Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 5460478 | Method for processing wafer-shaped substrates An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provi... | 10/24/1995 |
| 5445699 | Processing apparatus with a gas distributor having back and forth parallel movement relative to a workpiece support surface A processing apparatus comprising a reaction chamber, a workpiece-supporting section located in the reaction chamber for supporting a workpiece, a gas distributor located in the reaction chamber and facing the workpiece-supporting section for distributing... | 08/29/1995 |
| 5442416 | Resist processing method A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which i... | 08/15/1995 |
| 5405443 | Substrates processing device A substrates processing device having a tank in which process solution is contained, a bottle communicated with the tank through a conduit and located above an object to be processed with the process solution supplied, a nozzle located under the bottle, a... | 04/11/1995 |
| 5374312 | Liquid coating system A liquid coating system according to the present invention comprises, a liquid supply source, a nozzle having an inlet communicating with the liquid supply source and a substantially linear liquid discharge portion, a pressure feed unit for feeding the li... | 12/20/1994 |
| 5374153 | Transfer apparatus There is provided a transfer apparatus which is capable of transferring objects on a plurality of carriers at a time to a desired point. This apparatus comprises a carrier table for linearly arranging a plurality of the carriers, a plurality of push-up me... | 12/20/1994 |
| 5364222 | Apparatus for processing wafer-shaped substrates An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provi... | 11/15/1994 |
| 5339128 | Resist processing method A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which i... | 08/16/1994 |
| 5297910 | Transportation-transfer device for an object of treatment A device for transporting and transferring objects of treatment arranged in a down flow to a plurality of treatment sections for treating the objects comprises a transportation section movable between the treatment sections, a first drive mechanism for mo... | 03/29/1994 |
| 5275658 | Liquid supply apparatus A developer-supply apparatus has a developer-liquid supply nozzle, a spin chuck for supporting a wafer, and a holder for allowing the supply nozzle to wait there. The supply nozzle is transferred between a position above the chuck and a waiting position o... | 01/04/1994 |
| 5254367 | Coating method and apparatus Coating method and apparatus. Said coating method comprises setting pressure in a chamber higher than the vapor pressure of a solvent mixed in a liquid which is coated on the surface of a matter to be processed, and dropping and spreading the coating liqu... | 10/19/1993 |
| 5250114 | Coating apparatus with nozzle moving means A coating apparatus includes two spin chucks located in a single casing to support and rotate wafers. A waiting trench is located between the spin chucks to discharge that part of coating liquid which has been hardened at the tip of a nozzle. The wafers a... | 10/05/1993 |
| 5249142 | Indirect temperature-measurement of films formed on semiconductor wafers A method of measuring the temperature of a matter accurately, in non-contact fashion and without setting any emissivity comprising obtaining a spectral characteristics of absorbing electromagnetic waves inherent to a matter whose temperature is to be meas... | 09/28/1993 |
| 5248022 | Driving device having sealing mechanism A driving device comprises a first cover, a second cover telescopically engaging with the first cover, and a third cover surrounding the first and second covers. Part of a driving member for moving the second cover in relation to the first cover is arrang... | 09/28/1993 |
| 5226437 | Washing apparatus A washing apparatus for performing a batch treatment of a plurality of wafers has a vessel and a wafer boat dedicated to the vessel and movable in the vertical direction. The boat has a fork, which supports the wafers in the vessel in a manner such that t... | 07/13/1993 |
| 5213118 | Treatment apparatus A washing apparatus comprises a loader, unloader, and three washing units (i.e., a carry-in side unit, a carry-out side unit, and an intermediate unit) arranged between the loader and unloader. Each unit has two washing sections for performing batch treat... | 05/25/1993 |
| 5202716 | Resist process system A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which i... | 04/13/1993 |
| 5151871 | Method for heat-processing semiconductor device and apparatus for the same CPU stores information showing a time-temperature relationship and applicable for either heating a semiconductor wafer to a hold temperature for a predetermined period of time or cooling the wafer from the hold temperature over a predetermined period of t... | 09/29/1992 |
| 5127362 | Liquid coating device A liquid coating device for coating a solution on a substrate to form a film includes a chuck for rotatably supporting the substrate, a nozzle for supplying the solution on the substrate, a heater provided in the nozzle for changing a temperature of the s... | 07/07/1992 |
| 5028955 | Exposure apparatus An exposure apparatus of this invention is used in an exposure process of semiconductor and LCD devices. The exposure apparatus includes a stage on which a semiconductor wafer is placed, a rotating mechanism for rotating the stage, a radiation unit arrang... | 07/02/1991 |
