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A method of swing on a swing is disclosed, in which a user positioned on a standard swing suspended by two chains from a substantially horizontal tree branch induces side to side motion by pulling alternately on one chain and then the other.
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| Number | Title | Issue Date |
| 7934172 | SLM lithography: printing to below K1=.30 without previous OPC processing Previously disclosed methods and devices are extended in this application by two-dimensional analysis of optical proximity interactions and by fashioning a computationally efficient kernel for rapid calculation of adjustments to be made. The computations can be made... | 04/26/2011 |
| 7930653 | Triangulating design data and encoding design intent for microlithographic printing The present disclosure relates to fracturing of polygon data, with one application being microlithography. In particular, it relates to preserving data regarding edges and/or vertices of the original polygons as the polygons are triangulated and even if the results ... | 04/19/2011 |
| 7923182 | Multi-focus method of enhanced three-dimensional exposure of resist The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optica... | 04/12/2011 |
| 7919218 | Method for a multiple exposure beams lithography tool An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by simultaneously using a plurality of exposure beams. In an example embodiment it is determined if any of the... | 04/05/2011 |
| 7912671 | Method for measuring the position of a mark in a deflector system The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pa... | 03/22/2011 |
| 7842926 | Method and device for correcting SLM stamp image imperfections The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to patter... | 11/30/2010 |
| 7808648 | Method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample A method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample are described. A beam is split into reference and illuminating beams having known polarization. The test sample is ex... | 10/05/2010 |
| 7800815 | Pattern generator The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modula... | 09/21/2010 |
| 7787174 | Pattern generator The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modula... | 08/31/2010 |
| 7759620 | Fourier plane analysis and refinement of SLM calibration The present disclosure relates to phase-sensitive calibration of an SLM system. In particular, it relates to selecting among local calibrations when there is more than one calibration that satisfies a calibration intensity criteria. It utilizes information available... | 07/20/2010 |
| 7755657 | Method for high precision printing of patterns The present invention includes a method to print patterns with improved edge acuity. The method for printing fine patterns comprises the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categorie... | 07/13/2010 |
| 7715641 | Graphics engine for high precision lithography The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims... | 05/11/2010 |
| 7710634 | Pattern generator The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modula... | 05/04/2010 |
| 7709165 | Image enhancement for multiple exposure beams An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined separation in at least a first direction for exp... | 05/04/2010 |
| 7705965 | Backside lithography and backside immersion lithography The present disclosure relates to formation of latent images in a radiation sensitive layer applied to a substrate that is transparent to or transmissive of radiation at the exposing wavelength. In particular, it relates to so-called backside lithography, in which t... | 04/27/2010 |
| 7705963 | Pupil improvement of incoherent imaging systems for enhanced CD linearity A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagne... | 04/27/2010 |
| 7650588 | Methods and systems for pattern generation based on multiple forms of design data In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving ... | 01/19/2010 |
| 7646919 | Graphics engine for high precision lithography The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims... | 01/12/2010 |
| 7618751 | RET for optical maskless lithography The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques. ... | 11/17/2009 |
| 7590966 | Data path for high performance pattern generator A method and system for a high-speed datapath for a high-performance pattern generator such as an analog SLM for generating the image is disclosed. The data path has provisions for completely independent parallel data flows giving true scalability to arbitrarily hig... | 09/15/2009 |
| 7588870 | Dual layer workpiece masking and manufacturing process The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a workpiece substrate. The methods and devices produce small featur... | 09/15/2009 |
| 7567375 | Hidden hinge MEMS device The present invention relates to a method for manufacturing a MEMS device, including the actions of: providing a substrate having a back and front surface essentially in parallel with each other, defining in said substrate at least one hidden support by removing mat... | 07/28/2009 |
| 7542129 | Patterning apparatuses and methods for the same An apparatus for patterning a workpiece may include at least two spatial light modulators. The at least two spatial light modulators may receive and relay electromagnetic radiation from an electromagnetic radiation source toward a workpiece. The electromagnetic radi... | 06/02/2009 |
| 7535623 | SLM addressing methods and apparatuses A spatial light modulator may include a plurality of deflectable modulating elements. Each of the deflectable modulating elements may further include a support structure, an electrostatically deflectable mirror element and at least one electrode. The mirror element ... | 05/19/2009 |
| 7528932 | SLM direct writer The present invention relates to an apparatus (100) for patterning a workpiece arranged at an image plane and sensitive to electromagnetic radiation, comprising a source emitting electromagnetic radiation onto an object plane and at least two spatial light mo... | 05/05/2009 |
| 7525671 | Registration method and apparatus therefor The present invention relates to a method to determine a position of at least one mark provided on a substrate, comprising the actions of: detecting a first mark on said substrate by using a first detector, detecting a first set of marks comprising at least a second... | 04/28/2009 |
| 7488957 | Pattern generation methods and apparatuses A method may comprise emitting electromagnetic radiation onto a workpiece and storing data describing geometrical elements in a pattern. The electromagnetic radiation may be focused and/or reflected in a first direction, and a power level of the electromagnetic radi... | 02/10/2009 |
| 7444616 | Method for error reduction in lithography The present invention relates to a method and a system for predicting and/or measuring and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, prin... | 10/28/2008 |
| 7424330 | Method and apparatus for controlling deformable actuators In order to prevent negative effects of imprinting an the addressing accuracy of deformable actuators, a method for controlling deformable actuators has, during an event period, driving the first and the second deformable actuator for causing the deformable actuator... | 09/09/2008 |
| 7411651 | PSM alignment method and device The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to prod... | 08/12/2008 |
| 7405414 | Method and apparatus for patterning a workpiece The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arrange... | 07/29/2008 |
| 7369291 | SLM addressing methods and apparatuses A spatial light modulator may include a plurality of deflectable modulating elements. Each of the deflectable modulating elements may further include a support structure, an electrostatically deflectable mirror element and at least one electrode. The mirror element ... | 05/06/2008 |
| 7369217 | Method and device for immersion lithography The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiati... | 05/06/2008 |
| 7369962 | Method and device for data integrity checking The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that ac... | 05/06/2008 |
| 7365901 | Pattern generator The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modula... | 04/29/2008 |
| 7365829 | Method and apparatus for image formation The present invention relates to a method for adjusting a pattern to be imaged onto a workpiece. The pattern representing an image is divided in a plurality of regions. A pattern density in said plurality of region is computed. At least one feature in at least one o... | 04/29/2008 |
| 7328425 | Method and device for correcting SLM stamp image imperfections The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to patter... | 02/05/2008 |
| 7323291 | Dual layer workpiece masking and manufacturing process The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a workpiece substrate. The methods and devices produce small featur... | 01/29/2008 |
| 7302111 | Graphics engine for high precision lithography The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims... | 11/27/2007 |
| 7285365 | Image enhancement for multiple exposure beams An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined separation in at least a first direction for exp... | 10/23/2007 |
