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| Number | Title | Issue Date |
| 7482107 | Photoresist composition Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base. ... | 01/27/2009 |
| 7378222 | Antihalation compositions Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslin... | 05/27/2008 |
| 7345316 | Wafer level packaging for optoelectronic devices An optical device package includes a substrate having an upper surface, a distal end, a proximal end, and distal and proximal longitudinally extending notches co-linearly aligned with each other. A structure is mounted to the substrate and has at least one recessed ... | 03/18/2008 |
| 7344970 | Plating method Photoresist compositions and methods suitable for depositing a very thick photoresist layer in a single coating process are provided. Such photoresist layers are particularly suitable for use in chip scale packaging. ... | 03/18/2008 |
| 7333945 | Chemical product acquisition system A computerized data processing system can assist a user in locating specialty chemical products having particular intrinsic properties specified by the user. The system can query a database to identify commercially available chemical product(s) that best conform to ... | 02/19/2008 |
| 7306892 | Multilayer photoresist system Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths. ... | 12/11/2007 |
| 7294453 | Electronic device manufacture Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material. ... | 11/13/2007 |
| 7294280 | External cavity semi-conductor laser and method for fabrication thereof The present invention concerns a design for an external cavity single mode laser wherein a short optical path length for the optical cavity (e.g., ˜3 to 25 mm) provides sufficient spacing of the longitudinal modes allowing a single wavelength selective element, suc... | 11/13/2007 |
| 7290321 | Alignment apparatus and method for aligning stacked devices An apparatus for passively aligning first and second substrates having micro-components disposed thereon when the substrates do not include patterned surfaces which face each other. The apparatus includes a first depression which cooperates with an alignment sphere ... | 11/06/2007 |
| 7267781 | Method of fabricating optical filters A method of fabricating optical filter is disclosed. The method includes providing the substrate and selectively etching the substrate to form a plurality of freestanding layers. A plurality of dielectric layers is disposed over an outer surface of each of the frees... | 09/11/2007 |
| 7255978 | Multi-level optical structure and method of manufacture A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is locat... | 08/14/2007 |
| 7256127 | Air gap formation A method of forming air gaps within a solid structure is provided. In this method, a sacrificial material is covered by an overlayer. The sacrificial material is then removed through the overlayer to leave an air gap. Such air gaps are particularly useful as insulat... | 08/14/2007 |
| 7251406 | Optical waveguide termination with vertical and horizontal mode shaping An optical device is disclosed which includes a single-mode waveguide (700) which supports a first optical mode in a first region and a second optical mode in a second region. The waveguide includes a guiding layer (703) having at least one wing (75... | 07/31/2007 |
| 7246953 | Optical device package An optical device package includes a substrate having a top portion with an a recess for receiving an optical semiconductor component and an elongated linear groove for receiving an optical fiber. The optical fiber is positioned within the groove in said substrate s... | 07/24/2007 |
| 7244542 | Resins and photoresist compositions comprising same Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be ef... | 07/17/2007 |
| 7238241 | Method of producing high aspect ratio domes by vapor deposition An apparatus for the manufacture of chemical vapor deposited domes. The apparatus has a vapor deposition chamber with a plurality of sides, a base and a top where the base has a reactant port for receiving a flow of chemical reactants. A male mandrel is joined to on... | 07/03/2007 |
| 7220486 | Photoresist compositions New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an... | 05/22/2007 |
| 7217490 | Processes for producing silane monomers and polymers and photoresist compositions comprising same The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide th... | 05/15/2007 |
| 7214410 | Process for selecting solvents for forming films of ferroelectric polymers Disclosed herein is a process of forming a ferroelectric polymer film from a solution, wherein the solvent composition is selected so as to adjust the properties of the film. Films formed by this method have improved properties, particularly with respect to roughnes... | 05/08/2007 |
| 7211365 | Negative photoresists for short wavelength imaging New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 nm. Resists of the invention provide contrast between exposed and unexposed coating layer regions... | 05/01/2007 |
| 7208261 | Polymers, processes for polymer synthesis and photoresist compositions The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or... | 04/24/2007 |
| 7205087 | Solvents and photoresist compositions for 193 nm imaging New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm, particularly 193 nm. Resists of the invention comprise a polymer that is preferably substantially free of aromatic moieties and comprises photoacid-labile repeat unit... | 04/17/2007 |
| 7202009 | Polymers and photoresist compositions for short wavelength imaging This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. ... | 04/10/2007 |
| 7198727 | Etching process for micromachining materials and devices fabricated thereby The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographic plane... | 04/03/2007 |
| 7189490 | Photoresists containing sulfonamide component Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilaye... | 03/13/2007 |
| 7183037 | Antireflective coatings with increased etch rates The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention hav... | 02/27/2007 |
| 7166414 | Radiation sensitive compositions and methods The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding... | 01/23/2007 |
| RE39476 | Tin electrolyte Disclosed are electrolyte compositions for depositing tin or tin-alloys at various current densities. Also disclosed are methods of plating such tin or tin-alloys on substrates, such as the high speed tin plating of steel. ... | 01/23/2007 |
| 7163780 | Electronic device manufacture Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material. ... | 01/16/2007 |
| 7163751 | Coating compositions for use with an overcoated photoresist In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polyme... | 01/16/2007 |
| 7160629 | Tin plating Electrolyte compositions for the deposition of tin and tin-alloys on a substrate are disclosed, along with methods of electroplating tin and tin-alloys using such compositions. These electrolyte compositions are useful for high speed tin plating. ... | 01/09/2007 |
| 7158701 | Method for making optical devices with a moving mask and optical devices made thereby The present invention provides a method for forming a vertical taper in a waveguide. In the present invention, a shadow mask is disposed above a waveguide requiring a vertical taper. Then, the waveguide is exposed to a directional etching process (e.g. deep reactive... | 01/02/2007 |
| 7147983 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. ... | 12/12/2006 |
| 7144488 | Electrode, electrochemical cell, and method for analysis of electroplating baths A counter electrode for use in an electrochemical cell suitable for analysis of an electroplating composition, the counter electrode comprising a conductor; a sheath disposed about the conductor; an electrolyte disposed within the sheath; and an optionally porous el... | 12/05/2006 |
| 7132214 | Polymers and photoresist compositions for short wavelength imaging This invention relates to resins and photoresist compositions that comprise such resins. This invention includes new resins that comprise photoacid-labile deblocking groups, wherein the acid-labile moiety is substituted with one or more electron-withdrawing groups. ... | 11/07/2006 |
| 7128822 | Leveler compounds Compounds that function to provide level or uniform metal deposits are provided. These compounds are particularly useful in providing level copper deposits. Copper plating baths and methods of copper plating using these compounds are also provided. These baths and m... | 10/31/2006 |
| 7122108 | Tin-silver electrolyte A tin-silver electrolyte and methods of depositing tin-silver alloys on a substrate. ... | 10/17/2006 |
| 7118847 | Polymer and photoresist compositions Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions. ... | 10/10/2006 |
| 7105266 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same The invention includes polymers that contain a heterocyclic ring, preferably an oxygen- or sulfur-containing ring. The heterocyclic ring is preferably fused to the polymer backbone. The invention also provides photoresists that contain such polymers, particularly fo... | 09/12/2006 |
| 7090968 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such a... | 08/15/2006 |