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Vehicular Impact Signaling Device
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| Number | Title | Issue Date |
| 6514876 | Pre-metal dielectric rapid thermal processing for sub-micron technology A process for forming silicate glass layers on substrates is disclosed. A silicate glass layer is first deposited onto a substrate, such as a semiconductor wafer. The wafer is then placed in a thermal processing chamber and heated in the presence of a rea... | 02/04/2003 |
| 6359263 | System for controlling the temperature of a reflective substrate during rapid heating A system and process is disclosed for rapidly heating semiconductor wafers coated with a highly reflective material on either the whole wafer or in a patterned area. The wafers are heated in a thermal processing chamber by a plurality of lamps. In order f... | 03/19/2002 |
| 6293696 | System and process for calibrating pyrometers in thermal processing chambers A method and system for calibrating radiation sensing devices, such as pyrometers, in thermal processing chambers are disclosed. The system includes a reflective device positioned opposite the radiation sensing devices and a calibrating light source which... | 09/25/2001 |
| 6281141 | Process for forming thin dielectric layers in semiconductor devices A process for producing thin dielectric films is disclosed. In particular, the process is directed to forming oxide films having a thickness of less than about 60 angstroms. The oxide films can be doped with an element, such as nitrogen or boron. For exam... | 08/28/2001 |
| 6222990 | Heating element for heating the edges of wafers in thermal processing chambers The present invention is directed to an apparatus and process for heat treating wafers, such as semiconductor wafers, in thermal processing chambers. In particular, the apparatus of the present invention includes an electrical heating element positioned a... | 04/24/2001 |
| 6210484 | Heating device containing a multi-lamp cone for heating semiconductor wafers An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the present invention is directed to a heat... | 04/03/2001 |
| 6204484 | System for measuring the temperature of a semiconductor wafer during thermal processing An apparatus for heat treating semiconductor wafers is disclosed. In accordance with the present invention, the apparatus includes a temperature measuring system for determining the temperature of semiconductor wafers being heated within the apparatus. Th... | 03/20/2001 |
| 6200023 | Method for determining the temperature in a thermal processing chamber A system and method for determining the temperature of substrates in a thermal processing chamber in the presence of either an oxidizing atmosphere or a reducing atmosphere is disclosed. Specifically, temperature determinations made in accordance with the... | 03/13/2001 |
| 6174651 | Method for depositing atomized materials onto a substrate utilizing light exposure for heating The present invention is generally directed to a process and a system for forming photoresist coatings on a semiconductor wafer. In particular, according to the present invention, a solution containing a photoresist material is atomized in a reaction vess... | 01/16/2001 |
| 6160242 | Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gases An apparatus and method for determining the temperature of a semiconductor wafer in a thermal processing chamber in the presence of a radiation absorbing gas, such as a vapor, is disclosed. The apparatus includes a temperature sensing device which senses ... | 12/12/2000 |
| 6075922 | Process for preventing gas leaks in an atmospheric thermal processing chamber A process and system for preventing gases from either leaking into or out of a thermal processing chamber that is designed to operate at or near atmospheric pressure is disclosed. For instance, in one embodiment, gases are prevented from leaking into a th... | 06/13/2000 |
| 6056434 | Apparatus and method for determining the temperature of objects in thermal processing chambers The present invention is generally directed to a system and process for accurately determining the temperature of an object, such as a semiconductive wafer, by sensing and measuring the object radiation being emitted at a particular wavelength. In particu... | 05/02/2000 |
| 6027244 | Apparatus for determining the temperature of a semi-transparent radiating body The present invention is generally directed to a system and process for accurately determining the temperature of an object, such as a semi-conductive wafer, by sampling from the object radiation being emitted at a particular wavelength. In one embodiment... | 02/22/2000 |
| 5997175 | Method for determining the temperature of a semi-transparent radiating body The present invention is generally directed to a system and process for accurately determining the temperature of an object, such as a semi-conductive wafer, by sampling from the object radiation being emitted at a particular wavelength. In one embodiment... | 12/07/1999 |
| 5980637 | System for depositing a material on a substrate using light energy The present invention is generally directed to a process and a system for transforming a liquid into a solid material using light energy. In particular, a solution containing a parent material in a liquid form is atomized in a reaction vessel and directed... | 11/09/1999 |
