Assignee: Photronics, Inc.

Location: Brookfield, CT
No. of patents: 35

Number	Title	Issue Date
8102031	Security element for an integrated circuit, integrated circuit including the same, and method for securing an integrated circuit An integrated circuit including a substrate; a circuit pattern formed over the substrate; and one or more fences formed around edges of the circuit pattern, each of the one or more fences having a determined electrical resistance which is used to detect the addition...	01/24/2012
7943273	Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same A photomask for integrated circuit production for development of integrated circuit components, where the integrated circuit production uses a radiation source that generates a source image, includes a substrate with one or more layers disposed thereon; a source sep...	05/17/2011
7910269	Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same A photomask for integrated circuit production comprising a substrate, one or more layers and a detector for monitoring a process parameter of the integrated circuit production in combination with one or more of the following: communication circuitry for communicatin...	03/22/2011
7851110	Secure photomask with blocking aperture A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask. ...	12/14/2010
7790340	Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same A photomask for integrated circuit production comprising a substrate, one or more layers and a detector for monitoring a process parameter of the integrated circuit production in combination with one or more of the following: communication circuitry for communicatin...	09/07/2010
7669167	Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system A system for generating photomask orders in a specified format includes at least one template or order for entry and storage of photomask order data, wherein the at least one template or order is created based upon requirements of a specified photomask order format....	02/23/2010
7640529	User-friendly rule-based system and method for automatically generating photomask orders A system for generating photomask orders in a specified format includes at least one template or order for entry and storage of photomask order data, wherein the at least one template or order is created based upon requirements of a specified photomask order format....	12/29/2009
7480539	Automated manufacturing system and method for processing photomasks The present invention relates generally to an automated manufacturing system and method for manufacturing photomasks wherein information provided by a customer at a remote location is interfaced, via a network, to a photomask manufacturer's computer system and autom...	01/20/2009
7473500	Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same The present invention generally relates to improved binary half tone (“BHT”) photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices) made from such BHT photo...	01/06/2009
7435533	Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases A method of forming a semiconductor layer of a semiconductor device including interposing a reticle between an energy source and a semiconductor wafer, the reticle including at least two duplicate mask patterns each having a different bias, and passing energy throug...	10/14/2008
7396617	Photomask reticle having multiple versions of the same mask pattern with different biases A reticle includes at least two duplicate mask patterns each having a different bias. A reticle according to at least one embodiment of the invention includes a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, secon...	07/08/2008
7356374	Comprehensive front end method and system for automatically generating and processing photomask orders The present invention relates to a comprehensive front-end method and system for automatically generating and processing photomask orders. This method and system includes two separate, but related software components. The first software component of the present inve...	04/08/2008
7351503	Fused silica pellicle in intimate contact with the surface of a photomask A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask. ...	04/01/2008
7344824	Alternating aperture phase shift photomask having light absorption layer The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes a l...	03/18/2008
7312004	Embedded attenuated phase shift mask with tunable transmission The attenuation and phase shift properties of an embedded attenuated phase shift mask (EAPSM) may be independently selected. After or during plowing of regions of an embedded phase shift layer, exposed regions of a substrate are etched to a predetermined depth. Addi...	12/25/2007
7074530	Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same The present invention generally relates to improved binary half tone (“BHT”) photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices) made from such BHT photo...	07/11/2006
7049034	Photomask having an internal substantially transparent etch stop layer The present invention generally relates, to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes an...	05/23/2006
6996450	Automated manufacturing system and method for processing photomasks The present invention relates generally to an automated manufacturing system and method for manufacturing photomasks wherein information provided by a customer at a remote location is interfaced, via a network, to a photomask manufacturer's computer system and autom...	02/07/2006
6933084	Alternating aperture phase shift photomask having light absorption layer The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes a l...	08/23/2005
6908716	Disposable hard mask for photomask plasma etching A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the i...	06/21/2005
6868209	Method for fabricating chirped fiber Bragg gratings A chirped Bragg grating is fabricated in an optical fiber by exposing the fiber to a coherent beam of light through a parallel phase mask having a series of progressively chirped segments produced on a lithography tool. The chirped phase mask is fabricated by exposi...	03/15/2005
6855463	Photomask having an intermediate inspection film layer The present invention relates generally to improved photomask blanks used in photolithography for the manufacture of integrated circuits and other semiconductor devices, and more specifically, to the detection of defects in such photomasks after processing. In parti...	02/15/2005
6842881	Rule based system and method for automatically generating photomask orders in a specified order format The present invention relates generally to a rule based system and method for automatically generating photomask orders in a specified format, and more particularly, relates to software which includes templates in which photomask order data is entered and rules for ...	01/11/2005
6828068	Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same The present invention generally relates to improved binary half tone (“BHT”) photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices) made from such BHT photo...	12/07/2004
6749974	Disposable hard mask for photomask plasma etching A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the i...	06/15/2004
6686103	Fused silica pellicle A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place usi...	02/03/2004
6682861	Disposable hard mask for phase shift photomask plasma etching A method for creating a phase shift photomask which includes a layer of hard mask material, the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producin...	01/27/2004
6567719	Method and apparatus for creating an improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations An method for creating an image on a photosensitive material with enhanced inside corner resolution using a raster scan exposure system. The photosensitive material may comprise a layer of an unexposed photomask. An energy beam scan is extended by one or ...	05/20/2003
6562549	Method of manufacturing photomasks by plasma etching with resist stripped A method for adjusting out of tolerance critical dimensions of an under processed photomask to be within predetermined defined limits after the photosensistive resist material has been removed from the exposed photomask. The method includes measuring the ...	05/13/2003
6537708	Electrical critical dimension measurements on photomasks A method for measuring critical dimensions on photomasks, and more specifically to a method for measuring critical dimensions on photomasks using an electrical test structure. The test structure 30 may be comprised of a cross resistor 32 for van der Pauw ...	03/25/2003
6524754	Fused silica pellicle A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place usi...	02/25/2003
6472766	Step mask A step mask having a plurality of test cells and a method for producing the same. Each test cell of the step mask is etched for a different amount of time and therefore has a different etch depth or height. The number of phase shifter layer etch iteration...	10/29/2002
6472107	Disposable hard mask for photomask plasma etching A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photoma...	10/29/2002
6406818	Method of manufacturing photomasks by plasma etching with resist stripped A method for adjusting out of tolerance critical dimensions of an under processed photomask to be within predetermined defined limits after the photosensistive resist material has been removed from the exposed photomask. The method includes measuring the ...	06/18/2002
6360134	Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations An method for creating an image on a photosensitive material with enhanced inside corner resolution using a raster scan exposure system. The photosensitive material may comprise a layer of an unexposed photomask. An energy beam scan is extended by one or ...	03/19/2002

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Assignee: Photronics, Inc.