a second portion that is undoped. Fabrication of the partially doped collar can be done by deposition of a doped insulator in the tren... | 11/04/2008 |
| 7435537 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition ... | 10/14/2008 |
| 7426420 | System for dispatching semiconductors lots A system for dispatching a plurality of semiconductor lots among a plurality of tools is provided. The system includes a dispatch server manager and a dispatch integrator and display device. The dispatch integrator and display device conveys a dispatch request to th... | 09/16/2008 |
| 7397073 | Barrier dielectric stack for seam protection The present invention provides a semiconducting device including a gate dielectric atop a semiconducting substrate, the semiconducting substrate containing source and drain regions adjacent the gate dielectric; a gate conductor atop the gate dielectric; a conformal ... | 07/08/2008 |
| 7387974 | Methods for providing gate conductors on semiconductors and semiconductors formed thereby A method of providing a gate conductor on a semiconductor is provided. The method includes defining an organic polymer plating mandrel on the semiconductor, activating one or more sites of the organic polymer plating mandrel, binding a seed layer to the activated si... | 06/17/2008 |
| 7375172 | Underlayer compositions containing heterocyclic aromatic structures A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid genera... | 05/20/2008 |
| 7300741 | Advanced chemically amplified resist for sub 30 nm dense feature resolution The present invention discloses a chemically amplified (CA) resist composition for printing features having a dimension of about 30 nm or less and a method of forming a material structure having a pattern containing features having a dimension of about 30 nm or less... | 11/27/2007 |
| 7229889 | Methods for metal plating of gate conductors and semiconductors formed thereby A method of metal plating a gate conductor on a semiconductor is provided. The method includes defining an organic polymer plating mandrel on the semiconductor, activating one or more sites of the organic polymer plating mandrel, and binding a seed layer to the one ... | 06/12/2007 |
| 7138714 | Via barrier layers continuous with metal line barrier layers at notched or dielectric mesa portions in metal lines The present invention provides an interconnect structure that includes a diffusion barrier which is positioned within the structure in a fashion that increases the reliability and lifetime of the interconnect structure. ... | 11/21/2006 |
| 6950188 | Wafer alignment system using parallel imaging detection A system and method for aligning a wafer in an exposure apparatus includes a holder adapted to hold a wafer (the wafer includes alignment marks), a coarse alignment system, and a fine alignment system having a higher precision than the coarse alignment system. The f... | 09/27/2005 |
| 6946345 | Self-aligned buried strap process using doped HDP oxide The invention provides a trench storage structure that includes a substrate having a trench, a capacitor conductor in the lower part of the trench, a conductive node strap in the trench adjacent the capacitor conductor, a trench top oxide above the capacitor conduct... | 09/20/2005 |
| 6843893 | Metal dry etch using electronic field A method and structure for an apparatus for removing metal from an integrated circuit structure is disclosed. A container holds an integrated circuit structure that has a metal portion. An electronic device connected to the container produces an electronic field pro... | 01/18/2005 |
| 6800503 | MEMS encapsulated structure and method of making same A method of fabricating an encapsulated micro electro-mechanical system (MEMS) and making of same that includes forming a dielectric layer, patterning an upper surface of the dielectric layer to form a trench, forming a release material within the trench, patterning... | 10/05/2004 |
| 6696216 | Thiophene-containing photo acid generators for photolithography Thiophene-containing photo acid generators having either of the following general formulas: ##STR1## wherein at least one of R1, R2 or R3 is thiophene or thiophene that is substituted with alkyl, alkoxy or cycloalkyl, and ... | 02/24/2004 |
| 6667504 | Self-aligned buried strap process using doped HDP oxide The invention provides a trench storage structure that includes a substrate having a trench, a capacitor conductor in the lower part of the trench, a conductive node strap in the trench adjacent the capacitor conductor, a trench top oxide above the capaci... | 12/23/2003 |
| 6656375 | Selective nitride: oxide anisotropic etch process An anisotropic etching process for a nitride layer of a substrate, the process comprising using an etchant gas which comprises a hydrogen-rich fluorohydrocarbon, an oxidant and a carbon source. The hydrogen-rich fluorohydrocarbon is preferably one of CH | 12/02/2003 |
| 6245492 | Photoresist system and process for aerial image enhancement Improved resolution of lithographic patterns can be obtained using a double exposure process where a resist layer is subjected to a patternwise first exposure followed by a blanket second exposure. The resist composition preferably contains a chemically a... | 06/12/2001 |
