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Assignee: Mitsui Mining & Smelting Co., Ltd.


Location: Shinagawa-ku, Tokyo, JP
No. of patents: 1

NumberTitleIssue Date
7217464Method of manufacturing electrodeposited copper foil with carrier foil for high-temperature heat-resistance and electrodeposited copper foil with carrier foil for high-temperature heat-resistance obtained by the manufacturing method
The object is to provide a method of manufacturing electrodeposited copper foil with a carrier foil for high-temperature heat-resistance in which the peeling of the carrier foil is easy even by press working at temperatures of not less than 200°C. For this purpose ...
05/15/2007
 
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