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| Number | Title | Issue Date |
| 6047107 | Furnace for rapid thermal processing with optical switching film disposed between heater and reflector A furnace (1) for Rapid Thermal Processing of a wafer (7), characterized in that the wafer (7) is heated by lamps (9), and the heat radiation is reflected by an optical switching device (15,17) which is in the reflecting state during the heating stage. Du... | 04/04/2000 |
