Quotables
"The man with a new idea is a crank until the idea succeeds."
Samuel Clemens
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8123976 | Alkaline aqueous solution composition used for washing or etching substrates As a washing liquid and an etching solution for semiconductor substrates and glass substrates, alkaline aqueous solutions are used; however, since metal impurities are adsorbed on the substrate surface during processing, a next process for removing the adsorbed meta... | 02/28/2012 |
| 8105998 | Liquid composition for removing photoresist residue and polymer residue Provided is a liquid composition for, at a low temperature in a short time, removing a photoresist residue and a polymer residue generated in a semiconductor circuit element manufacturing process A residue removing method using such composition is also provided. The... | 01/31/2012 |
| 7943516 | Manufacturing method for semiconductor device A method of manufacturing a semiconductor device forms an interlayer insulating film on a nickel silicide layer formed on a substrate, and forms a through hole by performing dry etching using a resist pattern, formed on the interlayer insulating film, as a mask and ... | 05/17/2011 |
| 7816313 | Photoresist residue remover composition and semiconductor circuit element production process employing the same A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of... | 10/19/2010 |
| 7816312 | Composition for photoresist stripping solution and process of photoresist stripping The present invention provides a composition for photoresist stripping solution which shows a superior stripping property of photoresists and damaged photoresist layers remained after dry etching in the fabrication process of semiconductor circuit devices, without a... | 10/19/2010 |
| 7687630 | Method for producing optically active quinuclidinols having one or more substituted groups at the 2-position The invention provides a method for producing optically active 3-quinuclidinols having one or more substituted groups at the 2-position; wherein 3-quinuclidinones having one or more substituted groups at the 2-position are reacted with compounds providing hydrogen i... | 03/30/2010 |
| 7619125 | Hydrogenation promoter, hydrogenation catalyst, and process for producing alkene compound A hydrogenation promoter of the present invention is produced by reacting an alkyne compound or an alkene compound, a palladium compound represented by a general formula Pd(II)XjLk (where L represents a monodentate ligand or a polydendate ligan... | 11/17/2009 |
| 7601667 | Sulfonate catalyst and method of producing alcohol compound using the same A sulfonate catalyst represented by the formula below and a ketone compound are placed in a solvent, and the ketone compound is hydrogenated by mixing in the presence of hydrogen to produce an optically active alcohol. ... | 10/13/2009 |
| 7591911 | Plated film of gold-cobalt amorphous alloy, electroplating bath, and method for electroplating A gold-cobalt based amorphous alloy plated film consisting of a homogeneous amorphous phase not having microcrystals is formed by electroplating conducted by use of an electroplating bath containing a gold cyanide salt in a concentration of 0.01 to 0.1 mol/dm3 ... | 09/22/2009 |
| 7563754 | Composition for removing photoresist residue and polymer residue A composition for removing a photoresist residue and a polymer residue remaining on a semiconductor substrate after dry etching and after ashing is provided, the composition containing at least one type of fluorine compound, at least one type of organic acid, at lea... | 07/21/2009 |
| 7517999 | Imidazolium compound A novel imidazolium compound represented by the following general formula (I), which has an allyl group incorporated in the 3-position of the imidazolium ring. It needs no complicated operations for dissolution and has exce... | 04/14/2009 |
| 7507350 | Etching liquid composition The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more comp... | 03/24/2009 |
| 7378560 | Ruthenium complex and process for producing tert-alkyl alcohol therewith A tert-alkyl ketone, pinacolone was hydrogenated under pressurized hydrogen in the presence of a ruthenium complex (S)-1 and a base, and corresponding (S)-3,3,-dimethyl-2-butanol was thereby obtained in 100% yield and 97% ee ... | 05/27/2008 |
| 7368064 | Cleaning solution and manufacturing method for semiconductor device A method of manufacturing a semiconductor device forms an interlayer insulating film on a nickel silicide layer formed on a substrate, and forms a through hole by performing dry etching using a resist pattern, formed on the interlayer insulating film, as a mask and ... | 05/06/2008 |
| 7268250 | Process for producing optically active compound A highly efficient process is provided for producing an optically active compound having high optical purity by an asymmetric reaction using as a catalyst a transition metal complex having an optically active nitrogen-containing compound as an asymmetric ligand.... | 09/11/2007 |
| 7138362 | Washing liquid composition for semiconductor substrate There is provided a washing liquid composition for a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees, the washing liquid composition including an aliphatic polycarboxylic acid and a surfacta... | 11/21/2006 |
| 7084097 | Cleaning solution for substrates of electronic materials The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials. The cleaning solution for cleaning substrates of electronic ... | 08/01/2006 |
| 7073518 | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning... | 07/11/2006 |
| 7022169 | Electroless gold plating solution An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1), provided that, in a case in which the solution contains a gold complex of sulfite a... | 04/04/2006 |
| 7022878 | Organic borate compounds and the nonaqueous electrolytes and lithium secondary batteries using the compounds Organic borates having the formula: The borates are highly soluble in solvent of low dielectric constant. Also disclosed are nonaqueous electrolytes made from these organic borates; lithium secondary batteries with impr... | 04/04/2006 |
| 7011697 | Electroless gold plating solution An electroless gold plating solution is provided that includes a cyanide compound and ascorbic acid or a derivative thereof, the electroless gold plating solution containing one or more than one deposition accelerator selected from the group consisting of a copper c... | 03/14/2006 |
| 6914039 | Etching liquid composition The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more comp... | 07/05/2005 |
| 6877518 | Chemical solution treatment apparatus for semiconductor substrate A chemical solution treatment apparatus for dissolving and removing ruthenium-based metal adhering to a substrate by a chemical solution, includes: a chemical solution treatment unit; a reservoir unit; and a chemical solution circulation system. The chemical solutio... | 04/12/2005 |
| 6864044 | Photoresist residue removing liquid composition The object of the present invention is to provide, in the production of semiconductor circuit elements, a photoresist residue removing liquid composition which is excellent for removing photoresist residues after dry etching without attacking the wiring material or ... | 03/08/2005 |
| 6855191 | Electroless gold plating solution An electroless gold plating solution is provided in which an amount of gold deposited by a displacement reaction is at least 15 μg/cm2, and the electroless gold plating solution includes a reducing agent that is oxidized by gold, and a reducing agent tha... | 02/15/2005 |
| 6824928 | Organic borate compounds and the nonaqueous electrolytes and lithium secondary batteries using the compounds The object of the present invention is to supply organic borates highly soluble even in a solvent of a low dielectric constant; nonaqueous electrolytes made from these organic borates and excellent in characteristics; lithium secondary batteries with improved high-t... | 11/30/2004 |
| 6790973 | Ruthenium complexes and process for preparing alcoholic compounds using these The invention provides novel ruthenium complexes having an optically active diphosphine compound, which has asymmetry on carbon and is easy to synthesize, as the ligand and a process for preparing optically active alcoholic compounds using said complexes as the cata... | 09/14/2004 |
| 6787293 | Photoresist residue remover composition A photoresist residue remover composition is provided that includes one type or two or more types of fluoride compound and one type or two or more types chosen from the group consisting of glyoxylic acid, ascorbic acid, glucose, fructose, lactose, and mannose (but e... | 09/07/2004 |
| 6730644 | Cleaning solution for substrates of electronic materials The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials. The cleaning solution for cleaning substrates of electronic ... | 05/04/2004 |
| 6713033 | Process for producing hydrophilic ODS packing material made of silica gel A process for the production of a highly chemically stable hydrophilic ODS packing material made of silica gel for liquid chromatography that causes hardly any peak tailing. ODS groups are chemically bonded to a silica gel having a specific surface area of 200 to 30... | 03/30/2004 |
| 6706533 | Method for detecting a concentration of a solution A concentration detection method and a concentration detection apparatus, and an agent diluting preparation apparatus capable of accurately estimating the concentration of a solution without the need of strict temperature control, and of estimating the concentration... | 03/16/2004 |
| 6485779 | Solution for forming ferroelectric film and method for forming ferroelectric film Acetylacetone and an aqueous nitric acid are included in a solution in which organic metal compounds of metals constituting a ferroelectric in an organic solvent thereby forming a ferroelectric film formation solution. The solution is applied to a substra... | 11/26/2002 |
| 6428974 | Microplate for drug susceptibility testing containing a drug, a color reagent, and color suppressant A reagent for a drug susceptibility testing which is simple and highly reproducible is provided. A microplate for a drug susceptibility testing wherein a drug and a color reagent containing a tetrazolium salt, 1-methoxy-5-methylphenazinium methylsulfate (... | 08/06/2002 |
| 6388146 | Polymerizable compound, polymerizable resin composition, cured polymer and liquid crystal display device The polymerizable compound of this invention is represented by general formula (I): ##STR1## where R is H, R', R'O, R'COO, or R'OCO, R' is a linear or branched alkyl group or alkenyl group having 1 to about 15 carbon atoms, A1 and A2 | 05/14/2002 |
| 6231677 | Photoresist stripping liquid composition A photoresist stripping liquid composition effective for removing resist residues after dry etching and resist ashing in the manufacturing processes of semiconductor devices, which does not corrode the different metallic materials, and wherein are compris... | 05/15/2001 |
| 6165420 | Production unit for producing high purity hydrochloric acid and using the same Disclosed is an apparatus for supplying hydrogen chloride gas from a hydrogen chloride gas generator to an absorbing reactor through a gas supply pipe, and a method for producing hydrochloric acid by allowing the gas absorbed in water in an absorbing reac... | 12/26/2000 |
| 6143700 | Treating agent for electrical contacts A treating agent for electrical contacts which is nonflammable and free from environmental pollution and imparts lubricity and corrosion resistance as good as or better than any known treating agent. This treating agent is a solution of polyphenyl ether i... | 11/07/2000 |
| 6098848 | Method and apparatus for connecting a fluid reservoir with pipelines The object of the present invention is to simplify the process of connecting a reservoir for charging and discharging 2 or more fluids with a pipeline for conveying said fluid and to assist the automation of this process. In the present invention, a reser... | 08/08/2000 |
| 6086665 | Solution for forming ferroelectric film and method for forming ferroelectric film Acetylacetone and an aqueous nitric acid are included in a solution in which organic metal compounds of metals constituting a ferroelectric in an organic solvent thereby forming a ferroelectric film formation solution. The solution is applied to a substra... | 07/11/2000 |
| 6080709 | Cleaning solution for cleaning substrates to which a metallic wiring has been applied The present invention relates to a cleaning solution for cleaning substrates, to which a metallic wiring has been applied, being capable of easily removing the metallic impurities of the substrate surface without corroding the metal, not putting a strain ... | 06/27/2000 |
