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Assignee: SII NanoTechnology Inc.


Location: JP
No. of patents: 66

1    
NumberTitleIssue Date
8161568Self displacement sensing cantilever and scanning probe microscope
A cantilever has a probe portion and a cantilever portion having a free end portion from which the probe portion extends. A displacement detecting portion detects a displacement of the cantilever portion according to an interaction between a sample and the probe por...
04/17/2012
8124932Charged particle beam apparatus and method adjusting axis of aperture
A charged particle beam apparatus includes a charged particle source, an aperture, an object lens, an observing unit, an aperture driving portion, and a control portion. The control portion includes a spot pattern forming portion that forms a plurality of spot patte...
02/28/2012
8111079Conductivity measuring apparatus and conductivity measuring method
A conductivity measuring apparatus includes a probe base having a pair of electrodes disposed on respective opposite surfaces of a portion of the probe base. Observing and grasping probes are supported by the probe base in a cantilever state and are arranged adjance...
02/07/2012
8068583X-ray analysis apparatus and X-ray analysis method
Provided is an X-ray analysis apparatus including: an X-ray tubular bulb for irradiating a sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray and outputting a signal containing energy information on the charact...
11/29/2011
8058780Circular cylinder type piezoelectric actuator and piezoelectric element and scanning probe microscope using those
The cylindrical piezoelectric actuator which comprised a piezoelectric element which provided electrode in each of an inner peripheral face and an outer peripheral face which was cylindrical at least, and drive power supply to drive it. And the outer side electrode ...
11/15/2011
7997124Scanning probe microscope
A scanning probe microscope has a cantilever mounted to undergo oscillation movement over a surface of a sample. The cantilever has a probe on a distal end thereof. A Z-axis controlling amount calculating mechanism calculates a controlling amount for keeping constan...
08/16/2011
7973280Composite charged particle beam apparatus, method of processing a sample and method of preparing a sample for a transmission electron microscope using the same
An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron bea...
07/05/2011
7970101X-ray analyzer and X-ray analysis method
An X-ray tube which irradiates a primary X-ray to an irradiation point on a sample, an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information on the characteristic X-ray and...
06/28/2011
7927769Method for fabricating EUVL mask
A method for fabricating an extreme ultraviolet lithography (EUVL) mask. In an etching step, at least a part of an absorption layer of an EUVL mask is etched by allowing a charged particle to irradiate the absorption layer under feed of a halogenated xenon gas. In a...
04/19/2011
7923267Method of measuring length of measurement object article in micro-structure
A substrate comprises a substrate main body having a surface on which a measurement object article is to be formed. A reference scale is disposed on the surface of the substrate main body in the vicinity of a region of the surface where the measurement object articl...
04/12/2011
7789557Superconducting radiometry apparatus
A superconducting radiometry apparatus has a micro-calorie meter that detects an energy of a radiant ray as a temperature change. A signal detection mechanism detects an electric current flowing to the micro-calorie meter. A heat addition device adds a quantity of h...
09/07/2010
7750318Working method by focused ion beam and focused ion beam working apparatus
A first working process performs a deposition working or an etching working to a workpiece by face-irradiating a focused ion beam to the workpiece, and a second working process then performs a deposition working or an etching working to the workpiece by edge-irradia...
07/06/2010
7748894Thermal analysis equipment
A thermal analysis equipment includes a thermal analysis data preservation function that preserves, as thermal analysis data, signals from a temperature sensor and a physical quantity sensor that detect a temperature and a change in physical quantity, respectively, ...
07/06/2010
7700367Method of making lamina specimen
In a method of making a lamina specimen, first and second ion beams are simultaneously used to sputter etch first and second side walls of a lamina region at the same time under first and second ion beam conditions. A scanning ion microscope observation of the lamin...
04/20/2010
7605368Vibration-type cantilever holder and scanning probe microscope
A vibration-type cantilever holder holds a cantilever opposed to a sample. The holder supports a main body part of the cantilever at only its base end so that a probe at the free end of the cantilever can contact the sample. The holder has a cantilever-attaching sta...
10/20/2009
7589323Superconducting X-ray detector and X-ray analysis apparatus using the same
To provide a superconducting X-ray detector capable of carrying out a measurement by a high energy resolution by restraining a reduction in a sensitivity by a self magnetic field. A superconducting X-ray detector comprising a temperature detector 6 for detect...
09/15/2009
7550723Atom probe apparatus and method for working sample preliminary for the same
A preliminary processing technology for a sample locally cuts out a sample part of a device to be analyzed and processes it into a needle-like projection, and a technology of realizing SAP analysis on an atomic level by ensuring stabilized ion evaporation sequential...
06/23/2009
7518125Processing apparatus using focused charged particle beam
A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independe...
04/14/2009
7511289Working method utilizing irradiation of charged particle beam onto sample through passage in gas blowing nozzle
A working method of performing beam assist deposition or beam assist etching of a sample comprises irradiating a focused charged particle beam onto a region of the sample, and blowing a predetermined gas through a gas blowing nozzle toward the sample region while th...
03/31/2009
7511269Method of approaching probe and apparatus for realizing the same
A method of approaching a probe to a target position on a sample mounted on a sample stage tilted at a preselected tilt angle about a tilt axis of the sample stage. A distance between the tip of the probe and the target position of the sample is observed with a char...
03/31/2009
7507957Probe microscope system suitable for observing sample of long body
A problem to be resolved by the invention resides in providing a multifunction analyzing apparatus for detecting a shape with high resolution and physical property information capable of not only successively reading a base arrangement from end to end but also speci...
03/24/2009
7500779Thermal analysis apparatus
A thermal analysis apparatus possesses has a cylindrical furnace tube axially inserted in a cylindrical heating furnace, and a pair of sample holders extending axially inside the furnace tube. The furnace tube is supported by two axially spaced groups of butting mem...
03/10/2009
7494575Method for manufacturing a split probe
A method of manufacturing a split probe tip on a cantilever comprises providing a cantilever having a surface on which is formed a probe that projects outwardly from the surface at one end of the cantilever, irradiating and scanning a tip of the probe with a focused...
02/24/2009
7476418Method for fabricating nanometer-scale structure
In a method for fabricating a nanometer-scale structure by arranging nanotubes in a predetermined direction at a predetermined position, the method for fabricating a nanometer-scale structure comprises a first step of planarizing a substrate by etching a predetermin...
01/13/2009
7442942Charged particle beam apparatus
To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing...
10/28/2008
7442925Working method using scanning probe
The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative sca...
10/28/2008
7441445Surface information measuring apparatus and surface information measuring method
To measure surface information and physical information of a sample with high accuracy by promoting linearity in Z direction by nullifying cross talk in XY directions as less as possible, there is provided a surface information measuring apparatus including a probe ...
10/28/2008
7427744Piezoelectric actuator and scanning probe microscope using the same
A leaf spring 4 constituting an elastic member one end of which is fixed to a foundation 6, and other end of which is brought into contact with a laminating type piezoelectric element 2 or a driven member 5 is constituted such that a thic...
09/23/2008
7423266Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image including the observation point. An area including the observation point on t...
09/09/2008
7404313Scanning probe microscope
A scanning probe microscope has a self-detection type probe structure including a cantilever having an electrically conductive probe at a distal end thereof, a supporting part, and a piezoresistance element whose resistance value changes depending on the deflection ...
07/29/2008
7378654Processing probe
A processing probe for repairing a defective portion in a sample has a cantilever and a probe separate and independent from the cantilever and integrally connected to an end portion of the cantilever for scratch-processing a defective portion of a sample. The cantil...
05/27/2008
7375322Cantilever holder and scanning probe microscope
To prevent an influence from effecting on an oscillating state of a cantilever by firmly fixing a main body portion, there is provided a cantilever holder for attachably and detachably fixing a cantilever which is provided with a stylus at a front end thereof and a ...
05/20/2008
7373806Scanning probe microscope and scanning method
A scanning probe microscope has a probe tip for undergoing a scanning operation to scan a sample surface in X- and Y-directions parallel to the sample surface and for undergoing movement in a Z-direction vertical to the sample surface. A vibration unit vibrates the ...
05/20/2008
7375352Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in a shorter period of time in the event of overcutting by AFM scratch ...
05/20/2008
7356900Manipulator needle portion repairing method
In a manipulator needle portion defect repairing method, the existence of an abrasion or a fracture in a needle portion for holding a sample at an end of a manipulator disposed in an FIB device is confirmed using a microscope function of the FIB device. The abrasion...
04/15/2008
7345289Sample support prepared by semiconductor silicon process technique
A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 μm or less is prepared using a semiconductor silicon process technique. The sample support of...
03/18/2008
7337656Surface characteristic analysis apparatus
In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function ...
03/04/2008
7326445Method and apparatus for manufacturing ultra fine three-dimensional structure
A method is adopted for deposition technology using a focused ion beam device, characterized by enabling structures to be formed by using phenanthrene as a source gas and using ions of gallium or gold, silicon or beryllium etc. of energies of 5 to 100 keV from a liq...
02/05/2008
7323685Ion beam processing method
When scanning by an ion beam in advance an area 24 including a reference hole 23 formed at a position other than the area to be processed 25 of a light-shielding film 21 on a glass substrate 22, a secondary ion signal of the same a...
01/29/2008
7297944Ion beam device and ion beam processing method, and holder member
An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fractur...
11/20/2007
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