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| Number | Title | Issue Date |
| 7419704 | Coatings on fiber reinforced composites The invention is a coating and a method for applying coatings to fiber reinforced composite materials. A first polymeric layer, free of fibers and particulate, coats a fiber reinforced polymer substrate. The first layer joins the fiber reinforced polymer substrate t... | 09/02/2008 |
| 7390561 | Method for making a metal surface infused composite and the composite thereof A metal surface infused composite object made by thermal spraying a metal material onto a release agent coated pattern, followed by vacuum infusion at least a portion of the metal material layer with a resin and then separating the composite infused metal object fro... | 06/24/2008 |
| 6454821 | Polishing composition and method The polishing slurry includes by weight percent, 0.1 to 50 metal oxy-acid accelerator, 0.5 to 50 cerium oxide abrasive particles and balance water. The metal oxy-acid accelerator is formed with a metal selected from the group consisting of chromium, lanth... | 09/24/2002 |
| 6410159 | Self-bonding MCrAly powder A material useful for forming high temperature coatings. The material contains a MCrAlY powder wherein M is selected from the group consisting of iron, nickel, cobalt, iron-base alloys, nickel-base alloys and cobalt-base alloys. An aluminum layer coats th... | 06/25/2002 |
| 6269699 | Determination of actual defect size in cathode sputter targets subjected to ultrasonic inspection A method for determining actual size of internal target defects by ultrasonic inspection is provided in which the amplitude of signals generated by ultrasonic inspection are compared to metallurgical size measurements obtained through the use of optical m... | 08/07/2001 |
| 6091046 | Bonding and sputtering target by variable polarity plasma arc welding A reusable aluminum sputter target support tube which is bonded to a replaceable sputter target by variable polarity plasma arc welding and a method of manufacturing such reusable sputtering target assemblies.... | 07/18/2000 |
| 6045634 | High purity titanium sputtering target and method of making A high purity titanium polycrystalline target with uniform grain size and near ideal (103) crystallographic orientation and a method of making. Uniform grain size from 10 μm-500 μm is achieved by using a fine grain five inch diameter titanium billet pro... | 04/04/2000 |
