Did You Know...
...that in the early 1940s GE engineer James Wright was charged with a task of utmost importance to the war effort: develop a cheap substitute for rubber that could be used to produce tires, gas masks and a whole host of military gear. Wright tackled the task diligently -- and wound up inventing Silly Putty.
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| Number | Title | Issue Date |
| 7648818 | Compositions and methods for image development of conventional chemically amplified photoresists Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development s... | 01/19/2010 |
| 7592035 | Method of coating microelectronic substrates A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical flui... | 09/22/2009 |
| 7410751 | Compositions and methods for image development of conventional chemically amplified photoresists Methods for carrying out lithography with a carbon dioxide development system are described. In some embodiments the methods involve preferential removal of a darkfield region; in other embodiments the methds involve preferential removal of a light field region. The... | 08/12/2008 |
| 7407703 | Composite membrane having oleophobic properties An air permeable composite article that in one embodiment includes a porous base membrane that includes a plurality of nodes and fibrils defining a plurality of interconnecting pores extending through the porous base membrane with each node and fibril having a surfa... | 08/05/2008 |
| 7329483 | Low pH development solutions for chemically amplified photoresists A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to ra... | 02/12/2008 |
| 7235347 | Low pH development solutions for chemically amplified photoresists A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to ra... | 06/26/2007 |
| 7114508 | Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same Cleaning apparatus having multiple wash tanks for washing articles in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution are provided. Cleaning apparatus having multiple wash tanks of the present invention may provide improved t... | 10/03/2006 |
| 7044143 | Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide supply system is configured to supply densified carbon dioxide to the m... | 05/16/2006 |
| 6989172 | Method of coating microelectronic substrates A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical flui... | 01/24/2006 |
| 6982007 | Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same A method of utilizing a divided pressure vessel in a processing system employing a carbon dioxide based solvent includes transferring a first carbon dioxide based treating solution from a first liquid chamber in a divided pressure vessel having a plurality of liquid... | 01/03/2006 |
| 6921420 | Apparatus and methods for conserving vapor in a carbon dioxide dry cleaning system A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon d... | 07/26/2005 |
| 6795991 | Apparatus for conserving vapor in a carbon dioxide dry cleaning system A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon d... | 09/28/2004 |
| 6782900 | Methods and apparatus for cleaning and/or treating a substrate using CO2 An apparatus for cleaning a microelectronic substrate includes a pressure chamber, a supply of a process liquid including dense phase CO2 fluidly connected to the chamber and a distilling system. Distilling system includes a still fluidly connected to the... | 08/31/2004 |
| 6763840 | Method and apparatus for cleaning substrates using liquid carbon dioxide Methods for cleaning a microelectronic substrate in a cluster tool are described that include placing the substrate in a pressure chamber of a module in a cluster tool; pressurizing the pressure chamber; introducing liquid CO2 into the pressure chamber; c... | 07/20/2004 |
| 6743078 | Methods, apparatus and slurries for chemical mechanical planarization Methods and apparatus for chemical mechanical planarization of an article such as a semiconductor wafer use polishing slurries including a carbon dioxide solvent or a carbon dioxide-philic composition. A carbon dioxide cleaning solvent step and apparatus may also be... | 06/01/2004 |
| 6734112 | Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same A method of utilizing a divided pressure vessel in a processing system employing a carbon dioxide based solvent includes transferring a first carbon dioxide based treating solution from a first liquid chamber in a divided pressure vessel having a plurality of liquid... | 05/11/2004 |
| 6730612 | Spray member and method for using the same A process chamber assembly for use with a substrate and a flow of process fluid includes a vessel and a spray member. The vessel defines a chamber. The spray member includes at least one spray port formed therein adapted to distribute the flow of process fluid onto ... | 05/04/2004 |
| 6669785 | Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide A method of cleaning a microelectronic substrate is carried out by providing a cleaning fluid, the cleaning fluid comprising an adduct of hydrogen fluoride with a Lewis base in a carbon dioxide solvent; and then cleaning the substrate by contacting the su... | 12/30/2003 |
| 6666050 | Apparatus for conserving vapor in a carbon dioxide dry cleaning system A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing t... | 12/23/2003 |
| 6666928 | Methods and apparatus for holding a substrate in a pressure chamber A process chamber assembly for use with a substrate includes a vessel and a substrate holder. The vessel defines a chamber. The substrate holder has a rotational axis and includes front and rear opposed surfaces. The front surface is adapted to support th... | 12/23/2003 |
| 6641678 | Methods for cleaning microelectronic structures with aqueous carbon dioxide systems A method of cleaning and removing water and entrained solutes during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing ... | 11/04/2003 |
| 6613157 | Methods for removing particles from microelectronic structures A method of cleaning and removing solid particles during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing a partially ... | 09/02/2003 |
| 6602351 | Methods for the control of contaminants following carbon dioxide cleaning of microelectronic structures A method of cleaning and removing water and entrained solutes during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing ... | 08/05/2003 |
| 6596093 | Methods for cleaning microelectronic structures with cyclical phase modulation A method of cleaning and removing water, entrained solutes and particulate matter during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the step... | 07/22/2003 |
| 6562146 | Processes for cleaning and drying microelectronic structures using liquid or supercritical carbon dioxide A method of cleaning and removing water and entrained solutes during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing ... | 05/13/2003 |
| 6506259 | Carbon dioxide cleaning and separation systems A separation method includes (a) providing a heterogeneous separation system, the heterogeneous cleaning system comprising CO2 in a first phase and an oil in a separate second phase; (b) entraining a material to be separated in the second phase... | 01/14/2003 |
| 6491730 | Pre-treatment methods and compositions for carbon dioxide dry cleaning A method for dry-cleaning articles such as fabrics and clothing in carbon dioxide. The article includes a stained portion or region, which is pretreated with a pretreatment composition prior to initiating the cleaning cycle. The pretreatment step is follo... | 12/10/2002 |
| 6412312 | Cleaning apparatus A wash tank adapted for use with a carbon dioxide cleaning medium has a body member having a front opening formed therein, the body member having side walls and a back wall opposite the front opening. The side walls terminate in a front body member edge p... | 07/02/2002 |
| 6413574 | Deposition methods utilizing carbon dioxide separation systems A separation method includes (a) providing a heterogeneous separation system, the heterogeneous cleaning system comprising CO2 in a first phase and an oil in a separate second phase; (b) entraining a material to be separated in the second phase... | 07/02/2002 |
| 6397421 | Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing t... | 06/04/2002 |
| 6344243 | Surface treatment A method of treating a substrate comprises contacting a surface of said substrate, with a pressurized fluid comprising carbon dioxide and a surface treatment component, the surface treatment component being entrained in the pressurized fluid and contactin... | 02/05/2002 |
| 6270531 | End functionalized polysiloxane surfactants in carbon dioxide formulations A method for dry-cleaning articles such as fabrics and clothing in carbon dioxide comprises contacting an article to be cleaned with a liquid dry cleaning composition for a time sufficient to clean the fabric. The liquid dry-cleaning composition comprises... | 08/07/2001 |
| 6010542 | Method of dyeing substrates in carbon dioxide A method of dyeing a substrate in carbon dioxide comprises the steps of (a) providing a dye composition comprising carbon dioxide, a dye, and a surfactant, the surfactant included in an amount sufficient to solubilize, emulsify or disperse the dye in the ... | 01/04/2000 |
