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| Number | Title | Issue Date |
| 6616394 | Apparatus for processing wafers Systems and methods are described for wafer processing. A wafer processing apparatus includes: a first wafer transporter; a process station coupled to the first wafer transporter, the process station including: a first plurality of wafer processing stacks... | 09/09/2003 |
| 6570713 | Method and apparatus for optimizing the output beam characteristics of a laser The use of refractive optical elements to reduce or eliminate unwanted wavelength components from a laser emission. The method and apparatus described herein introduces modifications to the parallelism of one or more existing optical elements within the l... | 05/27/2003 |
| 6538720 | Lithographic tool with dual isolation system and method for configuring the same An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage ... | 03/25/2003 |
| 6522483 | Optical reduction system with elimination of reticle diffraction induced bias An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or ... | 02/18/2003 |
| 6480330 | Ultraviolet polarization beam splitter for microlithography The present invention provides an ultraviolet (UV) polarizing beam splitter cube. The UV polarizing beam splitter cube is transmissive to light at wavelengths equal to or less than 170 nm and can image, at high quality, light incident over a wide range of... | 11/12/2002 |
| 6472643 | Substrate thermal management system This invention is a substrate thermal management system for efficient, rapid, controllable and uniform thermal management over a wide temperature range. The thermal management system integrates a thermal source, thermal sink and a thermal diffuser. Accord... | 10/29/2002 |
| 6468586 | Environment exchange control for material on a wafer surface Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber ada... | 10/22/2002 |
| 6418356 | Method and apparatus for resolving conflicts in a substrate processing system A wafer cluster tool comprising a series of processes has a scheduler which synchronizes all events in the system. Events in the cluster tool are scheduled to occur at regular, periodic intervals, thereby improving throughput and quality. The scheduler al... | 07/09/2002 |
| 6416318 | Process chamber assembly with reflective hot plate and pivoting lid A hot plate assembly includes a base plate, a lid and a housing positioned between the base plate and the lid. The housing, lid and base plate form a process chamber. An insulator is positioned adjacent to the base plate in the process chamber. An air gap... | 07/09/2002 |
| 6414276 | Method for substrate thermal management This invention is a thermal management method for efficient, rapid, controllable and uniform thermal management over a wide temperature range. The method integrates a thermal source, thermal sink and a thermal diffuser. According to the invention, a therm... | 07/02/2002 |
| 6387602 | Apparatus and method of cleaning reticles for use in a lithography tool A reticle cleaning apparatus that utilizes an ultraviolet light source in an oxygen-containing environment to cleanse organic contaminants from a reticle. The reticle cleaning apparatus of the present invention enables the storage of multiple reticles for... | 05/14/2002 |
| 6369874 | Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography A windowless system and apparatus are provided that prevent outgases from contaminating the projection optics of an in-vacuum lithography system. The outgassing mitigation apparatus comprises a chimney that is substantially closed at one end, a duct fluid... | 04/09/2002 |
| 6327793 | Method for two dimensional adaptive process control of critical dimensions during spin coating process A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in ... | 12/11/2001 |
| 6322337 | Liquid dispensing systems and methods The present invention provides systems and methods of dispensing liquids. In one embodiment, the system includes a pump with a removable pump module with at least one displacement piston and at least one piston valve. A motor and base assembly provide the... | 11/27/2001 |
| 6307619 | Scanning framing blade apparatus A scanning framing blade apparatus includes a stationary assembly having a plurality of magnets; first and second carriage assemblies that each have a plurality of coils. The first and second carriage assemblies are supported on the stationary assembly by... | 10/23/2001 |
| 6302662 | Liquid dispensing systems and methods The present invention provides systems and methods of dispensing liquids. In one embodiment, the system includes a pump with a removable pump module with at least one displacement piston and at least one piston valve. A motor and base assembly provides th... | 10/16/2001 |
| 6300600 | Hot wall rapid thermal processor An apparatus for heat treatment of a wafer is disclosed. The apparatus includes a heating chamber having a heat source. A cooling chamber is positioned adjacent to the heating chamber and includes a cooling source. A wafer holder is configured to move bet... | 10/09/2001 |
| 6254936 | Environment exchange control for material on a wafer surface Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber ada... | 07/03/2001 |
| 6248171 | Yield and line width performance for liquid polymers and other materials Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion... | 06/19/2001 |
| 6246203 | Direct skew control and interlock of gantry Systems and methods are described for direct skew control and interlock of a gantry. An apparatus includes a gantry that includes a first member defining a gantry primary axis Z, a cross member defining a secondary axis X that is coupled to the first memb... | 06/12/2001 |
| 6242364 | Plasma deposition of spin chucks to reduce contamination of silicon wafers An apparatus for delivering a fluidic media to a wafer includes a housing defining a process chamber. A fluidic media delivery member is coupled to the process chamber. A rotatable chuck is positioned in the process chamber. The rotatable chuck has a wafe... | 06/05/2001 |
| 6238735 | Method of uniformly coating a substrate A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the ho... | 05/29/2001 |
| 6239863 | Removable cover for protecting a reticle, system including and method of using the same A removable cover for protecting a reticle used in a lithography system is described. The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspecte... | 05/29/2001 |
| 6191053 | High efficiency photoresist coating An improved method and apparatus for coating semiconductor substrates with organic photoresist polymers by extruding a ribbon of photoresist in a spiral pattern which covers the entire top surface of the wafer. The invention provides a more uniform photor... | 02/20/2001 |
| 6177133 | Method and apparatus for adaptive process control of critical dimensions during spin coating process A spin coating process for controlling the mean thickness of photoresist on the surface of a semiconductor wafer. The wafer surface has a central axis normal to the surface. The process comprises the steps of applying the solution to the wafer surface and... | 01/23/2001 |
| 6098843 | Chemical delivery systems and methods of delivery The present invention relates to chemical delivery systems and methods for delivery of liquid chemicals. In one embodiment, the present invention relates to systems having multi-reservoir load cell assemblies for delivering chemicals used in the semicondu... | 08/08/2000 |
| 6091056 | Hot plate oven for processing flat panel displays and large wafers The invention provides a hot plate oven suitable to bake materials on substrates such as flat panel displays and large semiconductor wafers such as 300 mm in diameter and above. The hot plate oven in one embodiment includes an insulated chamber, a heater ... | 07/18/2000 |
| 6059567 | Semiconductor thermal processor with recirculating heater exhaust cooling system In summary, the vertical rapid cooling furnace of this invention for treating semiconductor wafers with self contained gas chilling and recycling comprises a hot wall reaction tube positioned within a cylindrical array of heating coils. Space between the ... | 05/09/2000 |
| 6005225 | Thermal processing apparatus A vertical rapid heating furnace for treating semiconductor wafers comprising a hot wall reaction tube positioned within a cylindrical array of circular parallel heating elements substantially concentric therewith, each heating element being spaced from t... | 12/21/1999 |
| 5954878 | Apparatus for uniformly coating a substrate A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the ho... | 09/21/1999 |
| 5947136 | Catch cup cleaning system The present invention provides a cleaning system. In one embodiment, the system includes a rotating member, a rinse member held to the rotating member, including a channel extending from an inner location to an outer edge of the rinse member for delivery ... | 09/07/1999 |
| 5756157 | Method for processing flat panel displays and large wafers The invention provides a hot plate oven and a method suitable to bake materials on substrates such as flat panel displays and large semiconductor wafers such as 300 mm in diameter and above. The hot plate oven in one embodiment includes an insulated chamb... | 05/26/1998 |
| 5733096 | Multi-stage telescoping structure A multi-stage telescoping tube structure and a robot including a multi-stage telescoping tube structure. The multi-stage telescoping tube structure includes an outer tube, an intermediate tube, and an inner tube. The intermediate tube is slidably received... | 03/31/1998 |
| 5733024 | Modular system A modular system and a method of creating a modular system comprising a substantially rigid frame and a plurality of modules mounted at predetermined locations on the frame by means of kinematic couplings. The frame includes a main beam in the form of a s... | 03/31/1998 |
| 5700046 | Wafer gripper A wafer gripper assembly comprises first and second gripping members movably supported relative to each other. A motor propels the gripping members linearly towards and away from each other. Preferably both gripping members are movably supported, and a ro... | 12/23/1997 |
| 5679168 | Thermal processing apparatus and process A thermal treatment boat having a plurality of annular, coaxial, spaced apart bands having substantially the same inner diameters. The bands are separated by a band spacing distance of from about 3.8 to 12.7 mm, each of the bands having a height, Height | 10/21/1997 |
| 5670210 | Method of uniformly coating a substrate A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the ho... | 09/23/1997 |
| 5626680 | Thermal processing apparatus and process Process for treating multiple parallel wafers positioned in a heating zone surrounded by a heater emitting radiant heat. A space of from 0.5 to 2.55 cm is maintained between each wafer, and the outer portions of each wafer are shielded from radiant heat e... | 05/06/1997 |
| 5618351 | Thermal processing apparatus and process Thermal treatment boat comprising a cylinder having a central axis and a plurality of band slots having opposed upper and lower surfaces in planes perpendicular to said central axis and spaced at predetermined locations along said central axis. At least o... | 04/08/1997 |
| 5320680 | Primary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flow A chemical vapor deposition apparatus comprising a hot wall reaction tube, one or more reaction gas preheaters, a reaction gas exhaust outlet, and substantially eddy free reaction gas flow control means for passing reaction gases in a substantially lamina... | 06/14/1994 |
