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System for magnetically attaching templeless eyewear to a person
A system of eyewear that eliminates the need for hinges on the frames of the eyewear.
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| Number | Title | Issue Date |
| 8172194 | Apparatus for transport of equipment and method for manufacture thereof An apparatus for transporting equipment and a method for the manufacture of the apparatus are disclosed. A damping assembly configured to dampen movement of a first item relative to a second item may include an arm and a shock absorber. The arm may be configured to ... | 05/08/2012 |
| 7906350 | Method for calibrating a metrology tool A method and apparatus for calibrating a metrology tool are disclosed. The apparatus includes a substrate having at least one calibration site formed thereon. The calibration site includes a pattern of cells that have at least one feature disposed in a surface of th... | 03/15/2011 |
| 7663156 | Method and apparatus for calibrating a metrology tool A method and apparatus for calibrating a metrology tool are disclosed. The apparatus includes a substrate having at least one calibration site formed thereon. The calibration site includes a pattern of cells that have at least one feature disposed in a surface of th... | 02/16/2010 |
| 7531275 | Photomask assembly and method for protecting the same from contaminants generated during a lithography process A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surfac... | 05/12/2009 |
| 7425393 | Phase shift photomask and method for improving printability of a structure on a wafer A phase shift photomask and method for improving printability of a structure on a wafer are disclosed. The method includes providing a photomask including a zero degree PSW formed on a top surface of a substrate and a 180 degree PSW formed in a first region of the s... | 09/16/2008 |
| 7398509 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks A computer network for generating instructions for photomask manufacturing equipment, based on photomask specification data input by a customer. A series of order entry screens are downloaded to a remote customer's computer, typically via an internet connection. The... | 07/08/2008 |
| 7277159 | System and method for automatically mounting a pellicle assembly on a photomask A system and method for automatically mounting a pellicle assembly on a photomask are disclosed. The method includes loading a photomask into a mounting apparatus and loading a pellicle assembly into a back plate of the mounting apparatus opposite the photomask. The... | 10/02/2007 |
| 7271950 | Apparatus and method for optimizing a pellicle for off-axis transmission of light An apparatus and method for optimizing a pellicle for off-axis transmission are disclosed. A pellicle includes a thin film optimized for transmission of off-axis incident light at a desired angle. The pellicle further includes an optical thickness greater than a des... | 09/18/2007 |
| 7094505 | Photomask assembly and method for protecting the same from contaminants generated during a lithography process A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surfac... | 08/22/2006 |
| 7056623 | Photomask and method for manufacturing the same A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the subst... | 06/06/2006 |
| 6978437 | Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same A photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufactured with the photomask are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may... | 12/20/2005 |
| 6968530 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks A computer network for generating instructions for photomask manufacturing equipment, based on photomask specification data input by a customer. A series of order entry screens are downloaded to a remote customer's computer, typically via an internet connection. The... | 11/22/2005 |
| 6924071 | Photomask and method for reducing exposure times of high density patterns on the same A method for reducing exposure times for high density patterns on a photomask is disclosed. The method includes moving a selected feature located in a cell between a first boundary and a second boundary from a first pattern file to a second pattern file and exposing... | 08/02/2005 |
| 6910203 | Photomask and method for qualifying the same with a prototype specification A photomask and method for qualifying the same with a prototype specification are disclosed. The method includes comparing a plurality of die sites formed in a patterned layer on a photomask with a prototype specification. If at least one of the die sites complies w... | 06/21/2005 |
