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| Number | Title | Issue Date |
| 7759600 | Rupture resistant plasma tube A system for producing plasma tubes that can withstand a wide variety of physical and environmental stressors within a plasma processing system is disclosed. Within such a plasma processing system, a plasma tube structure has a central body portion—having a fixed ... | 07/20/2010 |
| 7636611 | Fuzzy logic system for process control in chemical mechanical polishing The present invention provides a versatile system for controlling chemical mechanical polishing in a semiconductor manufacturing process. The system of the present inventions utilizes an in-situ chemical mechanical polishing system, having some type of measurement o... | 12/22/2009 |
| 7486391 | System and method for haze control in semiconductor processes A method for haze control on a semiconductor reticle, the method including performing a reticle inspection of a semiconductor reticle to detect haze formation on a periodic basis, performing a wafer inspection to detect haze defects, forecasting haze formation, and ... | 02/03/2009 |
| 7404757 | Apparatus and method for breaking in multiple pad conditioning disks for use in a chemical mechanical polishing system An apparatus for breaking in new pad conditioning disks for use in a chemical mechanical polishing (CMP) system that polishes a semiconductor wafer by pressing the semiconductor wafer against a moving polishing pad. The apparatus comprises a break-in head that is re... | 07/29/2008 |
| 7371156 | Off-line tool for breaking in multiple pad conditioning disks used in a chemical mechanical polishing system An off-line tool for breaking in pad conditioning disks used in a chemical mechanical polishing (CMP) system. The off-line tool comprises a platen having a first surface for holding a polishing pad and a motor for rotating the polishing pad. The motor is coupled to ... | 05/13/2008 |
| 7094134 | Off-line tool for breaking in multiple pad conditioning disks used in a chemical mechanical polishing system An off-line tool for breaking in pad conditioning disks used in a chemical mechanical polishing (CMP) system. The off-line tool comprises a platen having a first surface for holding a polishing pad and a motor for rotating the polishing pad. The motor is coupled to ... | 08/22/2006 |
| 6939132 | Semiconductor workpiece apparatus Various embodiments of an apparatus for holding and processing semiconductor workpieces are provided. In one aspect, an apparatus is provided that includes a first base, a second base and three elongated members coupled to and between the first base and the second b... | 09/06/2005 |
| 6884145 | High selectivity slurry delivery system Various embodiments of a semiconductor processing fluid delivery system and a method delivering a semiconductor processing fluid are provided. In aspect, a system for delivering a liquid for performing a process is provided that includes a first flow controller that... | 04/26/2005 |
| 6689668 | Methods to improve density and uniformity of hemispherical grain silicon layers Various methods are provided of forming capacitor electrodes for integrated circuit memory cells in which out-diffusion of dopant from doped silicon layers is controlled by deposition of barrier layers, such as layers of undoped silicon and/or oxide. In o... | 02/10/2004 |
| 6597117 | Plasma coil Various embodiments of a plasma coil, methods of making the same, a processing apparatus utilizing plasma processes and methods of manufacture are disclosed. In one aspect, a plasma coil is provided that includes a first conductor coil that has a pluralit... | 07/22/2003 |
| 6495477 | Method for forming a nitridized interface on a semiconductor substrate A surface treatment method for forming a fluorine-doped nitridized interface on a semiconductor substrate. The fluorine-doped nitridized interface may be formed using an ammonia plasma CVD process having a treatment gas doped with a fluorine component, su... | 12/17/2002 |
| 6403455 | Methods of fabricating a memory device Various methods of fabricating circuit devices are provided. In one aspect, a method of fabricating a circuit device on a substrate is provided. The method includes forming a doped silicon structure on the substrate and forming a hemispherical grain silic... | 06/11/2002 |
| 6290741 | Auxiliary device for filter exchange in clean room An auxiliary device for filter exchange in an air filtering system of a clean room for allowing easy exchange of the filter used in the clean room. The auxiliary device for filter exchange may include a block plate having a width to be inserted through a ... | 09/18/2001 |
| 6224472 | Retaining ring for chemical mechanical polishing Methods and apparatus for chemical mechanical polishing of substrates, such as semiconductor wafers, which employ retaining rings to hold a substrate in place during the polishing process. The retaining rings have surface characteristics that may be used ... | 05/01/2001 |
