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Attorney: Applied Materials, Inc.


Number of applications: 67
Last date: August 27, 2009

1    
Application No.Application TitleIssue Date
20090211896Cathode and Counter-Cathode Arrangement in an Ion Source
The present invention relates to ion sources (14) comprising a cathode (20) and a counter-cathode (44) that are suitable for ion implanters (10). Typically, the ion source is held under vacuum and produces ions using a plasma generated within...
08/27/2009
20090173894Ion implanters
The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in ...
07/09/2009
20090166565Ion implanters
The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in ...
07/02/2009
20090108197Ion implanters
The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to sputtering, and sputtered material may become entrained in the ion be...
04/30/2009
20090101834Ion beam extraction assembly in an ion implanter
The present invention relates to an ion beam extraction assembly for use in an ion beam generation apparatus such as those used, for example, in an ion implanter. An ion beam extraction assembly is provided for mounting within an ion beam generating apparatus comprising...
04/23/2009
20090095916Ion beam guide tube
A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube....
04/16/2009
20090087970Method of producing a dopant gas species
This invention relates to a method of producing B2H6 (diborane) in semiconductor wafer processing apparatus. In particular, although not exclusively, this invention relates to producing a dopant gas species containing a desired dopant element, and ...
04/02/2009
20080197109Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask
A multilayer antireflective hard mask structure is disclosed. The structure comprises: (a) a CVD organic layer, wherein the CVD organic layer comprises carbon and hydrogen; and (b) a dielectric layer over the CVD organic layer. The dielectric layer is preferably a silic...
08/21/2008
20080180873Securing a substrate to an electrostatic chuck
The present invention relates to securing a substrate to an electrostatic chuck to minimise damage to the substrate. In particular, the present invention relates to securing a substrate to an electrostatic chuck provided as part of a substrate scanner in an ion implante...
07/31/2008
20080169434Method of scanning a substrate in an ion implanter
This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between the substrate and the ion beam such that the ion beam passes over all of t...
07/17/2008
20080169435Ion beam monitoring arrangement
This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the floating potential across an ion beam used for implantation. The invention provides a ion beam monitoring arrangement comprising a device config...
07/17/2008
20080164427Ion implanters
The present invention relates to components in ion implanters having surfaces adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to deposition and the present invention addresses problems associated with delamination of deposited...
07/10/2008
20080108215INTEGRATED CIRCUIT INTERCONNECT LINES HAVING REDUCED LINE RESISTANCE
The present invention provides integrated circuit fabrication methods and devices wherein shunted interconnect lines are formed. The shunted interconnect lines are formed in a dielectric stack comprising (1) a first dielectric layer having dense interconnect lines that ...
05/08/2008
20080105968INTEGRATED CIRCUIT INTERCONNECT LINES HAVING REDUCED LINE RESISTANCE
The present invention provides integrated circuit fabrication methods and devices wherein shunted interconnect lines are formed. The shunted interconnect lines are formed in a dielectric stack comprising (1) a first dielectric layer having dense interconnect lines that ...
05/08/2008
20080100917BROADBAND IMAGING SYSTEM AND METHOD
A method and system are presented for use in imaging broadband light. A plurality of substantially narrowband light components of the broadband light are passed through an array of spectral imaging modules. Each of the spectral imaging modules is configured for imaging ...
05/01/2008
20080099690MICROSCOPE WITH VACUUM OBJECTIVE
A microscope for inspecting a surface in an evacuated volume, including an optical objective assembly which is located in the evacuated volume in proximity to the surface. The assembly is arranged to collect and convey radiation from the surface while focusing the radia...
05/01/2008
20080100830SYSTEM AND METHOD FOR INSPECTING AN OBJECT USING AN ACOUSTO-OPTIC DEVICE
A system and method for inspecting an object. The system includes: a traveling lens acousto-optic device adapted to generate a traveling lens that propagates through an active region of the traveling lens acousto-optic device; a first scanner, adapted to direct a beam o...
05/01/2008
20080089617FOCUS ERROR CORRECTION SYSTEM AND METHOD
A method for focus error corrections. The method includes: determining a focus scheme in response to: a spatial relationship between an upper surface of at least a first portion of a substantially transparent upper layer of an inspected object and between an upper surfa...
04/17/2008
20080061251Ion beams in an ion implanter
The present invention relates to a method of tuning an ion beam in an ion implanter such as may be used in the manufacture of semiconductor devices. There are many operational parameters associated with operation of the ion implanter that influence the ion beam that rea...
03/13/2008
20080054193Ion beam guide tube
The present invention relates to a guide tube for an ion beam in an ion implanter located adjacent a semiconductor wafer. Such guide tubes are provided to confine charged particles used for wafer neutralisation during implantation. According to the invention, a guide tu...
03/06/2008
20080048131Front plate for an ion source
The present invention relates to a front plate for an ion source that is suitable for an ion implanter. The front plate according to the invention comprises obverse and reverse sides, an exit aperture for allowing egress of ions from the ion source that extends substant...
02/28/2008
20080023065Thin film photovoltaic module wiring for improved efficiency
The present invention relates to configuring and wiring together cells in TF PV modules. According to one aspect, cells are fabricated on one plane on a top surface of a substrate, with wiring patterned on a parallel plane, and vias formed to provide connections between...
01/31/2008
20080017811Beam stop for an ion implanter
This invention relates to a beam stop for an ion implanter that provides a measure of the ion beam current incident thereon and that may be used for ion beam optimisation. A beam stop for an ion implanter is provided comprising a charge collector with a segmented surfac...
01/24/2008
20070240759Stacked thin film photovoltaic module and method for making same using IC processing
In a thin-film photovoltaic (TF PV) module, stacked cells provide efficient conversion of solar energy without being afflicted by conventional problems such as current matching between layers. According to one aspect, the module includes separate terminals for the respe...
10/18/2007
20070238285Method for making an improved thin film solar cell interconnect using etch and deposition process
The present invention provides a method of forming interconnects in a photovoltaic module. According to one aspect, a method according to the invention includes processing steps that are similar to those performed in conventional integrated circuit fabrication. For exam...
10/11/2007
20070232057Method for forming thin film photovoltaic interconnects using self-aligned process
Processing steps that are useful for forming interconnects in a photovoltaic module are described herein. According to one aspect, a method according to the invention includes processing steps that are similar to those performed in conventional integrated circuit fabric...
10/04/2007
20070227578Method for patterning a photovoltaic device comprising CIGS material using an etch process
A processing method herein enables patterning a thin-film photovoltaic module into cells and/or sub-cells using an etch process. According to one aspect, an etch mixture is identified that is capable etching through a thin-film material such as CIGS with high selectivit...
10/04/2007
20070193881Partially suspended rolling magnetron
A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on t...
08/23/2007
20070127017QUALIFICATION OF A MASK
A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possi...
06/07/2007
20070117397Remote plasma pre-clean with low hydrogen pressure
A plasma cleaning method particularly useful for removing photoresist and oxide residue from a porous low-k dielectric with a high carbon content prior to sputter deposition. A remote plasma source produces a plasma primarily of hydrogen radicals. The hydrogen pressure ...
05/24/2007
20070102116Feedback control of chemical mechanical polishing device providing manipulation of removal rate profiles
A method of controlling surface non-uniformity of a wafer in a polishing operation includes (a) providing a model for a wafer polishing that defines a plurality of regions on a wafer and identifies a wafer material removal rate in a polishing step of a polishing process...
05/10/2007
20070099438Thin film deposition
A system, method and apparatus is capable of producing layers of various materials stacked on one another on a substrate without exposing the substrate to the pressure and contaminants of ambient air until the stack is complete. In one aspect, the stack of layers can in...
05/03/2007
20070095650Protective offset sputtering
Sputtering in a physical vapor deposition (PVD) chamber may, in one embodiment, utilize a target laterally offset from and tilted with respect to the substrate. In another aspect, target power may be reduced to enhance film protection. In yet another aspect, magnetron m...
05/03/2007
20070079866System and method for making an improved thin film solar cell interconnect
In a module of photovoltaic cells, a method of forming the module interconnects includes a single cutting process after the deposition of all active layers. This simplifies the overall process to a set of vacuum steps followed by a set of interconnect steps, and may sig...
04/12/2007
20060266833System, method and computer software product for inspecting charged particle responsive resist
A system, computer software product and a method for evaluating a mask, the method includes the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the mu...
11/30/2006
20060261261Spot grid array scanning system
A method for scanning a surface, consisting of focusing an array of beams using optics having an axis, so as to irradiate a region of the surface intercepted by the axis, such that each beam irradiates a portion of a respective sub-region within the region. The method f...
11/23/2006
20060251340Method for defect detection and process monitoring based on sem images
A morphological operation is applied to an SEM image to obtain a idealized image, and the idealized image is used to detect a defect in a subject of the SEM image. Tile defect is detected by subtraction of the idealized image from the original image Morphological operat...
11/09/2006
20060243918Raster Frame Beam System For Electron Beam Lithography
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned i...
11/02/2006
20060243922Raster Frame Beam System For Electron Beam Lithography
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned i...
11/02/2006
20060221331High Throughput Inspection System and a Method for Generating Transmitted and/or Reflected Images
Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are gen...
10/05/2006
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