Assignee: Verteq, Inc.

Location: SantaAna, CA
No. of patents: 19

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Number	Title	Issue Date
6684890	Megasonic cleaner probe system with gasified fluid In accordance with one embodiment there is provided a method of improving the performance of a substrate cleaner of the type having a megasonic probe with a probe shaft extending generally parallel to a surface of a rotating substrate, and at least one di...	02/03/2004
6684891	Wafer cleaning Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s...	02/03/2004
6681782	Wafer cleaning Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s...	01/27/2004
6679272	Megasonic probe energy attenuator The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having one of a variety of cross-sections configured to decrease ...	01/20/2004
6463938	Wafer cleaning method Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s...	10/15/2002
6378534	Semiconductor wafer cleaning system Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected into the lower end of the tank and allowed to overflow at the upper end. One solution has one part ...	04/30/2002
6295999	Wafer cleaning method Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s...	10/02/2001
6140744	Wafer cleaning system Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or s...	10/31/2000
6125551	Gas seal and support for rotating semiconductor processor A rotating wafer processor uses a non-contacting gas seal mounted to a process chamber and a vibration isolation mount between the chamber and a support structure. The non-contacting seal incorporates a housing with a chamfer on opposing ends of an annula...	10/03/2000
6122837	Centrifugal wafer processor and method A dryer for processing semiconductor substrates which rotates a carrier containing the substrates within a housing in combination with a bubbler which heats and directs a gas containing a water tension reducing vapor to the housing to contact the substrat...	09/26/2000
6039059	Wafer cleaning system A wafer cleaning system cleans semiconductor wafers using megasonic energy to agitate cleaning fluid applied to the wafer. A source of acoustic energy vibrates an elongated quartz probe which transmits the acoustic energy into the fluid. One form of the p...	03/21/2000
5996595	Semiconductor wafer cleaning system Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected from the lower end of the tank and allowed to overflow at the upper end. One solution comprises one...	12/07/1999
5950645	Semiconductor wafer cleaning system Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected into the lower end of the tank and allowed to overflow at the upper end. One solution comprises one...	09/14/1999
5908509	Semiconductor wafer cleaning system Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected from the lower end of the tank and allowed to overflow at the upper end. One solution comprises one...	06/01/1999
5656097	Semiconductor wafer cleaning system Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected from the lower end of the tank and allowed to overflow at the upper end. One solution contains one ...	08/12/1997
5556479	Method and apparatus for drying semiconductor wafers A method for drying semiconductor wafers produces ultra-clean wafers without conventional drying chemicals. The method involves slowing draining a rinsing fluid from a processing tank while heating the wafer at the fluid interface as the wafer emerges fro...	09/17/1996
5539995	Continuous flow vapor dryer system An apparatus and method for rapidly drying an object, such as a semiconductor wafer, by creating a vapor flow from a liquid, such as isopropyl alcohol, and exposing the object to that flow. The apparatus comprises a heater for vaporizing liquid in a reser...	07/30/1996
5534076	Megasonic cleaning system A transducer is bonded to a metal carrier that is mounted on an elastomeric frame-like diaphragm. The outer periphery of the diaphragm is mounted on a frame bonded to the bottom of a quartz tank. A vacuum applied to a chamber surrounding the lower portion...	07/09/1996
5365960	Megasonic transducer assembly A thin-walled rigid tube made of aluminum or other strong material that is a good thermal conductor and a good transmitter of megasonic energy is provided with an external sheath of Teflon to shield the tube from fluids used in cleaning semiconductor wafe...	11/22/1994

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Assignee: Verteq, Inc.