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Assignee: Sagami Chemical Research Center


Location: Ayase-shi, JP
No. of patents: 4

NumberTitleIssue Date
7906668Imide complex, method for producing the same, metal-containing thin film and method for producing the same
Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for ...
03/15/2011
7816549Metal-containing compound, its production method, metal-containing thin film, and its formation method
A compound which has thermal stability and moderate vaporizability and is satisfactory as a material for the CVD or ALD method; a process for producing the compound; a thin film formed from the compound as a raw material; and a method of forming the thin film. A com...
10/19/2010
7632958Titanium complexes, their production methods, titanium-containing thin films, and their formation methods
Objects of the present invention are to provide a novel titanium complex that has good vaporization characteristics and an excellent thermal stability, and becomes a raw material for forming a titanium-containing thin film by methods such as CVD method or ALD method...
12/15/2009
7470808Method for producing fluorine-containing acrylate
A process for producing a fluorine-containing acrylic acid ester represented by CH2═C(Rf)(COOR) characterized in that 1-bromo-1-perfluoroalkylethene represented by CH2═CBr—Rf, or 1,2-dibromo-1-perfluoroalkylethane represented by CH2
12/30/2008
 
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