Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 8183502 | Mounting table structure and heat treatment apparatus A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target... | 05/22/2012 |
| 8183165 | Plasma processing method According to the present invention,when a nitridation process by plasma generated by a microwave is applied to a substrate with an oxide film having been formed thereon to from an oxynitride film, the microwave is intermittently supplied. By the intermittent supply ... | 05/22/2012 |
| 8183161 | Method and system for dry etching a hafnium containing material A method and system for etching a hafnium containing material using a boron tri-chloride (BCl3) based process chemistry is described. A substrate having a hafnium containing layer, such as a layer of hafnium dioxide (HfO2) is subjected a dry et... | 05/22/2012 |
| 8183158 | Semiconductor processing apparatus and method for using same A method for using a semiconductor processing apparatus includes supplying an oxidizing gas and a reducing gas into a process container of the processing apparatus accommodating no product target substrate therein; causing the oxidizing gas and the reducing gas to r... | 05/22/2012 |
| 8182869 | Method for controlling temperature of a mounting table A method for controlling a temperature of a mounting table includes a first and a second temperature control mode in which a first and a second coolant passageway of a coolant circulator are connected in parallel between an output port and a return port of the coola... | 05/22/2012 |
| 8182142 | Temperature measuring apparatus and temperature measuring method A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetecto... | 05/22/2012 |
| 8181769 | Workpiece transfer mechanism, workpiece transfer method and workpiece processing system A workpiece transfer mechanism 76 transfers workpieces W to a workpiece boat 40 having ringlike tables 86. The transfer mechanism 76 includes a fork main body 78 being movable forward and rearward with the workpiece W placed thereo... | 05/22/2012 |
| 8181356 | Substrate processing method A substrate processing method is arranged to perform a heat process on a substrate with a coating film formed thereon to bake and cure the coating film. At first, the substrate, with the coating film formed thereon, is held at a preparatory temperature lower than a ... | 05/22/2012 |
| 8178820 | Method and heat treatment apparatus for uniformly heating a substrate during a bake process A heat treatment apparatus and associated method are provided for heating a substrate. The apparatus includes a processing chamber containing a process space, first and second substrate supports, and first and second heating sources. The first substrate support is c... | 05/15/2012 |
| 8178448 | Film formation method and apparatus for semiconductor process Disclosed is a method for using a film formation apparatus to form a silicon nitride film by CVD on target substrates while suppressing particle generation. The apparatus includes a process container and an exciting mechanism attached on the process container. The m... | 05/15/2012 |
| 8178446 | Strained metal nitride films and method of forming A method for forming a strained metal nitride film and a semiconductor device containing the strained metal nitride film. The method includes exposing a substrate to a gas containing a metal precursor, exposing the substrate to a gas containing a first nitrogen prec... | 05/15/2012 |
| 8178444 | Substrate processing method and substrate processing apparatus A substrate processing method that can eliminate unevenness in the distribution of plasma. The method is for a substrate processing apparatus that has a processing chamber in which a substrate is housed, a mounting stage that is disposed in the processing chamber an... | 05/15/2012 |
| 8178439 | Surface cleaning and selective deposition of metal-containing cap layers for semiconductor devices A method is provided for integrating metal-containing cap layers into copper (Cu) metallization of semiconductor devices. In one embodiment, the method includes providing a planarized patterned substrate containing metal surfaces and dielectric layer surfaces with a... | 05/15/2012 |
| 8177550 | Vertical heat treatment apparatus and method for operating the same A vertical heat treatment apparatus includes: at least one loading and unloading part 3 and 4 for loading and unloading a carrying container 2 containing a plurality of process objects W into and from said vertical heat treatment apparatus; a fi... | 05/15/2012 |
| 8175736 | Method and system for performing a chemical oxide removal process A processing system and method for chemical oxide removal (COR) is presented, wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first trea... | 05/08/2012 |
| 8173928 | Processing device In a processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus includes an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof; a mounting table provided within... | 05/08/2012 |
| 8173451 | Etch stage measurement system Provided is a system for measuring an etch stage of an etch process involving one or more layers in a substrate, the etch stage measurement system configured to meet two or more etch stage measurement objectives. The system includes an etch process tool, the etch pr... | 05/08/2012 |
| 8173450 | Method of designing an etch stage measurement system Provided is a method for designing an etch stage measurement system involving an etch process for one or more layers on a substrate using an etch process tool. The etch process tool uses two or more metrology devices, at least one etch process sensor device, and a m... | 05/08/2012 |
| 8173036 | Plasma processing method and apparatus A plasma processing method includes the steps of etching the target object with a CF-based processing gas by using a patterned resist film as a mask, removing deposits accumulated inside a processing chamber during the step of etching the target object by using a pr... | 05/08/2012 |
| 8172949 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valv... | 05/08/2012 |
| 8171879 | Maintenance system, substrate processing apparatus, remote operation unit and communication method A substrate processing apparatus having various types of elements including a substrate carrier member for performing a substrate processing; and a control section in which a remote operation information transmitted from a remote control unit in a remote place throu... | 05/08/2012 |
| 8168946 | Charged particle separation apparatus and charged particle bombardment apparatus A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes an electric field applying part including two electrodes across which electric voltage is applied in order to generate electr... | 05/01/2012 |
| 8168548 | UV-assisted dielectric formation for devices with strained germanium-containing layers A method of forming a semiconductor device includes providing a substrate in a vacuum processing tool, the substrate having a strained Ge-containing layer on the substrate and a Si-containing layer on the strained Ge-containing layer, maintaining the substrate at a ... | 05/01/2012 |
| 8168539 | Method for forming tungsten film at a surface of a processing target material, film-forming apparatus, storage medium and semiconductor device with a tungsten film A tungsten film with a lower specific resistance and a lower fluorine concentration over its boundary with the base barrier layer, which adheres to the barrier layer with a high level of reliability, compared to tungsten films formed through methods in the related a... | 05/01/2012 |
| 8168378 | Substrate treatment system, substrate treatment method, and computer readable storage medium In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In the heat treatment apparatus, three transfer member groups are provided... | 05/01/2012 |
| 8168375 | Patterning method Disclosed is a patterning method including: forming a first film on a substrate; forming a multi-layered film including a resist film on the first film; forming a patterned resist film having a preset pattern by patterning the resist film by photolithography; formin... | 05/01/2012 |
| 8168270 | Film formation method and apparatus for semiconductor process An oxide film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including a source gas containing a film source element and no amino group, a second process gas including an oxidizing gas, and a third proc... | 05/01/2012 |
| 8167521 | Substrate transfer apparatus and vertical heat processing apparatus The present invention restrains, during a transfer of a substrate, a central portion of the substrate from being warped by its own weight, which might be caused by a super-enlargement of a diameter of the substrate. A substrate transfer apparatus 18 includes:... | 05/01/2012 |
| 8166914 | Plasma processing apparatus of batch type A plasma processing apparatus of the batch type includes a tubular process container having a closed end and an open end opposite to each other, and a process field for accommodating target substrates, the process container including a tubular insulating body. The a... | 05/01/2012 |
| 8166913 | Coating treatment method, computer-readable storage medium, and coating treatment apparatus In the present invention, a substrate is first rotated at a first rotation speed, and a resist solution is applied to the rotated substrate. Subsequently, the rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so ... | 05/01/2012 |
| D658693 | Liner for plasma processing apparatus | 05/01/2012 |
| D658692 | Liner for plasma processing apparatus | 05/01/2012 |
| D658691 | Liner for plasma processing apparatus | 05/01/2012 |
| 8164033 | Stage, substrate processing apparatus, plasma processing apparatus, control method for stage, control method for plasma processing apparatus, and storage media A stage onto which is electrostatically attracted a substrate to be processed in a substrate processing apparatus, which enables the semiconductor device yield to be improved. A temperature measuring apparatus 200 measures a temperature of the substrate to be... | 04/24/2012 |
| 8163469 | Coating and developing apparatus, coating and developing method, and storage medium A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a substrate side-surface portion water repellent module for performing water ... | 04/24/2012 |
| 8163128 | Plasma processing apparatus A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microw... | 04/24/2012 |
| 8163087 | Plasma enhanced atomic layer deposition system and method A plasma enhanced atomic layer deposition (PEALD) method and system, the system including a process chamber and a substrate holder provided within the processing chamber and configured to support a substrate on which a predetermined film will be formed. A first proc... | 04/24/2012 |
| 8159653 | Substrate position detection apparatus, and method of adjusting a position of an imaging component of the same A method is disclosed for adjusting an arrangement of coordinates in an imaging area of an imaging component in a substrate imaging plane in a substrate position detection apparatus that detects a position of a substrate in accordance with an image taken of a circum... | 04/17/2012 |
| 8159256 | Probe needle, method for manufacturing the probe needle and method for constructing a three-dimensional structure A method for manufacturing a probe needle having beams and a contactor placed on tips of the beams comprises preparing a Si wafer 20, forming a seed layer 21 on the Si wafer 20, and forming grooves in a desired shape of the beams on the seed lay... | 04/17/2012 |
| 8159245 | Holding member for inspection, inspection device and inspecting method Installed in a probe device is a holding member for inspection which can be mounted on a chuck. The holding member for inspection includes a support plate capable of mounting thereon a chip in which the power device is formed; pins for positioning the chip mounted o... | 04/17/2012 |
