Assignee: Tokyo Electron Limited

Location: Tokyo-To, JP
No. of patents: 67

Number	Title	Issue Date
8177990	Etching method, plasma processing system and storage medium Disclosed is a method of etching a substrate having a layered structure in which a photoresist mask with a pattern, a coating film made of silicon oxide, and an organic film are laminated in that order from the top. Before etching the coating film of silicon oxide, ...	05/15/2012
8154106	Coating and developing system and coating and developing method A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the subst...	04/10/2012
8128751	Film-forming apparatus A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal...	03/06/2012
8097534	Method for manufacturing semiconductor device and storage medium On an etching target film formed on a substrate, a three-layer resist is laminated. This three-layer resist includes an organic film and a resist film developed into a resist pattern. Through the resist pattern, the organic film is etched into a mask pattern through...	01/17/2012
8088455	Laser treatment apparatus A drain port and an exhaust port arranged at the bottom of a cup surrounding a substrate holding unit. A drainage tray is arranged below the cup so as to cover the moving area of the drain port when the substrate holding unit and the cup move in X-directions and Y-d...	01/03/2012
8070972	Etching method and etching apparatus The present invention relates to an etching method for etching a film to form a concave portion therein with the use of a photoresist mask provided with an opening. In this method, there is determined, in advance, a first correlation between a parameter value and an...	12/06/2011
8057114	Wet-processing apparatus, wet-processing method and storage medium A wet-processing apparatus includes module groups each including plural processing modules and a shared nozzle device to be used in common by the processing module of the module group. The wet-processing apparatus includes plural processing modules not less than fou...	11/15/2011
8055376	Substrate processing system, substrate placing position adjusting method and storage medium In a substrate processing system for processing a substrate, such as a wafer W, held by a substrate holding device rotatable about a vertical axis, such as a spin chuck, a jig is placed on the substrate holding device, and centrifugal acceleration imparted to a pred...	11/08/2011
8043469	Substrate processing method, substrate processing apparatus, and storage medium At first, with a chamber being filled with a first gas, a process liquid is supplied onto a surface of a wafer in the chamber so as to process the surface of the wafer. At this time, the process liquid discharged from the chamber is returned to a process-liquid supp...	10/25/2011
8037890	Substrate cleaning device and substrate cleaning method A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poure...	10/18/2011
8033244	Substrate processing system Leakage of an atmosphere of a solvent vapor used by a smoothing process for smoothing the surface of a resist pattern outside from a smoothing unit is prevented to facilitate incorporating the smoothing unit into a coating and developing system. A substrate processi...	10/11/2011
8026176	Film forming method, plasma film forming apparatus and storage medium A technique for embedding metal in a microscopic recess provided in the surface of a process object, such as a semiconductor wafer, by plasma sputtering. A film forming step and a diffusion step are alternately performed a plurality of times. The film forming step d...	09/27/2011
8026048	Developing apparatus and developing method A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the ...	09/27/2011
8016976	Film removing device and film removing method A film removing device includes an approach stage having a flat approach part having a surface substantially flush with the surface of a substrate supported on a support member. The flat approach part faces a first side surface of the substrate at a corner of the su...	09/13/2011
8001983	Cleaning apparatus, coating and developing apparatus, and cleaning method A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the cen...	08/23/2011
7997813	Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium A coating and developing system includes processing blocks of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing blocks are arranged longitudinally betw...	08/16/2011
7993081	Substrate carrying device, substrate carrying method and computer-readable storage medium A device capable of causing a substrate to float by a gas can suppress the consumption of a gas. The device includes a carrying passage along which a substrate is carried. The gas spouted through the gas spouting pores causes the substrate to float and creates gas f...	08/09/2011
7955011	Coating and developing apparatus, substrate processing method, and storage medium A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units a...	06/07/2011
7935185	Film forming system and film forming method A clean gas circulates to pass through a loading area provided below a vertical heat treatment furnace. The clean gas unidirectionally flows through the loading area. After completion of wafer processing, a wafer boat lowers from the heat treatment furnace to the lo...	05/03/2011
7934880	Coating and developing apparatus, coating and developing method, and storage medium Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G...	05/03/2011
7905195	Floating-type substrate conveying and processing apparatus The present invention provides a floating-type substrate conveying and processing apparatus that floats a substrate to be processed. The device includes a floating stage that floats the substrate, a liquid supplier placed above the floating stage via the substrate t...	03/15/2011
7901514	Substrate cleaning method and developing apparatus A cleaning method of cleaning a surface of a substrate that is processed by a developing process. The method includes pouring a cleaning liquid onto a central part of the substrate. A dry area that is not wetted with the cleaning liquid is created in a central part ...	03/08/2011
7897498	Method for manufacturing semiconductor device The present invention is a method of manufacturing a semiconductor device from a layered body including: a semiconductor substrate; a high dielectric film formed on the semiconductor substrate; and an SiC-based film formed on a position upper than the high dielectri...	03/01/2011
7896562	Developing method, developing apparatus and storage medium A method of supplying a developing solution is provided. The method includes supplying a developing solution onto a substrate from a first developing solution nozzle, so as to form a ribbon-like region on the surface of the substrate, while rotating the substrate ab...	03/01/2011
7879251	Thin film removing device and thin film removing method A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage pla...	02/01/2011
7862959	Transfer mask for exposure and pattern exchanging method of the same The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the plurality of cells is exposed to a charged particle beam, each of the ...	01/04/2011
7844359	Coating and developing apparatus, operating method for same, and storage medium for the method In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective f...	11/30/2010
7841787	Rinsing method, developing method, developing system and computer-read storage medium The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rin...	11/30/2010
7836845	Substrate carrying and processing apparatus The present invention provides a substrate carrying and processing apparatus which is intended to reduce the size of the space for storing substrates in each substrate storing section as much as possible so as to downsize the apparatus and increase the number of sub...	11/23/2010
7835816	Heat processing apparatus, heat processing method, computer program and storage medium In a vertical-type heat processing apparatus, it is intended to stabilize the temperature of an inner wall of the reaction vessel upon loading as well as to reduce particle contamination, for example, by suppressing peeling of films attached to the inner wall. An in...	11/16/2010
7828488	Developing apparatus, developing method, coating and developing system and storage medium A developing apparatus includes two rotating members respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, a...	11/09/2010
7828016	Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus A process gas line (255) for carrying WF6 gas for nucleation, a process gas line (259) for carrying WF6 gas for film deposition after nucleation are joined at a single joint (280) to a carrier gas line (256). A gas l...	11/09/2010
7823534	Development device and development method A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the ...	11/02/2010
7809460	Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is stored A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried o...	10/05/2010
7797855	Heating apparatus, and coating and developing apparatus A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carryin...	09/21/2010
7793609	Coating and developing apparatus Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of wh...	09/14/2010
7789577	Coating and developing system, coating and developing method and storage medium A coating and developing system that includes two rotating members having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, ...	09/07/2010
7780438	Substrate heating apparatus and method and coating and developing system Disclosed is a substrate heating apparatus including a hot plate that heats a substrate, and a cooling plate that supports the substrate and moves between a first position (home position) and the second position above the hot plate to transfer wafers between the two...	08/24/2010
7758340	Heating device and heating method A heating device provided with a cooling plate and a heating plate is formed in a low height, and floats a substrate above the cooling plate and the heating plate and moves the substrate horizontally between the cooling plate and the heating plate by the pressure of...	07/20/2010
7752999	Wet processing system, wet processing method and storage medium A wet processing system detects a globule of a process solution in a drippy or dripping state from the tip of any one of process solution pouring nozzles being moved to a pouring position for pouring the process solution onto a substrate by obtaining image data on t...	07/13/2010

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Assignee: Tokyo Electron Limited