Did You Know...
...Chester Carlson was a patent agent who tired of having to make multiple copies of patent applications using the only duplication method available at the time: carbon paper. In 1959 he came up with a new copying system and took it to IBM for evaluation. The "experts" at IBM determined potential sales to be only 5,000 units because people wouldn't want to use a bulky machine when they had carbon paper. Carlson's invention was the xerography process, the company founded on the system is Xerox.
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| Number | Title | Issue Date |
| 7771911 | Process for producing photoresist composition, filter, coater and photoresist composition A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solutio... | 08/10/2010 |
| 7541138 | Resist composition A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist com... | 06/02/2009 |
| 7390612 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 06/24/2008 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; havi... | 05/13/2008 |
| 7364831 | Positive resist composition and resist pattern formation method A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional un... | 04/29/2008 |
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly... | 04/15/2008 |
| 7335465 | Developer composition for resists and method for formation of resist pattern To provide a developer composition for resists, capable of improving dimensional controllability of a resist pattern. The developer composition for resists comprises an organic quaternary ammonium base as a main component, said developer composition further comprisi... | 02/26/2008 |
| 7329478 | Chemical amplified positive photo resist composition and method for forming resist pattern To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a ... | 02/12/2008 |
| 7326515 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 02/05/2008 |
| 7323287 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 01/29/2008 |
| 7318992 | Lift-off positive resist composition A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a sili... | 01/15/2008 |
| 7316889 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 01/08/2008 |
| 7316885 | Method of forming resist pattern, positive resist composition, and layered product There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist compositio... | 01/08/2008 |
| 7316888 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 01/08/2008 |
| 7312015 | Process for refining crude resin for electronic material A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this process, a crude resin for an electronic material containing (a1) struc... | 12/25/2007 |
| 7192687 | Positive resist composition and method of forming resist pattern using same A positive resist composition capable of realizing an improvement in resolution, a reduction in LER, and a reduction in the level of defects, as well as a method of forming a resist pattern. This composition and method provide: a p... | 03/20/2007 |
| 7172848 | Chemical amplification type positive resist composition There is provided a positive resist composition which enables the formation of a fine resist pattern, enables the angle of the taper shape within that resist pattern to be controlled to a suitable angle, and enables the formation of a resist pattern with an excellen... | 02/06/2007 |
| 7169532 | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light ... | 01/30/2007 |
| 7158039 | Liquid leakage sensor and liquid leakage detecting system Among plural liquid leakage sensors placed at the lower most portion of a system such as a floor surface, a leaked liquid storing portion, etc., an error-activated location of the sensor can be easily identified uniquely when the sensor is detecting any abnormality.... | 01/02/2007 |
| 7060410 | Novolak resin solution, positive photoresist composition and preparation method thereof There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a... | 06/13/2006 |
| 6982140 | Positive resist composition and method of forming resist pattern There is provided a positive type resist composition formed by dissolving (A) a resin component with a unit derived from a (meth)acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, and (B) an acid generator c... | 01/03/2006 |
| 6811817 | Method for reducing pattern dimension in photoresist layer The invention discloses improvements in the so-called coated thermal flow process for reducing the pattern dimension of a patterned resist layer on a substrate to accomplish increased fineness of resist patterning, in which a coating layer of a water-soluble resin f... | 11/02/2004 |
| 6734258 | Protective coating composition for dual damascene process The invention discloses a protective coating solution suitable for forming a resinous protective coating layer on a patterned resist layer in the manufacture of semiconductor devices having, in particular, crowdedly hole-patterned areas and areas of an isolated hole... | 05/11/2004 |
| 6689535 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern Disclosed is an anti-reflective coating composition for forming an anti-reflective coating as an undercoating layer is provided, comprising a crosslinking agent, which is at least one compound selected from nitrogen-containing compounds having an amino gr... | 02/10/2004 |
| 6528172 | COATING SOLUTIONS FOR USE IN FORMING BISMUTH-BASED FERROELECTRIC THIN FILMS, AND FERROELECTRIC THIN FILMS, FERROELECTRIC CAPACITORS AND FERROELECTRIC MEMORIES FORMED WITH SAID COATING SOLUTIONS, AS WELL AS PROCESSES FOR PRODUCTION THEREOF The invention discloses a coating solution for use in forming Bi-based ferroelectric thin films containing Bi, metallic element A (at least one selected from the group consisting of Bi, Pb, Ba, Sr, Ca, Na, K and rare earth elements) and metallic element B... | 03/04/2003 |
| 6491825 | Method for using a magnetic treatment apparatus for fluids A magnetic unit 12 having yokes 15 made of magnetic material, with a permanent magnet on one end and a magnet treatment part 14 contacting a conduit 11 through which fluids move on the other end, is utilized for the purpose of treating fluids by exposure ... | 12/10/2002 |
| 6270666 | Magnetic treatment apparatus for fluids and method for using same A magnetic unit 12 having yokes 15 made of magnetic material, with a permanent magnet on one end and a magnet treatment part 14 contacting a conduit 11 through which fluids move on the other end, is utilized for the purpose of treating fluids by exposure ... | 08/07/2001 |
| 6265129 | Positive photosensitive compositions for application of the lift-off technique and a method of forming patterns using the compositions Improved positive photosensitive composition for application of the lift-off technique comprises (A) an alkali-soluble resin and (B) a mixture of two photosensitive agents in admixture with the alkali-soluble resin, one being (i) a photosensitive agent wh... | 07/24/2001 |
| 6159652 | Positive resist composition Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises (A) a resin component whose solubility in an alkaline aque... | 12/12/2000 |
| 6117623 | Remover solvent for partial removal of photoresist layer While it is important in the photolithographic patterning of a photoresist layer on a substrate surface for the manufacture of various electronic devices that the pattern-wise light exposure of the photoresist layer is preceded by partial removal of the p... | 09/12/2000 |
| 6087068 | Undercoating composition for photolithographic resist Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the p... | 07/11/2000 |
| 6083657 | Positive photoresist compositions and a process for producing the same Phenolic compound (a) is polycondensed with mixed aldehyde (b) consisting essentially of 5-30 mol % of unsaturated aliphatic aldehyde (b-1) and 70-95 mol % of saturated aliphatic aldehyde (b-2) to give alkali-soluble novolak resin (A) as the product of po... | 07/04/2000 |
| 6074962 | Method for the formation of silica-based coating film Disclosed is a method for the formation of a silica-based coating film of a relatively large thickness in the manufacturing process of semiconductor devices and liquid crystal display panels by repeating the sequence consisting of coating of the surface w... | 06/13/2000 |
| 6063953 | Chemical-sensitization photoresist composition Disclosed are novel high-sensitivity positive- and negative-working chemical-sensitization photoresist compositions capable of giving a highly heat-resistant patterned resist layer of high resolution having excellently orthogonal cross sectional profile w... | 05/16/2000 |
| 5955240 | Positive resist composition Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises (A) a resin component whose solubility in an alkaline aque... | 09/21/1999 |
| 5908720 | Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof A photosensitive resin composition for forming light shielding films comprising a mixture of; 10 to 60 parts by weight of a high molecular weight polymeric binder; 15 to 50 parts by weight of a photopolymerizable monomer; 0.1 to 30 parts by weight of a ph... | 06/01/1999 |
| 5892095 | Cyano group-containing oxime sulfonate compounds Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices. The photoresist composition is characterized by a unique ... | 04/06/1999 |
| 5753421 | Stock developer solutions for photoresists and developer solutions prepared by dilution thereof Stock developer solutions for photoresists contain an organic base free from metal ions and at least one compound having a specified weight average molecular weight that is selected from among polyethylene oxide compounds, polypropylene oxide compounds an... | 05/19/1998 |
| 5747224 | Stock developer solutions for photoresists and developer solutions prepared by dilution thereof Stock developer solutions for photoresists contain an organic base free from metal ions and at least one compound having a specified weight average molecular weight that is selected from among polyethylene oxide compounds, polypropylene oxide compounds an... | 05/05/1998 |
| 5736296 | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises (A) a resin component whose solubility in an alkaline aque... | 04/07/1998 |
