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Assignee: Kanken Techno Co., Ltd.


Location: Suita, JP
No. of patents: 5

NumberTitleIssue Date
7005117Method for removing harmful components in an exhaust gas
A method of removing harmful components of a perfluorocarbon gas or a perfluorocompound including the step of mixing at least one of a hydrocarbon gas and NH3 gas with an exhaust gas containing a perfluorocarbon or a perfluorocompound discharged from manu...
02/28/2006
6482367Method and apparatus for removing harmful components in an exhaust gas
Apparatus for removing harmful components of a perfluorocarbon gas or a perfluorocompound. The apparatus includes a first water scrubber for washing an exhaust gas containing a perfluorocarbon or a perfluorocompound discharged from a manufacturing equipme...
11/19/2002
6126906Apparatus for removing harmful components in a semiconductor exhaust gas
An apparatus for removing harmful components in a semiconductor exhaust gas includes: a first water scrubber for washing with water a gas to be processed; a gas decomposer tower disposed downstream of the first water scrubber; a second water scrubber disp...
10/03/2000
5716428Method for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process
A method for removing harmful substances of an exhaust gas discharged from a semiconductor manufacturing process. The method includes the steps of: removing at least one of a water-soluble component, a hydrolyzable component and dust contained in the exha...
02/10/1998
5649985Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process
Apparatus for removing harmful substances of an exhaust gas discharged from a semiconductor manufacturing process are provided. The apparatus includes a mechanism for: removing at least one of a water-soluble component, a hydrolyzable component and dust c...
07/22/1997
 
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