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Assignee: Veeco Instruments, Inc.


Location: Melville, NY
No. of patents: 8

NumberTitleIssue Date
4949783Substrate transport and cooling apparatus and method for same
A loading station receives a substrate into a load-lock volume pressure isolated from a loading station chamber which is open to a processing chamber. The volume is evacuated and the substrate lowered into the loading chamber. A transport arm moves the su...
08/21/1990
4791544Regulating control for single-ended switching power supply
A regulating control circuit for a single-ended switching power supply includes means for controlling the switching duty cycle during start-up, normal operation and current limiting modes. Normal operation utilizes a duty cycle of less than about 50%, but...
12/13/1988
4778561Electron cyclotron resonance plasma source
An electron cyclotron resonance (ECR) plasma source for generating a plasma for etching, deposition, pre-deposition and material property modification processes. The plasma source includes two magnetic field sources. The first magnetic field source provid...
10/18/1988
4772995Switching supply with pulse width and rate modulation
A switching type power supply is described which employs pulse width and rate modulation. Enhanced control range is achieved by controlling a frequency determining circuit to increase operating frequency as a function of power switch pulse width. The powe...
09/20/1988
4736285Demagnetization circuit for forward converter
A demagnetization circuit for use with a forward converter includes a drive winding magnetically coupled to the primary winding of the forward converter, a capacitor for absorbing leakage and magnetization energies from the primary winding when the forwar...
04/05/1988
4675796High switching frequency converter auxiliary magnetic winding and snubber circuit
An integrated magnetic assembly for use in the direct current output circuit of a high frequency electronic switching power supply, comprising magnetic core sections for the output transformer and inductor windings and a common magnetic core segment compl...
06/23/1987
4465934Parallel charged particle beam exposure system
A parallel exposure electron beam lithography system for directly writing an integrated circuit pattern simultaneously at a plurality of locations on the surface of a resist-coated semiconductor wafer is disclosed. An electron source produces an electron beam ...
08/14/1984
4419182Method of fabricating screen lens array plates
A method of fabricating lens and aperture array plates in silicon using photo or electron beam lithographic patterning followed by indiffusion of boron and anisotropic silicon etching and assembling to form screen lenses is disclosed....
12/06/1983
 
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