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| Number | Title | Issue Date |
| 5681614 | Hydrophobic treatment method involving delivery of a liquid process agent to a process space An apparatus for hydrophobic treatment of a semiconductor wafer comprises a tank in which HMDS liquid is stored, a process chamber in which the wafer is treated, and a unit for supplying HMDS liquid from the tank into the process chamber in an amount need... | 10/28/1997 |
| 5626675 | Resist processing apparatus, substrate processing apparatus and method of transferring a processed article A substrate processing apparatus has an article transferring unit for transferring articles, and an arm assembly is provided on the transferring unit. Each arm of the arm assembly is provided with pawls for contacting and supporting undersurface portions ... | 05/06/1997 |
| 5578127 | System for applying process liquid A system for coating a photoresist on a semiconductor wafer includes a loading/unloading unit and a process unit. A convey path is arranged in the process unit, and an adhesion process section, a pre-bake section, a cooling section, a resist coating secti... | 11/26/1996 |
