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Assignee: Nikon Corporation


Location: Chiyoda-ku, Tokyo, JP
No. of patents: 2

NumberTitleIssue Date
7375797Utilities transfer system in a lithography system
Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physic...
05/20/2008
7351504Photomask blank substrate, photomask blank and photomask
In a quadrangular photomask blank substrate with a length on each side of at least 6 inches, which has a pair of strip-like regions that extend from 2 to 10 mm inside each of a pair of opposing sides along an outer periphery of a substrate top surface, with a 2 mm e...
04/01/2008
 
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