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Patent No. 5285430

Behavior Modification Wristwatch

A wristwatch including a watch band and a watch body having an octagon shaped perimeter and being red in color and having the word STOP thereon to resemble a stop sign.

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Assignee: KLA-Tencor Technologies Corporation


Location: San Jose, CA
No. of patents: 13

NumberTitleIssue Date
7855362Contamination pinning for auger analysis
Electron spectroscopy methods and apparatus are disclosed. A beam of primary electrons is applied to a measurement location on a surface of a sample. A pinning flux of electrons is applied to one or more pinning regions proximate the measurement location. The pinnin...
12/21/2010
7828622Sharpening metal carbide emitters
A method for sharpening a metal carbide emitter tip is disclosed. The metal carbide emitter tip is exposed to an oxygen rich, low vacuum environment when the metal carbide emitter tip is at a first temperature. The metal carbide emitter tip is rapidly heated to a hi...
11/09/2010
7804866Pulse stretcher
A pulse stretcher includes a plurality of substantially parallel slab-like optical paths of different optical path lengths and a plurality of reflecting surfaces, which are totally internally reflecting surface formed, located at an end of the corresponding optical ...
09/28/2010
7715997Intelligent inspection based on test chip probe failure maps
A method and system for semiconductor wafer inspection is disclosed. Each of a plurality of dies on a wafer may be probed with a probe tool to produce probe data. The probe data may be used to generate one or more non-repeating care areas. An inspection tool may use...
05/11/2010
7345825Beam delivery system for laser dark-field illumination in a catadioptric optical system
A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially n...
03/18/2008
7280197Wafer edge inspection apparatus
A wafer edge inspection system utilizes a novel camera and mirror arrangement which conveys the images of the various near-edge wafer regions in piecewise fashion to a linear sensor array on a single line-scan sensor. This system is low-cost and compact, and may be ...
10/09/2007
7061598Darkfield inspection system having photodetector array
A darkfield surface inspection tool of the invention includes an illumination source for illuminating a workpiece and generating a light scattering pattern. The light scattering pattern being configured such that the positions of the light beams of the scattering pa...
06/13/2006
7027635Multiple design database layer inspection
Techniques that use the design databases used in each of the expose/etch steps during construction of phase shift masks are described. A model or reference image is rendered, accounting for systematic variations, from the design databases to represent what a layer o...
04/11/2006
6866546Electrical interconnect scheme
A connector that can couple a flexible circuit board of a head gimbal assembly to driving circuits of an apparatus coupled to a hard disk. The connector includes a pair of spring biased plates that push the flexible circuit into contact with a printed circuit board....
03/15/2005
6809905Electrical interconnect scheme
A connector that can couple a flexible circuit board of a head gimbal assembly to driving circuits of an apparatus coupled to a hard disk. The connector includes a pair of spring biased plates that push the flexible circuit into contact with a printed circuit board....
10/26/2004
6781688Process for identifying defects in a substrate having non-uniform surface properties
A surface inspection method of the invention includes scanning an inspection surface taking surface measurements. Determinations of various noise levels in the surface are made based on variations in the surface measurements. A dynamic threshold is then determined. ...
08/24/2004
6751519Methods and systems for predicting IC chip yield
Disclosed are methods and apparatus for efficiently managing IC chip yield learning. In general terms, as each wafer lot moves through fabrication, yield information is obtained from each set of test structures for a particular process or defect mechanism. The natur...
06/15/2004
6724473Method and system using exposure control to inspect a surface
A method and system of using exposure control to inspect a surface, such as a wafer. One inspection system comprises charge coupled devices (CCDs) as detectors. The exposure control function of each CCD is used to adjust integration times on individual taps of the C...
04/20/2004
 
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