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| Number | Title | Issue Date |
| 6812634 | Graphite nanofibers, electron-emitting source and method for preparing the same, display element equipped with the electron-emitting source as well as lithium ion secondary battery A graphite nanofiber material herein provided has a cylindrical structure in which graphene sheets each having an ice-cream cone-like shape whose tip is cut off are put in layers through catalytic metal particles; or a structure in which small pieces of graphene she... | 11/02/2004 |
| 6781812 | Chuck equipment A chuck equipment which can hold insulating substrates is provided. First and second electrodes are provided to be exposed on the base the surface of which is insulated. The insulating substrate is placed in contact with or in close proximity to the surfaces of the ... | 08/24/2004 |
| 6743718 | Process for producing barrier film and barrier film thus produced A thin nitrode film having a low resistance is formed at a low film-forming temperature. In the step of forming a thin nitride film of a high temperature-melting point metal by introducing a feedstock gas having the high temperature-melting point metal and a reducti... | 06/01/2004 |
| 6507698 | Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film An inactive gas is introduced into an organic material evaporation source to place a thin organic film material in the organic material evaporation source in an atmosphere having a relatively high pressure, and the temperature of the thin organic film mat... | 01/14/2003 |
| 6475333 | Discharge plasma processing device A discharge plasma processing device comprising a chamber with an evacuation system, a magnetic field generation system and an electric field application system with which the feature of operation is first to form a magnetic neutral line in the vacuum cha... | 11/05/2002 |
| 6473564 | Method of manufacturing thin organic film An inactive gas is introduced into an organic material evaporation source to place a thin organic film material in the organic material evaporation source in an atmosphere having a relatively high pressure, and the temperature of the thin organic film mat... | 10/29/2002 |
| 6469448 | Inductively coupled RF plasma source The present invention provides an inductively coupled RF plasma source that can improve the nonuniformity in substrate treatment by canceling out the radial electric fields generated between a plasma and an antenna coil. The inductively coupled RF plasma ... | 10/22/2002 |
| 6290826 | Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly A sputtering apparatus includes a vacuum housing, a substrate holder disposed in the vacuum housing for holding a substrate thereon, and a composite sputtering cathode assembly disposed in the vacuum housing. The composite sputtering cathode assembly has ... | 09/18/2001 |
| 6194316 | Method for forming CU-thin film A method for forming a Cu-thin film includes the steps of coating a dispersion containing Cu-containing ultrafine particles individually dispersed therein on a semiconductor substrate having recessed portions, such as wiring grooves, via holes or contact ... | 02/27/2001 |
| 6101316 | Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film An inactive gas is introduced into an organic material evaporation source to place a thin organic film material in the organic material evaporation source in an atmosphere having a relatively high pressure, and the temperature of the thin organic film mat... | 08/08/2000 |
| 5898727 | High-temperature high-pressure gas processing apparatus The present invention provides a processing apparatus for eliminating pores in via holes of a silicon semiconductor. The apparatus includes a high-pressure vessel divided into at least two vessel component members in the axial direction thereof, at least ... | 04/27/1999 |
| 5851589 | Method for thermal chemical vapor deposition A method and an apparatus for a CVD comprising feeding a first gas flow, including a reactive gas, in a laminar flowing state and in a sheet state parallel to the surface of a substrate and feeding a second gas flow, including a non-reactive gas, in a dir... | 12/22/1998 |
| 5804027 | Apparatus for generating and utilizing magnetically neutral line discharge type plasma An apparatus for generating magnetically neutral line discharge type plasma comprises a magnetic field generating coil for forming magnetically neutral lines defined by continuously connecting points of zero-intensity magnetic field that is arranged withi... | 09/08/1998 |
| 5792271 | System for supplying high-pressure medium gas The present invention provides a system for supplying a high-pressure medium gas suitable for processing a semiconductor to be processed by heating under isostatic pressure in a short cycle. The system includes a gas holder containing a high-pressure medium ga... | 08/11/1998 |
| 5751002 | Ion implantation apparatus An ion implantation apparatus is provided with an ion source and a mass spectrometer having an analyzer magnet and is adapted to take out ions having a predetermined kinetic energy and mass from other ions produced in the ion source. It further includes a... | 05/12/1998 |
| 5561240 | Leak detecting apparatus using compound turbo-molecular pump A leak detecting apparatus using a compound turbo-molecular pump has an analyzer tube, an auxiliary vacuum pump such as a rotary pump connected to the analyzer tube by means of a passage with a compound turbo-molecular pump and a fore valve in between. An... | 10/01/1996 |
| 5554418 | Method of forming passivation film A passivation film is formed by plasma CVD process in which organic oxysilane is used as a raw gas. When an SiO2 film as the passivation film is formed on a surface of a substrate, Ar, He or NH3 gas is used as a reactive gas which se... | 09/10/1996 |
| 5250339 | Magnetic recording medium A magnetic recording medium suitable for high-density recording which comprises a non-magnetic substrate disk, at least one magnetic layer and at least one protective layer, the magnetic layer and the protective layer being formed in succession on the non... | 10/05/1993 |
| 5228052 | Plasma ashing apparatus A plasma ashing apparatus has a vacuum treatment chamber for receiving therein a substrate coated with a resist film, a reactive gas introduction pipe equipped with a plasma applicator, a vacuum exhaust pipe, a heating means for heating the substrate, and... | 07/13/1993 |
| 5226056 | Plasma ashing method and apparatus therefor In a method for plasma ashing a resist film coated on a substrate, the temperature of the substrate is controlled initially at temperatures below that at which explosion of the resist film occurs until a surface portion of a resist film has been removed. ... | 07/06/1993 |
| 5198309 | Magnetic recording member An improved magnetic recording member comprising a magnetic metallic film having the composition Cox Cry Niz wherein x, y, and z are atomic ratios and 0.45ࣘx | 03/30/1993 |
| 5180476 | Method for producing transparent conductive films A method of producing by sputtering an In-O, Sn-O, Zn-O, Cd-Sn-O or Cd-In-O based transparent conductive film according to the present invention uses the addition of a donor element, if needed. The sputtering is carried out by maintaining an intensity of ... | 01/19/1993 |
| 5147168 | Loading and unloading airlock apparatus for a vacuum treatment chamber A loading and unloading airlock apparatus for a vacuum treatment chamber which includes an airlock chamber, a transport mechanism inside the chamber to transport a substrate holder arranged to have substrates detachably mounted thereon, an exhaust port to... | 09/15/1992 |
| 5147734 | Magnetic recording media manufactured by a process in which a negative bias voltage is applied to the substrate during sputtering A magnetic recording member with improved coercive force is obtained by: (a) forming by sputtering or Cr film on a non-magnetic substrate; (b) forming by sputtering an epitaxially grown film of a Co alloy containing at least Cr as an additional metal on the Cr film... | 09/15/1992 |
| 5106470 | Method and device for controlling an electromagnet for a magnetron sputtering source An apparatus and method for controlling an electromagnet for a magnetron sputtering source controls electric currents flowing through a central coil and an inner peripheral coil of the electromagnet to flow in the same direction. Further, the direction of... | 04/21/1992 |
| 5069983 | Magnetic recording member A magnetic recording member having high coercive force, comprising: (a) a non-magnetic substrate; (b) a Cr base film formed on said substrate by a film forming process; and (c) a Co alloy film formed on said Cr base film by the same film forming process as in (b), ... | 12/03/1991 |
| 5028795 | Ion implantation apparatus An ion implanation apparatus comprises a first multipole electrostatic deflector and a second multipole electrostatic deflector. The first multipole electrostatic deflector comprises five or more electrodes equally spaced around an optical axis to each of... | 07/02/1991 |
| 5024854 | Method of manufacturing perpendicular type magnetic recording member A perpendicular type magnetic recording member comprising a perpendicular-incidence magnetic film on a substrate, the perpendicular-incidence magnetic film comprising a magnetic metal and oxygen, the magnetic metal being selected from the group consisting... | 06/18/1991 |
| 4983850 | Ion implantation device An ion implanter systems in which a deflector system comprises a first multiple pole electrostatic deflector having five or more poles for deflecting ion beams and a second multiple pole electrostatic deflector having poles of the same number as that of s... | 01/08/1991 |
| 4942342 | Parallel sweeping system for electrostatic sweeping ion implanter A parallel sweeping system for electrostatic sweeping ion implanters comprising an ion source for generating an ion beam, first and second multipole beam deflectors along and around a common optical axis and a target wafer to be raster-scanned by the defl... | 07/17/1990 |
| 4941430 | Apparatus for forming reactive deposition film An apparatus for forming a reactive deposition film includes a member for supporting a body to be coated in a vacuum chamber; an evaporation source of element constituting the reactive deposition film; apparatus for introducing a reaction gas into the vac... | 07/17/1990 |
| 4848814 | Wafer transfer hand A wafer transferring hand is so constructed that at least three seats made of a soft low-friction material are provided in an integral manner, a groove having a width slightly wider than the thickness of the wafer is formed in the laterally arranged seats... | 07/18/1989 |
| 4841197 | Double-chamber ion source Ion source including an electric discharge chamber body divided by a partition, having an anode electrode therein, into a main discharge chamber and a subsidiary discharge chamber. The subsidiary discharge chamber has a filament mounted therein aligned wi... | 06/20/1989 |
| 4832715 | Fine particle collector arrangement for vacuum pumps The present invention relates to a fine particle collector arrangement for vacuum pumps, in which high temperature walls and low temperature walls are alternately provided in the collecting chamber to form gas flow passage which is extended from the inlet... | 05/23/1989 |
| 4816046 | Fine particle collector trap for vacuum evacuating system A particle collector trap for a vacuum evacuating system wherein there is provided a vessel formed of a double-wall cylinder and having an inlet conduit connected to a vacuum processing chamber and an outlet conduit connected to at least one vacuum pump, ... | 03/28/1989 |
| 4624767 | Sputter etching apparatus having a second electrically floating electrode and magnet means Sputter etching apparatus which includes a sputter etching electrode for mounting a substrate in a vacuum treatment chamber and another electrode oppositely facing the sputter etching electrode. The other electrode is in an electrically floating condition... | 11/25/1986 |
| 4611121 | Magnet apparatus Magnet apparatus for providing a magnetic field having a gradient in an operation chamber comprising a cylindrical permanent magnet surrounding an outer periphery of the operation chamber and having opposite ends and a hollow interior, and a subsidiary yo... | 09/09/1986 |
| 4581245 | Method of manufacturing of abrasion resisting magnetic recording product A method and apparatus for making an abrasion-resistant magnetic recording product comprising forming a magnetic film on the surface of a substrate in a vacuum container, and thereafter, vapor depositing a lubricant on the surface of the magnetic film in ... | 04/08/1986 |
| 4237183 | Process for the surface treatment of a synthetic resin lens and the product thereof A process for the surface treatment of a synthetic resin lens comprising applying to the surface of a lens body made of synthetic resin such as allyl resin or the like a coating film of glass by a high-vacuum electric-field vapor deposition treatment. The... | 12/02/1980 |
| 3945807 | Metal tool A tool such as a drill, etc. made of a hard metal, e.g., a cemented carbide, having applied thereto a coating film of a noble metal such as gold, silver, platinum, etc. by means of an ion-plating treatment.... | 03/23/1976 |
