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Assignee: Startec Ventures, Inc.


Location: Fallbrook, CA
No. of patents: 6

NumberTitleIssue Date
5846386On-site ammonia purification for semiconductor manufacture
Highly purified ammonia for use in semiconductor manufacturing is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of less than 0.005 micron in size, and scrub...
12/08/1998
5785820On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic ...
07/28/1998
5755934Point-of-use ammonia purification for electronic component manufacture
Highly purified ammonia for use in processes for the production of high-precision electronic components is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of ...
05/26/1998
5722442On-site generation of ultra-high-purity buffered-HF for semiconductor processing
A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility (front end). Anhydrous ammonia is purified by scrubbing in a high-pH liquor, and then combined with high-purity aqueous HF which has bee...
03/03/1998
5496778Point-of-use ammonia purification for electronic component manufacture
Highly purified ammonia for use in processes for the production of high-precision electronic components is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of ...
03/05/1996
5242468Manufacture of high precision electronic components with ultra-high purity liquids
Semiconductor wafers and other electronic parts which similarly require ultra-high purity manufacturing environments are treated with ultra-high purity liquid cleaning and etching agents prepared at the site of use from gaseous raw materials which have be...
09/07/1993
 
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