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Assignee: Reticula Corporation

Location: AnnArbor, MI
No. of patents: 1

Number	Title	Issue Date
5613013	Glass patterns in image alignment and analysis A system and method is provided for aligning and analyzing multiple images using Glass patterns. A Glass pattern is a Moire-like pattern obtained by superimposing an image on a transformed version of itself. The method includes superimposing the images to...	03/18/1997