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| Number | Title | Issue Date |
| 8316698 | Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask Determining a repairing form of a defect at or close to an edge of a substrate. The defect may be scanned with a scanning probe microscope to determine a three-dimensional contour of the defect. The defect may be scanned with a scanning particle microscope to determ... | 11/27/2012 |
| 7537708 | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface The invention refers to a procedure for etching of materials at the surface by focussed electron beam induced chemical reactions at said surface. The invention is characterized in that in a vacuum atmosphere the material which is to be etched is irradiated with at l... | 05/26/2009 |
| 7452477 | Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface The invention relates to a procedure for etching of materials at the surface by focussed electron beam induced chemical reaction at the surface, with the following steps: a) in a vacuum atmosphere the material which is to be etched is irradiated with at least one be... | 11/18/2008 |
| 7238294 | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface The invention refers to a procedure for etching of materials at the surface by focussed electron beam induced chemical reactions at said surface. The invention is characterized in that in a vacuum atmosphere the material which is to be etched is irradiated with at l... | 07/03/2007 |
| 7232997 | Apparatus and method for investigating or modifying a surface with a beam of charged particles An apparatus for investigating and/or modifying a sample with charged particles, in particular a scanning electron microscope, is provided. The apparatus comprises a beam (1, 2) of charged particles, a shielding element (10) having an opening (30 | 06/19/2007 |
| 6967714 | Method for determining a refractive index The matter for which the refractive index is to be determined, is made available in the form of a theoretically determinable scattering or diffraction pattern. Two or more orders of diffraction may then be defined to form at least one intensity ratio. At least one i... | 11/22/2005 |
| 6909104 | Miniaturized terahertz radiation source A miniaturized terahertz radiation source based on the Smith-Purcell effect is provided, in which, from a focused electron source, a high-energy bundle of electrons is transmitted at a defined distance over a reflection diffraction grating composed of transversely d... | 06/21/2005 |
| 6903549 | Electron spectrometer Inordinate localised systems are used at room temperature in a novel device in the form of an electron spectrometer for utilising single-electron electronic applications. Said electron spectrometer device consists of a nanocrystalline metal or a nanocrystalline semi... | 06/07/2005 |
