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...Daniel Webster invented a "bull plow" to pull out tree stumps. It didn't catch on because it was huge and required four oxen to pull it!
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| Number | Title | Issue Date |
| 8142965 | Method and system for measuring in patterned structures A sample having a patterned area and a method for use in controlling a pattern parameter is presented. The sample comprises at least one test structure having a patterned region similar to a pattern in the patterned area, the patterns in the patterned area and in th... | 03/27/2012 |
| 8049882 | Spectrometric optical method and system providing required signal-to-noise of measurements A system and method for use in spectrometric measurements of an article using selecting an optimal integration time range of the light detection system during which the measurement is to be applied, the optimal integration time being that at which a required value o... | 11/01/2011 |
| 8040532 | Thin films measurement method and system A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at leas... | 10/18/2011 |
| 7927184 | Method and system for endpoint detection A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predet... | 04/19/2011 |
| 7864344 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 01/04/2011 |
| 7864343 | Method and system for measuring patterned structures A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by... | 01/04/2011 |
| 7821614 | Monitoring apparatus and method particularly useful in photolithographically processing substrates Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which th... | 10/26/2010 |
| 7791740 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 09/07/2010 |
| 7760368 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 07/20/2010 |
| 7663768 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 02/16/2010 |
| 7626710 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 12/01/2009 |
| 7614932 | Method and system for endpoint detection A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predet... | 11/10/2009 |
| 7595896 | Thin films measurement method and system A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at leas... | 09/29/2009 |
| 7525634 | Monitoring apparatus and method particularly useful in photolithographically Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which th... | 04/28/2009 |
| 7495782 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 02/24/2009 |
| 7482596 | Vacuum UV based optical measuring method and system A method and system are presented for use in optical processing of an article by VUV radiation. The method comprises: localizing incident VUV radiation propagation from an optical head assembly towards a processing site on the article outside the optical head assemb... | 01/27/2009 |
| 7477405 | Method and system for measuring patterned structures A measurement method and system configured to determine parameters of a structure during production, the system including: a stage configured to support the structure during measurements; a measuring unit coupled to the stage; and a processor coupled to the measurin... | 01/13/2009 |
| RE40225 | Two-dimensional beam deflector A two dimensional beam deflector is disclosed which deflects beams from multiple optical assemblies. The input of beams of the multiple optical assemblies follow parallel optical paths until deflection to a wafer. An ellipsometer using a two-dimensional beam deflect... | 04/08/2008 |
| 7330259 | Optical measurements of patterned articles A method and system are presented for use in measuring/inspecting a patterned article. Optical measurements are applied to a measurement site on the article by illuminating the measurement site with a plurality of wavelengths at substantially normal incidence of the... | 02/12/2008 |
| 7327476 | Thin films measurement method and system A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at leas... | 02/05/2008 |
| 7320265 | Article transfer system A system for controlling an axial movement of an article is presented. The system comprises a support stage assembly and a spring suspension arrangement mounted on the support stage assembly. The spring suspension arrangement comprises first and second assemblies ar... | 01/22/2008 |
| 7301163 | Lateral shift measurement using an optical technique Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectiv... | 11/27/2007 |
| 7292341 | Optical system operating with variable angle of incidence An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for c... | 11/06/2007 |
| 7292335 | Optical measurements of patterned structures A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for g... | 11/06/2007 |
| 7289234 | Method and system for thin film characterization A method and system are presented for optical measurements in multi-layer structures to determine the properties of at least some of the layers. The structure is patterned by removing layer materials within a measurement site of the structure from the top layer to t... | 10/30/2007 |
| 7289190 | Monitoring apparatus and method particularly useful in photolithographically Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which th... | 10/30/2007 |
| 7255748 | Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof The present invention relates to an integrated apparatus for monitoring wafers and for process control in the semiconductor manufacturing process, by means of at least two different measurements that can be installed inside any part of the semiconductor production l... | 08/14/2007 |
| 7253970 | Reflective optical system A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the ... | 08/07/2007 |
| 7251043 | Method and system for measuring thin films An optical system is presented for use in a measurement system (100) for use in measurements of thin films of a workpiece (W), the system comprising an optical assembly (14), comprising illuminator assembly, a detector assembly, and a light directing a... | 07/31/2007 |
| 7245375 | Optical measurement device and method A system and method are presented for measurement on an article. The system comprises an illuminator for producing light of at least one predetermined wavelength range; an optical system; a displacement arrangement; and a control system. The optical system is config... | 07/17/2007 |
| 7195540 | Method and system for endpoint detection A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predet... | 03/27/2007 |
| 7187456 | Method and apparatus for measurements of patterned structures A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions... | 03/06/2007 |
| 7184152 | Optical measurements of line edge roughness A method and system for optical measurements of line edge roughness (LER) of patterned structures based on illuminating the structure with incident radiation and detecting a spectral response of the structure, and further applying software and/or hardware utilities ... | 02/27/2007 |
| 7169015 | Apparatus for optical inspection of wafers during processing The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel... | 01/30/2007 |
| 7122817 | Lateral shift measurement using an optical technique Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectiv... | 10/17/2006 |
| 7123366 | Method and apparatus for measurements of patterned structures An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed o... | 10/17/2006 |
| 7030957 | Monitoring apparatus and method particularly useful in photolithographically processing substrates Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which th... | 04/18/2006 |
| 7019850 | Method and system for thin film characterization A method and system are presented for optical measurements in multi-layer structures to determine the properties of at least some of the layers. The structure is patterned by removing layer materials within a measurement site of the structure from the top layer to t... | 03/28/2006 |
| 6974962 | Lateral shift measurement using an optical technique The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two differen... | 12/13/2005 |
| 6964276 | Wafer monitoring system A wafer monitoring system including a gripper operative to fixedly hold a wafer, a bottom buffering unit comprising at least one supporting element adapted to support a wafer, a top buffering unit comprising at least two supporting elements adapted to support a wafe... | 11/15/2005 |
