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Assignee: Tamarack Scientific Co., Inc.


Location: Anaheim, CA
No. of patents: 8

NumberTitleIssue Date
5937993Apparatus and method for automatically handling and holding panels near and at the exact plane of exposure
The present invention involves both an apparatus and a method for handling and holding panels and other substrates for photolithographic exposures. In one of its aspects, the present invention comprises bi-modal vacuum cup-bellows devices which automatica...
08/17/1999
5559629Unit magnification projection system and method
A Dyson lens system includes a radiation source, a concave mirror, and a plano-convex lens. There is also incorporated in the system an additional lens that is spaced from the plano-convex lens a large part of the distance from the plano-convex lens to th...
09/24/1996
5530516Large-area projection exposure system
Scanning microlithography apparatus for effecting exposures of substrates to radiation sources. A mask support and a substrate stage are disposed in spaced-apart positions directly opposite each other, witch a lens system between them and with a radiation...
06/25/1996
5131752Method for film thickness endpoint control
Endpoint control of thickness of a film being deposited or etched is achieved by use of an ellipsometer that derives delta and psi coordinates of a polarized light beam reflected from the work piece during the course of processing. Measured film thickness...
07/21/1992
4940881Method and apparatus for effecting selective ablation of a coating from a substrate, and controlling the wall angle of coating edge portions
The angles of the walls of vias being ablated by excimer lasers are controlled by interposing refractive elements between the masks and the workpieces, and rotating the refractive elements about axes parallel to the optical axis. In one embodiment, the re...
07/10/1990
4698486Method of heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.
In accordance with the method, an integrating kaleidoscope and lamps combine to cause heating of a semiconductor wafer to achieve desired effects such as annealing, etc. In one form of the method, the heating of the wafer is such as to achieve rapid annea...
10/06/1987
4649261Apparatus for heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.
An integrating light pipe, very preferably a kaleidoscope, encloses a source of radiant thermal energy, the light pipe and energy source being so arranged as to achieve efficient and substantially uniform heating of a workpiece in a target plane. The pipe...
03/10/1987
4555630Automatic system for exposing and handling double-sided printed circuit boards
An automatic system for exposing and handling double-sided printed circuit boards without scuffing either side, which effects precise positioning of the circuit boards at exposure stations, and which holds the circuit boards firmly clamped on a planar sta...
11/26/1985
 
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