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Assignee: Kabushiki Kaisha Ekisho Sentan Gijutsu Kihatsu Center


Location: Yokohama, JP
No. of patents: 1

NumberTitleIssue Date
7579122Method of exposure and attenuated type phase shift mask
A method of exposing a surface to be exposed and an attenuated type phase shift mask for use in the method are provided herein. The attenuated type phase shift mask has a reference area allowing a light radiated from a light source to pass through and an amplitude a...
08/25/2009
 
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