Did You Know...
...that Charles Goodyear performed some of his experiments on rubber while in debtor's prison? He was there so often he referred to it as his "hotel". Chronically in debt because of poor business sense and ill health, Goodyear depended on the generosity of friends and family. Even after he unlocked the secret to vulcanizing rubber, he was unable to improve his financial situation. When he died, his estate was $200,000 in debt.
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| Number | Title | Issue Date |
| 7445689 | Substrate processing method and substrate processing system The substrate processing system has an ozone generator that generates and supplies an ozone-containing gas to plural or N (N is a natural number not less than 2) ozone process units. The ozone generator has capacity of supplying the first processing fluid to only Nâ... | 11/04/2008 |
| 7419316 | Developing treatment apparatus A developing treatment apparatus for performing a developing treatment for a substrate, includes a substrate holding member for holding the substrate; an outer peripheral plate surrounding an outer peripheral portion of the substrate to form a gap between the plate ... | 09/02/2008 |
| 7419550 | Oxidizing method and oxidizing unit of object for object to be processed An oxidizing method for includes: an arranging step of arranging a plurality of objects to be processed in a processing container whose inside can be vacuumed, a supplying unit of an oxidative gas being provided at one end of the processing container, a plurality of... | 09/02/2008 |
| 7419613 | Method and device for plasma-etching organic material film A support electrode (2) and a counter electrode (16) constituting parallel plate electrodes are disposed in a process vessel (1). A substrate (W) with an organic material film formed thereon is supported by the support electrode (2). A hi... | 09/02/2008 |
| 7416405 | Vertical type of thermal processing apparatus and method of using the same A vertical type of thermal processing apparatus of the present invention includes a thermal processing furnace having a furnace opening at a lower portion thereof. A boat holding objects to be processed in a tier-like manner in a vertical direction is adapted to be ... | 08/26/2008 |
| 7416632 | Substrate processing apparatus and substrate processing method A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate. A subs... | 08/26/2008 |
| 7416978 | Film forming method, film forming system and recording medium After silicon nitride films have been formed on wafers by a film forming process in a reaction vessel, the reaction vessel is processed by a purging process specified by a purging recipe and compatible with the film forming process to suppress production of gases an... | 08/26/2008 |
| 7412981 | Liquid processing apparatus and method A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in ... | 08/19/2008 |
| 7410543 | Substrate processing method Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm... | 08/12/2008 |
| 7410923 | SiC material, semiconductor device fabricating system and SiC material forming method A highly corrosion-resistant SiC material is formed on a base body by a CVD process. The SiC material contains β-SiC crystals so oriented that the ratio of the sum of peak intensities of x-ray diffraction for (220) and (311) planes of the β-Sic csystals to the sum... | 08/12/2008 |
| 7404407 | Substrate processing apparatus The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chem... | 07/29/2008 |
| 7404409 | Substrate processing system and substrate processing method A substrate processing system includes a substrate transfer unit having a plural-wafer conveyer that transfers plural wafers collectively and a single wafer conveyer that transfers a single wafer at a time. The single-wafer conveyer is accessible to the plural-wafer... | 07/29/2008 |
| 7403260 | Coating and developing system The coating and developing system carries a substrate delivered to a carrier handling block to a processing block to form a film on the substrate by a coating block included in the processing block, carries the substrate through an interface block to the exposure sy... | 07/22/2008 |
| 7401988 | Substrate processing apparatus and substrate processing method On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. ... | 07/22/2008 |
| 7393172 | Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device In a wafer transfer system wherein a wafer transfer robot linearly reciprocates by a linear motor, dust is prevented from adhering to a wafer. A fixed base 9, on which the secondary side 11 of a linear motor M for linearly reciprocating a wafer ... | 07/01/2008 |
| 7387131 | Processing apparatus and substrate processing method A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for supporting the holding members 60 and a top-face member... | 06/17/2008 |
| 7376490 | Operational control device, operational control method, program and storage medium thereof, for a plurality of power consumption systems A operational control device for supplying electric power from an electric power equipment to a plurality of power consumption systems store a power consumption pattern for each of the power consumption systems. It obtains a combined expected power consumption patte... | 05/20/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| D564462 | RF electrode for a process tube of semiconductor manufacturing apparatus | 03/18/2008 |
| 7341644 | Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor There is not known a conventional method for predicting the consumed degree of consumable supplies and the thickness of deposited films without opening a processing chamber. A method for predicting the consumed degree of a consumable supply and the thickness ... | 03/11/2008 |
| 7337792 | Liquid processing apparatus and liquid processing method A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch ... | 03/04/2008 |
| 7332055 | Substrate processing apparatus A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 a... | 02/19/2008 |
| RE40046 | Processing system A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Eac... | 02/12/2008 |
| 7329549 | Monitoring method of processing state and processing unit The present invention is a monitoring method of monitoring a change of a processing state of an object to be processed when a predetermined process is conducted to the object to be processed by using a processing unit. The method includes: a step of respectively set... | 02/12/2008 |
| RE39969 | Processing system A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Ea... | 01/01/2008 |
| 7314054 | Liquid processing apparatus with nozzle having planar ejecting orifices A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in ... | 01/01/2008 |
| 7313451 | Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium With analysis data in the prior art, it is difficult to find out if a change regarded as a judgmental standard of the completion of seasoning has come from a change due to the seasoning, namely, change in condition of the interior of a processing container or come f... | 12/25/2007 |
| RE39939 | Processing system A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Ea... | 12/18/2007 |
| 7304002 | Method of oxidizing member to be treated A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film. In a method for oxidatio... | 12/04/2007 |
| 7304003 | Oxidizing method and oxidizing unit for object to be processed An oxidizing method for an object to be processed according to the present invention includes: an arranging step of arranging a plurality of objects to be processed in a processing container whose inside can be vacuumed, the processing container having a predetermin... | 12/04/2007 |
| 7300598 | Substrate processing method and apparatus The invention relates to a process including a chemical liquid treatment and a rinse liquid treatment on a substrate, more particularly to a technique for reducing consumption of a chemical liquid while achieving uniform process and preventing particle generation. I... | 11/27/2007 |
| 7299566 | Substrate-placing mechanism having substrate-heating function The present invention is a substrate-placing mechanism to be provided in a processing container of a substrate-processing apparatus including: a stage having: a base body on which a substrate is placed, a heat-generating body for heating the substrate placed on the ... | 11/27/2007 |
| 7285498 | Etching method An etching method etches an organic film by using an inorganic film as a mask at a high etch rate, in a satisfactory etch profile in a satisfactory in-plane uniformity without causing the inorganic film to peel off. An organic film formed on a workpiece is etched by... | 10/23/2007 |
| 7284917 | Coating and developing system and coating and developing method A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The c... | 10/23/2007 |
| 7281869 | Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist fil... | 10/16/2007 |
| 7283890 | Work convey system, unmanned convey vehicle system, unmanned convey vehicle, and work convey method There is a jump in the number of devices formed on a single wafer, and it takes a lot of time to inspect a single wafer. In addition, if wafers are inspected every lot, detected wafers remain in staying in a prober until the inspection of all of the wafers is comple... | 10/16/2007 |
| 7267497 | Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film i... | 09/11/2007 |
| 7245348 | Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film over... | 07/17/2007 |
| 7244335 | Substrate processing system and substrate processing method A substrate processing system is provided with an ozone generator capable of generating an ozone-containing gas by discharging electricity in an oxygen-containing gas, and a plurality of processing chambers each capable of holding substrates therein to process the s... | 07/17/2007 |
| 7240680 | Substrate processing apparatus A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. T... | 07/10/2007 |
